Chapter 12 Physical Vapor Deposition (PVD)
Chapter 12 Physical Vapor Deposition (PVD)
Chapter 12 Physical Vapor Deposition (PVD)
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Evaporation<br />
Advantages: Simple process, relatively<br />
inexpensive, high purity films can be<br />
deposited.<br />
Disadvantages: difficult to evaporate alloys<br />
due to different melting points, “line of<br />
sight” deposition results in poor surface<br />
coverage unless there is rotation ti of fthe<br />
samples; deposition of refractory materials<br />
is a problem due to high temperatures<br />
required.<br />
Figure <strong>12</strong>.10 A commercial evaporator. Inset<br />
shows a planetary (photographs courtesy of<br />
CHA Industries).
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