Quanta™ DualBeam™ and SEM Family Brief - FEI Company

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p r o d u c t f a m i l y d a t a Applications: Failure Analysis Cross section High-res FIB milling and imaging HR-SEM imaging General purpose SEM imaging Low damage TEM sample preparation Wet sample/packaging analysis TEM prep automation X-Ray analysis CAD navigation Probe compatible Metal deposition Metal etch Dielectric etch Dielectric deposition STEM detector EMI active cancellation Circuit Edit Front-side edits Back-side edits Electrical feed-through for probes Characterization and Analysis STEM (low kV) Standard Some capabilites Optional The Quanta series is capable of generating and collecting all available information from any type of sample material. The Quanta 3D includes the capability of an ion column for ion beam imaging, material removal and material deposition. Versatile sample handling FEI developed the Quanta family to provide maximum imaging and microanalysis data on a wide range of samples, with or without preparation. In Quanta, you have a single tool with capabilities that used to require several systems. Making difficult samples suitable for conventional, high-vacuum scanning electron microscopy (SEM) environments is time consuming and can lead to unacceptable delays in the data-collection process. Across the family, Quanta features three imaging modes – high vacuum, low vacuum and environmental scanning electron microscopy (ESEM) – to significantly reduce your time to data by enabling analysis for the most difficult samples with one tool. The Quanta family also allows you to conduct analysis while leaving specimens intact for possible further investigation to complement the diagnostics dataset. You get repeatable, reliable results, ensuring the highest degree of accuracy from your data. Whatever your specific needs, you can predict a significant return on your investment, thanks to Quanta’s versatile sample handling.
Product ESEM Mode Low-Vacuum Mode High-Vacuum Mode SEM Technology p r o d u c t f a m i l y d a t a FIB Technology Stage Travel Quanta 200 3.5 nm @ 30 kV 15 nm @ 3 kV 3.5 nm @ 30 kV Tungsten 50 mm Quanta 400 3.5 nm @ 30 kV 15 nm @ 3 kV 3.5 nm @ 30 kV Tungsten 100 mm Quanta 600 3.5 nm @ 30 kV 15 nm @ 3 kV 3.5 nm @ 30 kV Tungsten 150 mm Quanta 3D 200 3.5 nm @ 30 kV 15 nm @ 3 kV 3.5 nm @ 30 kV Tungsten Magnum 50 mm Quanta 200 FEG 2 nm @ 30 kV 3.5 nm @ 3 kV 3.5 nm @ 30 kV FEG 50 mm Quanta 400 FEG 2 nm @ 30 kV 3.5 nm @ 3 kV 2 nm @ 30 kV FEG 100 mm Quanta 600 FEG 2 nm @ 30 kV 3.5 nm @ 3 kV 2 nm @ 30 kV FEG 150 mm Quanta used to investigate contamination for quality control The Quanta FEG is capable of large field-of-view imaging and the low-vacuum mode enables the device to be kept uncoated during the analysis Package bump cross-sectioned in Quanta 3D and imaged with electron beam High-magnification image of transistor showing versatility of Quanta FEG
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Quanta™ DualBeam™ and SEM Family Brief - FEI Company

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