Chapter 12 Physical Vapor Deposition (PVD)

More documents

Recommendations

Info

Evaporator systems: crucible heating techniques Inductively Heated Figure <strong>12</strong>.8 Example of an inductively heated crucible used to create moderately charged temperatures.
Evaporator systems: crucible heating techniques Electron beam Heat of vaporization is supplied by the impact of an electron beam focused on the charge and melts a region of the material to be evaporated; Adv: possible to coevaporate materials with dual targets, Disadv: more expensive than resistance heated systems, substrates may have radiation damage Figure <strong>12</strong>.9 Electron beam evaporative sources. (A) A simple low flux source using a hot wire electron source and a thin movable rod. (B) A popular p source using a 2707 source arc in which the beam can be rastered across the surface of the charge. The magnet must be much larger than shown to achieve the full 270° of arc.
Page 1 and 2: Chapter 12 Physical Vapor Depositio
Page 3 and 4: Evaporation Process: *Chamber under
Page 5 and 6: Deposition rate depends on position
Page 7: Evaporator systems: crucible heatin
Page 11 and 12: Evaporation of Alloys Figure 12.11
Page 13 and 14: Basic steps in sputter deposition:
Page 15 and 16: Sputter Yield (S) Determines rate o
Page 17 and 18: Magnetron Sputtering - a magnetic f
Page 19 and 20: Film morphology Zone model (Zones 1
Page 21 and 22: Can improve step coverage by collim
Page 23 and 24: Reactive sputtering: use of reactiv
Page 25 and 26: A thin film deposited on a substrat

Chapter 12 Physical Vapor Deposition (PVD)

You also want an ePaper? Increase the reach of your titles

Delete template?

Save as template?