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Diamond Detectors for Ionizing Radiation - HEPHY

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CHAPTER 5. DETECTOR MATERIAL COMPARISON 25<br />

eld is approximately constant throughout the bulk. Principally, the silicon detector is a<br />

wide-area diode.<br />

+<br />

p -implant<br />

y<br />

+<br />

n-type bulk<br />

n + -implant<br />

E<br />

Figure 5.5: Schematic cross-section of a silicon detector with implant thicknesses not to scale.<br />

The electric eld results from a bias voltage above the depletion voltage.<br />

Silicon detectors are made of very pure material, minimizing the number of charge<br />

traps and recombination centers. Nearly all charges excited in the bulk reach the electrodes,<br />

implying a charge collection eciency of (almost) 100%. According to the charge<br />

mobilities, the charge collection after a particle traversed the bulk takes a few nanoseconds.<br />

5.3 Ge <strong>Detectors</strong><br />

Germanium was the rst technically used semiconductor material. As the specic energy<br />

loss dE=dx is quite high in germanium compared to silicon, it better suits <strong>for</strong> calorimetry<br />

than <strong>for</strong> tracking purposes. For instance, lithium-drifted germanium detectors [26] with<br />

an active crystal volume of several cm 3 are used in nuclear spectroscopy. These detectors<br />

achieve an excellent energy resolution, however, they must be permanently cooled to<br />

liquid nitrogen temperature (T = 77 K). The low temperature not only conserves the<br />

arrangement of the lithium atoms inside the crystal, but also reduces the intrinsic carrier<br />

density dramatically. Only this fact permits the functioning of the device.<br />

Later, it became possible to produce extremely pure germanium material, which is<br />

more convenient to use. Still low temperature operation is essential, but an interruption<br />

of the cooling is no longer disastrous.<br />

5.4 GaAs <strong>Detectors</strong><br />

Gallium-arsenide is a III-V-type semiconductor. The semiconducting junction is introduced<br />

through a Schottky contact on the bulk material. Unlike silicon, the electric eld<br />

does not extend throughout the bulk [9], in fact, there is a passive layer with zero eld<br />

and the eld in the active layer is decreasing from a maximum at the Schottky contact to<br />

zero. Depending on the sample purity, there is a certain number of inter-band gap traps.<br />

Thus the charge collection eciency of the best samples is presently at the order of 50%<br />

to 80%.

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