sms06 cdc200 flyer 1.qxd - Carl Zeiss
sms06 cdc200 flyer 1.qxd - Carl Zeiss
sms06 cdc200 flyer 1.qxd - Carl Zeiss
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<strong>Carl</strong> <strong>Zeiss</strong> SMT – Semiconductor Metrology Systems Division<br />
CDC200 –<br />
CD Control Tool for Mask and<br />
Lithography Applications<br />
CDC200 TM is the next generation<br />
on-the-fly solution for high-resolution<br />
Critical Dimension Control<br />
(CDC).<br />
The CDC200 enables both Mask<br />
Makers and IC Manufacturers to<br />
control their Critical Dimensions<br />
and significantly improve CD<br />
Uniformity across masks and<br />
wafers during lithographic<br />
operations.<br />
The CDC200 TM is enabling technology for:<br />
Mask Makers<br />
■ Tune your masks to meet required CD<br />
specifications and for optimal performance<br />
■ Yield improvement and fast turn-around on<br />
all mask types<br />
■ Achieve advanced CD Uniformity specifications<br />
■ Leverage existing installed mask<br />
manufacturing equipment<br />
IC Manufacturers<br />
■ Improve your Lithography Process Window<br />
(PW) and overall productivity<br />
■ “Pellicle on” CD Uniformity improvement<br />
■ Improve yield on any targeted mask level:<br />
dry, immersion, double patterning lithography<br />
■ Improve chip binning: higher speed, lower<br />
leakage, etc.<br />
■ Galileo TM option for in-fab haze detection<br />
Enabling the Nano-Age World ®<br />
We make it visible.
<strong>Carl</strong> <strong>Zeiss</strong> SMT – Semiconductor Metrology Systems Division<br />
CDC200 TM<br />
CD Control Tool For Mask and Lithography Applications<br />
Principles of Operation<br />
Shrinking geometries present a continuous challenge for IC Manufacturers seeking<br />
pinpoint control of their most Critical Dimensions, and subsequent CD distribution<br />
across the mask and the wafer. CDC200 TM features a selection of on-the-fly CDC (Critical<br />
Dimension Control) solutions geared specifically for mask and lithography applications.<br />
The system accurately modifies the local mask transmission (which translates into local<br />
CD changes on the wafer during the lithography process), without removing the<br />
pellicle, thus allowing for tool installations at either the mask manufacturing site,<br />
or at the fab line itself. CDC200’s fully automated mask tuning processes enable<br />
seamless operations via a friendly and easy-to-use GUI. Additionally, an internal<br />
transmission measurement unit allows for pre and post transmission verification, so<br />
tool performance is always verified and maintained.<br />
Global CD Uniformity Improvement<br />
In this CDC200 TM application a global improvement of the mask or wafer CD Uniformity<br />
takes place. The user loads a list of CD measurements used to characterize the mask or<br />
the wafer current CD Uniformity. The system then automatically calculates the pixel<br />
density map that defines the attenuation level to be written into the mask glass. The<br />
system uses a smart density interpolation algorithm to calculate the pixel density<br />
required for the rest of the mask area. The pixels are then precisely written into<br />
the glass, and then selected locations are verified using the built-in transmission<br />
measurement unit. CDC is compatible with all design rules and has been demonstrated<br />
on customers masks at the 32 nm node.<br />
Mask Format (SEMI standard)<br />
Minimum Feature Size<br />
Average throughput (per mask)<br />
CDC200 TM General Specifications<br />
Mask loading & unloading time –<br />
≤ 10 min.<br />
SMIF only<br />
Attenuation Correction Performance 2<br />
Attenuation range<br />
Attenuation resolution<br />
Correction unit size<br />
100 µm 3<br />
(discrete attenuation value)<br />
Transmission Measurement System Standard<br />
DUV Full Spot Size<br />
Repeatability (3σ) 4<br />
Reproducibility (3σ) 4<br />
Resolution<br />
Measurement time<br />
6/250<br />
Not limited<br />
< 6.0 hours 1<br />
0 - 3.0 %<br />
0.1 %<br />
≤ 700 µm (FWHM)<br />
≤ 0.1 %<br />
≤ 0.1 %<br />
0.1 %<br />
< 6 sec<br />
1: Average processing time based on customer 70nm production masks<br />
2: Using CDC200 TM build-in transmission measurement unit and standard measurement procedure<br />
3: High Resolution (50 µm) is an Option<br />
4: According to standard measurement procedure on bare quartz<br />
5: All specifications subject to change<br />
Local CD Control<br />
In this CDC200 TM application the user identifies a<br />
local area or multiple areas that require a very<br />
accurate line width control. Once these areas are<br />
identified, multiple CD measurements are taken and<br />
the target CD is defined. The target CD can be<br />
different per local area. The system then operates in a<br />
very similar methodology as described above, in the<br />
“Global CD Uniformity Improvement” application.<br />
<strong>Carl</strong> <strong>Zeiss</strong> SMS GmbH<br />
A <strong>Carl</strong> <strong>Zeiss</strong> SMT AG Company<br />
<strong>Carl</strong>-<strong>Zeiss</strong>-Promenade 10<br />
07745 Jena<br />
Germany<br />
Tel. +49 36 41 / 64 25 63<br />
Fax +493641/642938<br />
info-sms@smt.zeiss.com<br />
www.smt.zeiss.com/sms<br />
Due to a policy of continuous development, we reserve the right to change specifications without notice. Version 03-09 Z-CDC200 © by <strong>Carl</strong> <strong>Zeiss</strong> SMT, Oberkochen
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