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Microstructure Analysis on Nanocrystalline Materials COMMISSION ...

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200 °C, not in the as-prepared state and <strong>on</strong>ly for copper<br />

samples.<br />

(a)<br />

(b)<br />

(c)<br />

(d)<br />

Fig. 8. Fragments of the Debye rings obtained by backreflecti<strong>on</strong><br />

for as-deformed sample Cu + 0.5 % Al2O3<br />

(a), the center of the same sample after annealing at<br />

550 °C (b), margin of the sample after annealing at<br />

550 °C (c), Fe sample after annealing at 550 °C.<br />

In Fig. 8, four cases are compared – rings for asdeformed<br />

state (a), for the central regi<strong>on</strong> of annealed<br />

sample (b), for outer regi<strong>on</strong> of the disc of the same<br />

sample (c) and for annealed ir<strong>on</strong> sample (d). Str<strong>on</strong>g inhomogeneity<br />

can be observed especially for copper<br />

while for ir<strong>on</strong> the distributi<strong>on</strong> of dots and c<strong>on</strong>sequently<br />

also grains is quite homogeneous. With increasing annealing<br />

temperature such effects can be seen <strong>on</strong> diffracti<strong>on</strong><br />

profiles as well. This also makes c<strong>on</strong>venti<strong>on</strong>al<br />

way of powder XRD line profile analysis impossible.<br />

f(R)<br />

f(R)<br />

1000.0<br />

100.0<br />

10.0<br />

1.0<br />

0.1<br />

1.6e-4 1.0e1<br />

1.0e1<br />

8.0e0<br />

1.2e-4 8.0e0<br />

6.0e0<br />

6.0e0<br />

8.0e-5<br />

4.0e0<br />

4.0e0<br />

4.0e-5<br />

2.0e0<br />

2.0e0<br />

0.0e0<br />

Cu<br />

6 GPa, annealed at 250 °C for 4s<br />

-150 -100 -50 0 50 100 150 200<br />

Analyzer angle (arc sec<strong>on</strong>ds)<br />

Cu-250 4 4 ss<br />

Cu-250 4 s<br />

log-normal size size distributi<strong>on</strong><br />

log-normal size distributi<strong>on</strong><br />

0 2000 4000 6000 8000<br />

r(10 -10 0.0e0<br />

0 2000 4000 6000 8000<br />

r(10 m) -10 0.0e0<br />

0 2000 4000 6000 8000<br />

m)<br />

(b)<br />

Fig. 9. Experimental profile of the transmitted wave<br />

including diffuse scattering (thin line) and corresp<strong>on</strong>ding<br />

theoretical curve (fit, thick line) for the deformed<br />

copper annealed at 250 ºC (a), log-normal size distributi<strong>on</strong><br />

used for the calculati<strong>on</strong> of theoretical curve.<br />

A new method of measurements of the diffuse scattering<br />

by small crystallite size in the transmitted wave has<br />

been applied [31]. It c<strong>on</strong>sists in the comparis<strong>on</strong> of intensity<br />

profiles with and without diffuse scattering. It<br />

requires compact specimen with an appropriate thickness.<br />

It should be thick enough in order to measure the<br />

diffuse scattering but sufficiently thin in order to measure<br />

the transmitted intensity. For copper this means the<br />

sample thickness of about 0.1 mm. After careful<br />

alignment of the equipment with several crystal m<strong>on</strong>ochromators<br />

(to cut the tails of instrumental profile),<br />

23<br />

(a)

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