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Silicon-based solar cells Characteristics and production processes ...

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<strong>Silicon</strong>-<strong>based</strong> <strong>solar</strong> <strong>cells</strong> – characteristics <strong>and</strong> <strong>production</strong> <strong>processes</strong><br />

If the electrodes of the cell are not short-circuited, then the result of the negative<br />

accumulation in the p area <strong>and</strong> the positive accumulation in the p will be an electric<br />

potential <strong>and</strong> the resulting photovoltage V, which lowers the energy barrier on the<br />

p-n junction. This causes a density increase of the dark currents up to the value<br />

compensating the density of the reverse current. This state corresponds to the<br />

highest value of the cell’s photovoltage, which is called the open circuit voltage V oc<br />

<strong>and</strong> which, according to (2), can be calculated from the following equation [17]:<br />

kT ⎛ J ⎞<br />

V = ⎜ + 1<br />

⎟<br />

oc<br />

ln<br />

(5)<br />

q ⎝ J<br />

0 ⎠<br />

With the assumption that all the impurity atoms are ionized <strong>and</strong> the value of the<br />

charge concentration in the equilibrium state in the semi-conductor equals n p N A =<br />

p n N E , we can prove that [16]:<br />

d<br />

( V )<br />

dT<br />

⎡ E ⎤<br />

oc 1<br />

g<br />

= ⎢Voc<br />

− ⎥<br />

(6)<br />

T ⎣ q ⎦<br />

The formula describes the voltage change of the <strong>cells</strong>’ open circuit with respect to<br />

temperature. The knowledge of this dependence is highly significant in the<br />

measurements of the cell’s I-V characteristics <strong>and</strong> its practical exploitation. For<br />

example, for a Si cell, when V oc equals 0,6 V, a temperature rise of one degree Celsius<br />

will cause a 1,7 mV drop of V oc .<br />

2.2 Reflection <strong>and</strong> absorption of electromagnetic radiation<br />

For the radiation operating on the surface of the <strong>solar</strong> cell, it is necessary to<br />

minimize the reflection coefficient R ref <strong>and</strong> the transmission coefficient T in such<br />

a way so as the total radiation can be absorbed within the volume of the cell’s active<br />

material. The absorption coefficient α = 4πνξ/c is equal to the inverse density x of<br />

that material’s layer in which the radiation force P(0) of frequency ν decreases<br />

e times assuming the value P(x) according to the relation P(x) = P(0)e -αx . The quantity<br />

ξ is the extinction coefficient which is connected with the light refractive index n with<br />

the formula n * = n-iξ, where n * designates the complex refractive index. In the case of<br />

oblique transitions, as is the case of silicon, α assumes the value A(ν)[hν-E g ±E p ] 2 /<br />

{±exp(±E p /kT)-(±1)}, where: E p is the photon energy value, A(ν) is the function<br />

of energy <strong>and</strong> the reduced mass of the charge carriers <strong>and</strong> ± determines whether the<br />

photon is absorbed (+) or emitted (-) [18]. For the crystalline silicon, R ref has the value<br />

of about 0,35 <strong>and</strong> thus its reduction is necessary. This is realized by coating the front<br />

surface of the cell with an antireflective layer (ARC) or by texturizing the cell’s<br />

18

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