Novara Environmental Statement 2007 English MEMC-NO ...
Novara Environmental Statement 2007 English MEMC-NO ... Novara Environmental Statement 2007 English MEMC-NO ...
Analysis of the data shows a generaldownward turn in total consumptionand a constant specifi cconsumption value, demonstratingthe controlled managementof chemical substances, focusedon meeting production needs andpreventing waste. The situationsidentifi ed last year, as describedhere below, remain unchanged:upward trend in absolute andspecifi c consumption of trichlorosilanethat can be attributed to theincreased production of epitaxialwafers, and the increased thicknessof monocrystalline silicondeposited on the epitaxial wafers,requested by clients over the last3 years;Consumption of chemical sustances: Trichlorosylane SiHCl 345Annual consumption (t)3525152000 2001 2002 2003 2004 2005 2006 2007YEAR0,240.160,08Specifi c consumption (t/MSIE)Total annual consumptionSpecifi c consumptiondownward trend in the consumptionof acids (with particularreference to hydrofl uoric acid, asubstance that brings the factorywithin the scope of the ItalianLegislative Decree 334/99 concerningmajor accident hazards)and acid mixtures used during thepost-lapping etching stage, obtainedthanks to the introduction ofan alternative caustic etching processusing potassium and sodiumhydroxide, substances with aconsiderably lower environmentalimpact than those used for acidetching;Consumption of chemical sustances: Nitric acid 65%Annual consumption (t)50403020102000 2001 2002 2003 2004 2005 2006 2007YEARConsumption of chemical sustances: Hydrofluoric acid 49%Annual consumption (t)180160140120100802000 2001 2002 2003 2004 2005 2006 2007YEAR0,210,160,110,060,011,150,950,750,550,35Specifi c consumption (t/MSIE)Specifi c consumption (t/MSIE)20
Consumption of chemical sustances:Phosphoric, nitric and hydrofloridric acid mixAnnual consumption (t)6805804803802801802000 2001 2002 2003 2004 2005 2006 2007YEAR3,72,71,70,7Specifi c consumption (t/MSIE)decrease in the absolute andspecifi c consumption of ammoniacalsolution, hydrogen peroxideand isopropyl alcohol, mainlyused during the wafer washingprocess and obtained by meansof process changes designed tolimit consumption.Consumption of chemical sustances: 25% Ammonia solution (NH 4OH)Annual consumption (t)9085807570656055502000 2001 2002 2003 2004 2005 2006 2007YEAR0,500,450,400,350,300,250,200,150,10Specifi c consumption (t/MSIE)Consumption of chemical sustances:Phosphoric and nitric acid mix (HNO 3+ H 3PO 4)Annual consumption (t)650550450350250150502000 2001 2002 2003 2004 2005 2006 2007YEAR4321Specifi c consumption (t/MSIE)Consumption of chemical sustances: 30% Hydrogen peroxide (H 2O 2)Annual consumption (t)1401201008060402000 2001 2002 2003 2004 2005 2006 2007YEARConsumption of chemical sustances: Isopropylic alcohol 99,9%0,700,600,500,400,300,20Specifi c consumption (t/MSIE)Total annual consumptionSpecifi c consumptionAnnual consumption (t)11010090807060502000 2001 2002 2003 2004 2005 2006 2007YEAR0,700,600,500,400,300,20Specifi c consumption (t/MSIE)21
- Page 1 and 2: ABSTRACT OFENVIRONMENTAL STATEMENT2
- Page 3 and 4: 01IntroductionMEMC’s Novara site
- Page 5 and 6: Novara siteMEMC Electronic Material
- Page 7 and 8: A look at the historyThe constructi
- Page 9 and 10: 04EnvironmentalPolicyMEMC’s Healt
- Page 11 and 12: 06TheEnvironmental Management Syste
- Page 13 and 14: 08Quantification of the Environment
- Page 15 and 16: Energy consumptionThe main source o
- Page 17 and 18: Total water consumption - industria
- Page 19: Consumption ofauxiliary materialsVa
- Page 23 and 24: Emissions intothe atmosphereThe pro
- Page 25 and 26: Emissions into the atmosphere- Nitr
- Page 27 and 28: Emission of CarbonDioxide Equivalen
- Page 29 and 30: YearLimit by LawDLgs 152/0620002001
- Page 31 and 32: WasteThe total waste production val
- Page 33 and 34: Areas covered by reclaiming planM2M
- Page 35 and 36: EXTERNAL TRANSPORTWith regards to t
- Page 37 and 38: 09EnvironmentalImprovement Actions:
- Page 39 and 40: 2008 - 2011 ENVIRONMENTAL PROGRAMOb
- Page 41 and 42: Free translation of abstract fromEn
Consumption of chemical sustances:Phosphoric, nitric and hydrofloridric acid mixAnnual consumption (t)6805804803802801802000 2001 2002 2003 2004 2005 2006 <strong>2007</strong>YEAR3,72,71,70,7Specifi c consumption (t/MSIE)decrease in the absolute andspecifi c consumption of ammoniacalsolution, hydrogen peroxideand isopropyl alcohol, mainlyused during the wafer washingprocess and obtained by meansof process changes designed tolimit consumption.Consumption of chemical sustances: 25% Ammonia solution (NH 4OH)Annual consumption (t)9085807570656055502000 2001 2002 2003 2004 2005 2006 <strong>2007</strong>YEAR0,500,450,400,350,300,250,200,150,10Specifi c consumption (t/MSIE)Consumption of chemical sustances:Phosphoric and nitric acid mix (H<strong>NO</strong> 3+ H 3PO 4)Annual consumption (t)650550450350250150502000 2001 2002 2003 2004 2005 2006 <strong>2007</strong>YEAR4321Specifi c consumption (t/MSIE)Consumption of chemical sustances: 30% Hydrogen peroxide (H 2O 2)Annual consumption (t)1401201008060402000 2001 2002 2003 2004 2005 2006 <strong>2007</strong>YEARConsumption of chemical sustances: Isopropylic alcohol 99,9%0,700,600,500,400,300,20Specifi c consumption (t/MSIE)Total annual consumptionSpecifi c consumptionAnnual consumption (t)11010090807060502000 2001 2002 2003 2004 2005 2006 <strong>2007</strong>YEAR0,700,600,500,400,300,20Specifi c consumption (t/MSIE)21
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