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Faculty of Engineering - The Chinese University of Hong Kong

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Electronic <strong>Engineering</strong> 5<br />

ELE4520<br />

Integrated Optics<br />

An introduction to integrated optics and its applications in communications systems. Optical<br />

waveguide modes and parameters. Waveguide fabrication techniques. Coupling techniques<br />

and losses in optical waveguides. Waveguide couplers, modulators and switches. Electrooptic,<br />

magneto-optic and acousto-optic effects. Characteristics and modulation <strong>of</strong><br />

semiconductor lasers. Distributed feedback and distributed Bragg reflector lasers. Integrated<br />

optical detectors. Current trends and fundamental limits <strong>of</strong> integrated optics. Students are<br />

advised to take ELE3320 before taking this course.<br />

ELE4530<br />

Integrated Circuits Fabrication Technology<br />

Modem IC fabrication <strong>of</strong> CMOS and bipolar transistors. Simple geometric layout <strong>of</strong> integrated<br />

circuits. Process engineering for VLSI fabrication: photolithography, plasma etching, ion<br />

implantation, chemical vapour deposition, epitaxy, oxidation, diffusion and metallization.<br />

Process simulations. Reliability, yield and packaging <strong>of</strong> IC’s.<br />

ELE4550<br />

Application Specific IC Technologies<br />

Circuit Techniques: Bipolar and CMOS logic gates. ASIC design styles: PLD, gate array,<br />

standard cell, silicon compiler, selection criteria. ASIC design automation: VHDL, EDIF,<br />

synthesis, schematic capture, simulation, placement, routing. Testability considerations:<br />

testability evaluation, test vector generation, fault simulation, structured design for testability,<br />

ATE. Design practice: complex system design (e.g. Multimedia processing systems.)<br />

ELE4560<br />

Electronic Thin Film Science<br />

Thin film deposition and layered structures. Surface energies. Diffusion in solids. Stress in<br />

thin films. Surface kinetic processes. Homoepitaxy: Si and GaAs. Heteroepitaxy and superlattices.<br />

Electrical and optical properties <strong>of</strong> heterostructures, quantum wells, and superlattices. Schottky<br />

barriers and interface potentials. Solid phase amorphization, crystallization and epitaxy.<br />

Interdiffusion. Thin film reactions. Grain boundary diffusion. Electromigration in metals.<br />

ELE4580<br />

Microoptics<br />

Fundamentals <strong>of</strong> microoptics: Fraunh<strong>of</strong>er and Fresnel diffraction, spatial and temporal<br />

coherence, polarization, interferometers and thin film filters; microlens performance:<br />

diffraction limit and aberrations, scaling from macro to micro components; refractive<br />

microoptics: GRIN optics, microprisms and micromirrors; diffractive microoptics:<br />

fabrication techniques, examples <strong>of</strong> diffractive optical elements, modelling <strong>of</strong> diffractive<br />

optics; Waveguides; Case studies <strong>of</strong> microoptics applications such as beam shaping,<br />

optical interconnects and optical data storage.<br />

ELE5110<br />

Advanced Medical Instrumentation and Biosensors<br />

Review on physiological measurements and medical devices; electrodes and transducers<br />

for biomedical measurements; physiological monitoring and therapeutic devices; drug<br />

delivery systems; body sensor networks (BSN) and body area networks (BAN); wearable<br />

sensors and systems; E-textile devices. Medical imaging modalities; MRI, CT, PET,<br />

SPECT, ultrasound, etc.; bio-imaging: molecular imaging, cell imaging, etc. Selected<br />

topics <strong>of</strong> current interests in biomedical sensors.

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