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PNNL -14480 • Vacuum housings • Magnet pole pieces • High-voltage power supplies • DC-magnet power supplies • Vacuum pumps • Uranium-recovery equipment • Uranium tetrachloride (UCl 4 ) processing equipment Table 9 identifies specific technologies used in EMIS enrichment facilities, describes the technology level needed for successful use, lists critical materials, and unique equipment used in that technology. 36
PNNL -14480 Technology Ion Source Ion Collectors Sufficient Technology Level Single or multiple uranium ion sources consisting of a vapor source, ionizer, and beam accelerator. Capable of providing a total ion beam current of > 100 mA Collector plates of two or more slits and pockets for collection of enriched and depleted uranium ion beams, minimize sputtering Critical Materials Uranium chloride, graphite, stainless steel, copper, tantalum, tungsten Graphite, stainless steel, copper Unique Test, Production, and Inspection Equipment None identified None identified Unique Software and Parameters Validated ion source models including 3-dimensional solution of Poisson’s equation for multiple species and taking into account the effect of the accelerating structure. Validated ion beam dynamics software and algorithms that optimize isotope separation design from ion source through vacuum and into collector. Vacuum Housings Magnet Pole Pieces High voltage DC Power Supplies DC Magnet Power Supplies Vacuum Pumps Uranium Recovery Vacuum vessels large enough to contain two or more sets of injectors and collectors with appropriate beam current geometry. Two or more provide the scaling required for reasonable electromagnetic separation. Diameter >2 meters, able to maintain a timeinvariant magnetic field within a separator, ability to transfer magnetic field between adjoining separators. Capable of continuous operation, output voltage >20,000 V, output current >1 A, voltage regulation 100 V, current > 500 A, and current or voltage regulation 38 cm, pumping speed > 15,000 liters/sec, vacuum
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PNNL -14480 this reactor. In spite
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