Faculty of Engineering - The Chinese University of Hong Kong
Faculty of Engineering - The Chinese University of Hong Kong
Faculty of Engineering - The Chinese University of Hong Kong
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Electronic <strong>Engineering</strong> 5<br />
ELE4520<br />
Integrated Optics<br />
An introduction to integrated optics and its applications in communications systems. Optical<br />
waveguide modes and parameters. Waveguide fabrication techniques. Coupling techniques<br />
and losses in optical waveguides. Waveguide couplers, modulators and switches. Electrooptic,<br />
magneto-optic and acousto-optic effects. Characteristics and modulation <strong>of</strong><br />
semiconductor lasers. Distributed feedback and distributed Bragg reflector lasers. Integrated<br />
optical detectors. Current trends and fundamental limits <strong>of</strong> integrated optics. Students are<br />
advised to take ELE3320 before taking this course.<br />
ELE4530<br />
Integrated Circuits Fabrication Technology<br />
Modem IC fabrication <strong>of</strong> CMOS and bipolar transistors. Simple geometric layout <strong>of</strong> integrated<br />
circuits. Process engineering for VLSI fabrication: photolithography, plasma etching, ion<br />
implantation, chemical vapour deposition, epitaxy, oxidation, diffusion and metallization.<br />
Process simulations. Reliability, yield and packaging <strong>of</strong> IC’s.<br />
ELE4550<br />
Application Specific IC Technologies<br />
Circuit Techniques: Bipolar and CMOS logic gates. ASIC design styles: PLD, gate array,<br />
standard cell, silicon compiler, selection criteria. ASIC design automation: VHDL, EDIF,<br />
synthesis, schematic capture, simulation, placement, routing. Testability considerations:<br />
testability evaluation, test vector generation, fault simulation, structured design for testability,<br />
ATE. Design practice: complex system design (e.g. Multimedia processing systems.)<br />
ELE4560<br />
Electronic Thin Film Science<br />
Thin film deposition and layered structures. Surface energies. Diffusion in solids. Stress in<br />
thin films. Surface kinetic processes. Homoepitaxy: Si and GaAs. Heteroepitaxy and superlattices.<br />
Electrical and optical properties <strong>of</strong> heterostructures, quantum wells, and superlattices. Schottky<br />
barriers and interface potentials. Solid phase amorphization, crystallization and epitaxy.<br />
Interdiffusion. Thin film reactions. Grain boundary diffusion. Electromigration in metals.<br />
ELE4580<br />
Microoptics<br />
Fundamentals <strong>of</strong> microoptics: Fraunh<strong>of</strong>er and Fresnel diffraction, spatial and temporal<br />
coherence, polarization, interferometers and thin film filters; microlens performance:<br />
diffraction limit and aberrations, scaling from macro to micro components; refractive<br />
microoptics: GRIN optics, microprisms and micromirrors; diffractive microoptics:<br />
fabrication techniques, examples <strong>of</strong> diffractive optical elements, modelling <strong>of</strong> diffractive<br />
optics; Waveguides; Case studies <strong>of</strong> microoptics applications such as beam shaping,<br />
optical interconnects and optical data storage.<br />
ELE5110<br />
Advanced Medical Instrumentation and Biosensors<br />
Review on physiological measurements and medical devices; electrodes and transducers<br />
for biomedical measurements; physiological monitoring and therapeutic devices; drug<br />
delivery systems; body sensor networks (BSN) and body area networks (BAN); wearable<br />
sensors and systems; E-textile devices. Medical imaging modalities; MRI, CT, PET,<br />
SPECT, ultrasound, etc.; bio-imaging: molecular imaging, cell imaging, etc. Selected<br />
topics <strong>of</strong> current interests in biomedical sensors.