17/18 January 2007 Wiener Neustadt - Czelo

More documents

Recommendations

Info

Institute of Electron Technology Address Al.Lotników 32/46 Poland 0 - Warsaw Phone / Fax +48 22 5487 880 / +48 22 5487 882 www www.ite.waw.pl Size 250+ Organisation Type RTD Institute Contact Person Name Dr Piotr Dumania Position International Cooperation Email pdumania@ite.waw.pl Type of co-operation (Offered, Requested) Areas of activity Licence agreement Technical Co-operation (R&D) Boths Joint research project Boths Joint-venture agreement Manufacturing agreement Boths Commercial agreement Financial agreement • Electronics, Microelectronics • Biosensor • Sensors & Instruments • Short description of company The Institute of Electron Technology (ITE) is a major Polish research centre with the primary focus on semiconductor micro- and nanotechnology. The fundamental goal of ITE is to conduct basic and applied research in the area of microelectronics, semiconductor optoelectronics and micromechanics as well as characterisation of semiconductor materials and structures. ITE established two Centres of Excellence: CEPHONA (Physics and Technology of Photonic Nanostructures) and MANTARC (Micro- and Nanotechnology Applied Research Centre) 1. Profile: RTD: Technologies, devices and services: design, prototyping and production in the area of :MEMS/MOEMS DESCRIPTION: Customer specific PIN and Avalanche Photodiodes Customer specific Detectors of ionising radiation Ion Sensitive FET’s, incl. back side contact devices. Silicon micro- and nano-probes with in integrated piezoresistive force sensor. MEMS/MOEMS devices based on silicon micromachining. Integration of various silicon and non-silicon micro-technologies. MEMS design and simulation. INNOVATIVE ASPECTS: Nonstandard technology closed to silicon integrated circuits technology. Finding gaps between academia and industry we provide a contract research service connected with a prototyping in the area of microengineering with a special emphasize on Microsystems. MAIN ADVANTADGES / BENEFITS A broad and diverse experience in the field of the microelectronic system design and in silicon technology, combined with prototyping and pilot production capabilities enable us to assist our customers and partners much further on the road from the idea to product than most of academic R&D. We focus our efforts on customer specific solutions, working together with our partners and tuning our technology to their needs. Thus, we are more flexible than foundries. TECHNICAL SPECIFICATIONS:
CURRENT STAGE OF DEVELOPMEN development phaze/available for demonstrationand /already on the market INTELLECTUAL PROPERTY RIGHTS (IPR): Polish patents applied/granted MARKET APPLICATIONS: metrology, wide spectrum research, chemistry and chemical technologies, TYPE OF COLLABORATION SOUGH european project submission further research, development support technical cooperation manufacturing agreement (subcontracting & coontracting) PARTNER PROFILE: research institution SME 2. Profile: RTD: Technologies, devices and services: design, prototyping and production in the area of :MEMS/MOEMS 3. Profile: RTD: Technologies, devices and services: design, prototyping and production in the area of :MEMS/MOEMS
Page 1:
• Electronics, Microelectronics
Page 4 and 5:
Organisation Index Institute of Phy
Page 6 and 7:
Organisation Index TECHNICAL UNIVER
Page 8 and 9:
Organisation Index Faculty of Mater
Page 10 and 11:
1. Profile: RTD: High sensitive wea
Page 12 and 13:
New applications or new products re
Page 14 and 15:
AMAG rolling GmbH Address Postfach
Page 16 and 17:
Attophotonics Biosciences GmbH Addr
Page 18 and 19:
austriamicrosystems Address Tobelba
Page 20 and 21:
Austrian Researc Centers GmbH - ARC
Page 22 and 23:
Austrian Research Centers GmbH - AR
Page 24 and 25:
D. Swarovski & Co. Address Swarovsk
Page 26 and 27:
FFG - EIP - Austrian EUREKA Office
Page 28 and 29:
FFG Austrian Research Promotion Age
Page 30 and 31:
FFG Austrian Research Promotion Age
Page 32 and 33:
Happy Plating GmbH Address Leobersd
Page 34 and 35:
Institute of Materials Science and
Page 36 and 37:
INTELLECTUAL PROPERTY RIGHTS (IPR):
Page 38 and 39:
inhibition with minimal drug induce
Page 40 and 41:
Integrated Microsystems Austria Gmb
Page 42 and 43:
Joanneum Research GmbH Address Stey
Page 44 and 45:
Joanneum Research, Insitute of Nano
Page 46 and 47:
Kunststoff-Cluster, Clusterland Obe
Page 48 and 49:
M.Kaindl Flooring Address Kaindlstr
Page 50 and 51:
CURRENT STAGE OF DEVELOPMEN plannin
Page 52 and 53:
MAGNIFIN Magnesiaprodukte GmbH & Co
Page 54 and 55:
Montanuniversität - Nanonet Styria
Page 56 and 57:
Polymer Competence Center Leoben Gm
Page 58 and 59:
1. Profile: Expertise: Nanoimprint
Page 60 and 61:
Psisys Ing.C.Vacariu Address Suchen
Page 62 and 63:
state-of-the-art characterization m
Page 64 and 65:
1. Profile: Reques Electrochemical
Page 66 and 67:
Sony DADC Austria AG Address Sonyst
Page 68 and 69: + Strategieentwicklung + Innovation
Page 70 and 71: Technology Consulting Centre TBZM A
Page 72 and 73: TU Wien and Austrian Center of Comp
Page 74 and 75: TU Wien- institute for solid state
Page 76 and 77: University of Linz Address Altenber
Page 78 and 79: University of Vienna, Department of
Page 80 and 81: Vienna University of Technology, In
Page 82 and 83: Zentrum für Mikro- und Nanostruktu
Page 84 and 85: INTELLECTUAL PROPERTY RIGHTS (IPR):
Page 86 and 87: market economy. The Technical Unive
Page 88 and 89: Partner Qualification Criteria : Ex
Page 90 and 91: Varna University of Medicine Addres
Page 92 and 93: Brno University of Technology, Facu
Page 94 and 95: CSNMT/nano section Address Novotneh
Page 96 and 97: Fraunhofer IPA Address Nobelstraße
Page 98 and 99: TECHNICAL SPECIFICATIONS: to be def
Page 100 and 101: SURFACE systems + technology GmbH +
Page 102 and 103: MTA MFA Address Konkoly-Thege u. 29
Page 104 and 105: http://www.mfa.kfki.hu/eng/ Laborat
Page 106 and 107: Research Institute for Solid State
Page 108 and 109: ThalesNano Inc. Address Zahony utca
Page 110 and 111: Materials Ireland Polymer Research
Page 112 and 113: private reseacher Address Verchrats
Page 114 and 115: film polymer foils with embedded mi
Page 116 and 117: PUNJAB WATER SUPPLY AND SEWERAGE BO
Page 120 and 121: Warsaw University of Technology, Fa
Page 122 and 123: Wroclaw University of Technology, I
Page 124 and 125: Fundação para a Ciência e a Tecn
Page 126 and 127: METAV-RESEARCH DEVELOPMENT S.A. Add
Page 128 and 129: NATIONAL INSTITUTE OF RESEARCH AND
Page 130 and 131: -Joint research project PARTNER PRO
Page 132 and 133: NATIONAL INSTITUTE OF RESEARCH AND
Page 134 and 135: MARKET APPLICATIONS: The large appl
Page 136 and 137: National R&D Institute for Microtec
Page 138 and 139: MARKET APPLICATIONS: - Realisation
Page 140 and 141: Production of individual structural
Page 142 and 143: Faculty of Materials Science and Te
Page 144 and 145: preparation INTELLECTUAL PROPERTY R
Page 146 and 147: Nanoporous layers with 30-100nm cha
Page 148 and 149: INKA - Institut für nanotechnische
Page 150 and 151: INNOVATIVE ASPECTS: MAIN ADVANTADGE
Page 152: 2. Profile: Expertise: Plastic Elec
show all

17/18 January 2007 Wiener Neustadt - Czelo

You also want an ePaper? Increase the reach of your titles

Delete template?

Save as template?