Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
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shown in Fig. 2.21 and Fig. 2.22. The distance between the sample and the magnetronis about 7 cm.2.2.2 Deposition parameterFig. 2.23 The plasma during the <strong>sputtering</strong>We should use the different <strong>sputtering</strong> parameter to research the performance <strong>of</strong>the thin film. The main <strong>sputtering</strong> parameters include the <strong>sputtering</strong> current, thedeposition time and the proceeding pressure. In our experiment, the three parametersare all changed as shown in table 2.1.Table 2.1 The <strong>sputtering</strong> parametersrun Time(min) Current(A) Gas pressure (mbar)1 25 0.8 5*10 -32 20 1.0 5*10 -33 15 1.2 5*10 -34 15 1.4 5*10 -35 20 1.0 3*10 -36 20 1.2 3*10 -37 20 1.4 3*10 -329