Quanta Morphologi Datasheet - FEI Company

P R O D U C T D A T A
Seeing is believing
Key benefits
• Create reference methods for QC process design and classify
subtle changes in a product or process
• Perform statistical analysis to more fully characterize
particle size and shape distributions and visualize
individual particles from their distributions
• Identify the most important morphological parameters for
characterization of batch-to-batch variation
• Increase your imaging capabilities with high resolution
high, low and extended low vacuum (ESEM) mode
• Assured reproducibility - software-driven SOPs eliminate
user variability and enable global method transfer.
• Broad measuring range - measures materials from
100 nm to 2 mm
• Simple upgrade path to Quanta Morphologi for existing
FEI Quanta 200/400/600 FEG SEM installations
• Flexibility – use the FEI Quanta 200/400/600 FEG SEM
for other imaging tasks in addition to particle
characterization
Quanta Morphologi
Sub-micron particle visualization
combined with statistical size and
shape characterization
Quanta Morphologi particle analysis system combines the
magnification and resolving power of the FEI Quanta
200/400/600 FEG scanning electron microscope (SEM) with
established particle analysis software from Malvern Instruments
to provide a turnkey solution for particle characterization. As
opposed to indirect particle size analysis techniques, which
report equivalent spherical diameter, Quanta Morphologi is a
direct method to report both size and shape information.
Particle size and shape can dramatically alter the physical and
therapeutic properties of a substance. The solubility, stability,
chemical reactivity, opacity, flowability and material strength of
many materials are affected by the size and shape characteristics
of the particles within them.
With Quanta Morphologi, users will be able to create reference
methods for quality control process design, perform automated
particle analysis, obtain surface detail, and perform statistical
analysis to more fully characterize particle size and shape
distributions. The most important morphological parameters for
differentiating a set of samples, such as good and bad sample
batches, can be defined and subtle changes in a product or
process can be readily identified.
Particle visualization
The low vacuum capability of FEI’s Quanta SEMs offer users the
flexibility to analyze materials without imposing many of the
traditional SEM sample preparation constraints, thereby greatly
extending the applicability for particle analysis. It is engineered
to provide maximum data – imaging and microanalysis – from
all specimens, with or without preparation.
Particle characterization
For spherical particles, size is defined by the diameter. However,
for irregularly shaped particles, characterization of particle size
must also include information on the type of diameter
measured, as well as information on particle shape.
Malvern Instrument’s Morphologi software provides perfect
complement to SEM imaging with advanced, dedicated image
analysis software.

P R O D U C T D A T A
Essential specifications
Electron optics
• High resolution field emission SEM column optimized for
high brightness, high current
• 45° objective lens geometry with through the lens
differential pumping and heated objective apertures
• Accelerating voltage: 200 V to 30 kV
• Probe current: up to 100 nA, continuously adjustable
Electron beam resolution
• High vacuum
- 0.8 nm at 30 kV (STEM)
- 1.2 nm at 30 kV (SE)
- 2.5 nm at 30 kV (BSE)
- 3.0 nm at 1 kV (SE)
• Low vacuum
- 1.5 nm at 30 kV (SE)
- 2.5 nm at 30 kV (BSE)
- 3.0 nm at 3 kV (SE)
• Extended vacuum mode (ESEM)
- 1.5 nm at 30 kV (SE)
Detectors
• Symmetrical low vacuum detector
• Everhardt-Thornley SED
• Low vacuum SED (LVD)
• Gaseous SED (GSED) - used in ESEM mode
• IR-CCD
• Solid-state BSED
• Gaseous analytical BSED (GAD)
• STEM detector
• Scintillator BSED/CLD
• Gaseous BSED
Vacuum system
• 1 x 240 l/s TMP, 2 x PVP
• Patented through the lens differential pumping
• Beam gas path length: 10 mm or 2 mm
Chamber
• 284 mm left to right
• 10 mm analytical working distance
• 8 ports
• EDX take-off: 35°
Stage
• Eucentric goniometer stage
• X - Y = 50 mm
• Z = 50 mm (25 mm motorized)
• T = -15° to +75°
• R = 360° continuous
• Repeatability: 2 µm
System control
• Windows® XP SP 2, keyboard, optical mouse
• Image display: 19 inch LCD, SVGA 1280 x 1024
Image processor
• Up to 4096 x 3536 pixels
System options
• Support PC
• Multi-functional control panel
• Image archive software
• Software controlled Peltier cooled specimen stage
• Software controlled WETSTEM system
• Software controlled 1000 °C and 1500 °C heating stage
• Remote control software
• Video printer
• Specimen holder kit
• EDS
• WDS
• EBSD
• E-beam litho package
• CL system

Installation requirements
• Power: voltage 230 V (+ 6%, -10%), frequency 50 or 60 Hz
(+/- 1%)
• Power consumption: < 3.0 kVA for basic microscope
• Environment: temperature 20 °C (+/- 3 °C)
• Relative humidity: below 80% RH
• Compressed air 4 to 6 bar - clean, dry and oil free
Figure 1: The new symmetrical low vacuum detector has been specifically designed to provide accurate particle visualization
and is critical for measuring particle edges.
P R O D U C T D A T A
Morphologi G3 software features
• Intuitive and user-friendly
• Standard Operating Procedures (SOPs): for repeatability
between operators, image analysis systems and sites
• Scattergram: easy visualization of measurement data,
classification and filtering
• Data comparison: compare and cluster data to find
differences or similarities between multiple measurements
• Custom reports: to suit every laboratory’s requirements
• Particle viewer: to view, sort, filter and classify all captured
particle images
• Selected parameter trend analysis: plot trends between
multiple records
• Result overplots and statistical plotting: overplot and
compare multiple results

P R O D U C T D A T A
About FEI Company
FEI Company is a global leader in providing innovative
instruments for nanoscale imaging, analysis and prototyping.
FEI focuses on delivering groundbreaking results and
accelerate research, development and manufacturing cycles
for its customers in life sciences, semiconductor and data
storage, academic and industrial R&D markets. With R&D
centers in North America, Europe and India, and sales and
service operations in more than 50 countries around the
world, FEI’s Tools for Nanotech are bringing the nanoscale
within the grasp of leading researchers and manufacturers.
See more at fei.com/particleanalysis
Floorplan
About Malvern Instruments
Malvern is a leading supplier of particle analysis solutions and
rheological instrumentation. Advanced measurement
technologies are combined with robust mechanical designs,
and comprehensive data handling and automation software,
to provide industrially relevant systems to sectors as diverse as
pharmaceuticals and cement. Malvern operates from global
headquarters in Malvern, UK,
the area in which the
company was founded more
than 30 years ago.
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