Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

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Chapter 2 Introduction: How to sputter Nb thin film2.1 Technique of the vacuumFrom the Eq.(1.6), the RRR of the same material is determined by the residualsurface resistance, which is fundamentally determined by the purity of the thin film.The method to improve the purity is to improve the base pressure of the sputteringchamber. So the ultra high vacuum (UHV) system is needed for obtaining the vacuumpressure higher than 10 -7 mbar. The vacuum system is shown as Fig. 2.1 and Fig. 2.2.Fig. 2.1the front view of the systemFig. 2.2 the top view of the systemThe UHV system is composed of four operation chamber and one main chamber20
as shown in Fig.2.3. The four operation chamber is linked with the main chamber byall metal valves. The main chamber is pumped by the turbomolecular pump and rotarypump. The gate valve is used for separating the main chamber and the pump. Thenitrogen linked by the venting valve is used for venting the vacuum. The argon linkedby the leak valve is the sputtering proceeding gas. A vacuum gauge is used formeasurement the pressure of the main chamber. The chamber 1 is used for the sampledeposition by magnetron. The chamber 2 is used for 6 GHz cavity deposition. Thechamber 3 is used for annealing by an inductor. The chamber 4 is used for annealingby a lamp. The 3 dimensional design of the system by the Inventor is shown asFig.2.4.Fig. 2.3 the scheme of the UHV systemFig. 2.4 3-Ddesign of the UHV system21
Page 1: UNIVERSITÀ DEGLISTUDI DI PADOVAFac
Page 7 and 8: IndexINDEX ........................
Page 9 and 10: IntroductionThe superconductor acce
Page 11 and 12: Fig. 1.1 Disc-loaded traveling-wave
Page 13 and 14: In Type-II superconductors, vortex
Page 15 and 16: needed for preventing the supercond
Page 17 and 18: The B1 crystal structure has a cubi
Page 19 and 20: NbN cavities literature, is often h
Page 21 and 22: superconducting magnet construction
Page 23 and 24: 775°C. From the same diagram, it i
Page 25 and 26: two types of electrons at the Fermi
Page 27: Of course, there are some other kin
Page 31 and 32: Fig.2.8 turbomolecular pumpFig. 2.9
Page 33 and 34: Fig. 2.14 The chamber covered with
Page 35 and 36: Fig. 2.17 the gasket and the magnet
Page 37 and 38: shown in Fig. 2.21 and Fig. 2.22. T
Page 39 and 40: Fig. 2.26 The interface of the surf
Page 41 and 42: Fig. 2.30 put the sample into the T
Page 43 and 44: Fig. 2.34 the performance of the th
Page 45 and 46: 1008038.5°{110}69.6°{211}sample1s
Page 47 and 48: 2dsinθ= nλ (2.3)Fig.2.44 the diff
Page 49 and 50: Chapter 3 Multilayer deposition of
Page 51 and 52: 1 minute. The time of depositing mu
Page 53 and 54: chamber 1 and is connected to the s
Page 55 and 56: 3.2.2.2 Analysis resultⅠ The thic
Page 57 and 58: In order to detect the component of
Page 59 and 60: measure the RRR. So the resistance
Page 61 and 62: 110100903480relative Intensity70605
Page 63 and 64: frequency of the cavity which is in
Page 65 and 66: Fig. 3.28 the inductor coilDuring t
Page 67 and 68: Fig. 3.32 fixing the sample with Nb
Page 69 and 70: second transition temperature is th
Page 71 and 72: source is the bulk Nb sample. Altho
Page 73 and 74: of 1A in the Fig. 3.37 and Fig. 3.4
Page 75 and 76: Table 3.10 the description of the p
Page 77 and 78: 1101001.0A10'-IND3 45 6 7 9 1011 12
Page 79 and 80:
1101009080341.8A10'INDrelative inte
Page 81 and 82:
Reference1. A. Godeke, Nb3Sn FOR RA
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Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

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