The LAB Family Control systems - Leybold Optics GmbH

LABfamily and CLUSTERS
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CONTENT
The LAB Family ..............................2
LAB Standard ................................3
Vacuum Pumping Systems..........4/5
LAB Controlling ..........................6/7
Process equipment ....................8/9
Magnetron Sputtering .................10
Thickness measurement
and rate control............................11
Substrate Handling ......................12
Substrate Heating ........................13
References / Project Examples
LAB .......................................14 - 21
CLUSTER ...............................21 - 24

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The LAB Family
> LAB Standard
LAB500 LAB600 LAB600H
LAB700 LAB700H LAB900
LAB1100 LAB1820
Inside dimension of the chamber
(W x H x D in mm):
LAB500: 500 x 650 x 520
LAB600: 600 x 750 x 620
LAB600H: 600 x 1100 x 620
LAB700: 700 x 750 x 720
LAB700H: 700 x 950 x 720
LAB900: 950 x 950 x 920
LAB1100: 1100 x 1100 x 1050
LAB1820: ø: 1820 / H: 1400

The LAB Family
> LAB Standard
General Features:
P high-grade steel vacuum chamber mounted on welded
frame rack with height adjustable feet
P two set of chamber liners (evaporation shields)
P water cooled chamber walls
P viewports with mirror observation system or shutter
P Pirani and Bayard-Alpert Ionivac
P pumping system according to the requirements
P PLC based control system with PC visualisation
Electrical cabinets:
P 2x or 3x 19” Rittal cabinet
P main power distribution
P PLC based control system with PC visualisation
P Emergency Off
Option:
P customized electrical cabinets
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The LAB Family
> Vacuum Pumping Systems
Forepump
HV pump
HV valve
By pass
oil sealed
dry
Turbo
Cryo
Diff
Meissner trap
Turbo-basic Turbo Turbo-D Turbo-M
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Turbo
Vacuum Pumping Systems
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The LAB Family
> Vacuum Pumping Systems
Cryo-O Cryo-D Diff-O
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Cryo Diff
Diff-D
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The LAB Family
> Control systems
Mini PLC
PLC with touch screen
3 user level
Service
Supervisor
User
Monochrome touch panel with 320x240 pixels
Compact PLC OMRON SYSMAC CPM2A
with directly connected in- and outputs
Signals directly wired to PLC
(no field bus system)
Standard touch screen version
16 colours touch panel
with 640x480 pixels
Modular PLC OMRON SYSMAC
CS1H with Profibus DP
RS232 and RS485 interfaces
Signals distributed via Profibus DP
Other possible field busses with
OMRON PLC: CANopen, DeviceNet,
ASi, ModBus, Interbus Loop2
Automatic control of:
vacuum pumps
process devices
optional equipment:
Modem
Data logging on CF-card
Recipe handling
20 recipes can be stored
fixed structure of header
and up to 50 layers
per recipe

The LAB Family
> Control systems
Standard LAB plus controler touch screen version
Additional features compared
to PLC with touch screen version:
Better graphics resolution
Windows look and feel
5 user levels
configurable data logging
Free recipe editing (drag and drop)
Recipes stored in Access database on PC
Up to 800 steps per recipe can be stored on PLC
Modem and Ethernet
process devices like OMS 3000 can be used
19”-Rack Panel-PC in cabinet front
or cabinet mounted Industrial-PC
with separate mobile control desk for
clean room installation with 15” or
18” TFT-Touch screen
Modular PLC with Profibus DP communication
processor
OMRON SYSMAC CS1H or SIEMENS SIMATIC S7
RS232 and RS485 interfaces, TCP/IP on Industrial Ethernet
Other possible field busses with SIMATIC PLC:
ASi, Interbus
PC version example screen shot
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The LAB Family
> Process equipment
Thermal Evaporation
Thermal evaporator „big“
P high current feedthroughs up to 1000 A
P special boat holder
P high current transformer 1100 A / 12 V
P special thyristor unit
High volume evaporator
P ceramic heater with shielding
P high volume
Evaporation
AS 053
Evaporator „big“ Evaporator „small“
Thermal evaporator „small“
P Evaporation assembly
P High current generator AS053 (400A
with 5V or 200A with 10V)
Multi boat evaporator

Electron beam Evaporation
HPE 6 ESV 14/Q
EVM-6 EVM-8
Electron-beam evaporator HPE 6
P max. power: 6 kW
P deflection: 270°
P 3 types: coaxial, standard, long
P single, 4-6-7 cup
Electron-beam evaporator ESV 14/4 , ESV 14/D , ESV 14/Q
P crucible: four-hearth rotary crucible (ESV 14/4) • 4x 25 cm 3
single hearth rotary crucible (ESV 14/D) • 1x 100 cm 3
exchangeable crucible plates (ESV 14/Q)
P beam power at 10 kV: 10 kW
P operating pressure: < 5x10 -4 mbar
P cooling water requirement: > 12 l/min; 4-7 bar
EGC 38 power supply
ESV 14/Q
contact cooled
ESV 14/Q
directly cooled
EVM-6
directly cooled
EVM-6
contact cooled
EVM-8
directly cooled
1x D 40 mm - 4x D 38 mm 14x D 14mm
10 mm deep - 19 mm deep 10 mm deep
1x D 70 mm - 4x D 38 mm -
32 mm deep - 15 mm deep -
1x 65 cm3 1x 93 cm3 4x 8 cm3 6x 4 cm3 -
max 4 kW max 6 kW max 5 kW max 4 kW -
1x 65 cm3 - 4x8 cm36x 4 cm3 12x 1,1 cm3 max 3 kW - max 4 kW max 3 kW max 2 kW
1x 160 cm3 1x 240 cm3 4x 30 cm3 6x 20 cm3 12x 4 cm3 max 10 kW max 10 kW max 8 kW max 8 kW max 3 kW
Electron-beam evaporator EV M-6 and EV M-8
P max. power: 6 kW (EV M-6) or 10 kW (EV-M8)
P acceleration voltage: 4 - 10 kV
P operating pressure: 1x10 -8 to 5x10 -4 mbar
P cooling water requirement:
6 l/min (1.6 gpm); > 3 bar (45 psi)
P mounting flange: 32 mm through hole
e-gun controller unit EGC38
P with radio controlled remote unit
P Windows based setup and simulation software
power supply
P switched filament power supply
P HV-generator power supply with 5kW or 10 kW
Evaporation
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The LAB Family
> Magnetron Sputtering
Magnetron Sputtering
Penning cathode PK 100 - 250
P wall mounted
P magnetic array at athmosphere
P water cooling integrated in backing plate
Internally mounted cathode IMM 100 - 200
P adjustable distance to substrate
P high yield magnetic array
P magnetic array not in contact with cooling water
Ion and plasma sources
End Hall ion sources
P pressure range > 3·10 -4 mbar
P beam current up to 1000 mA
P ion energy from 40 to 120 eV
P filament or hollow cathode nutralizer
ECWR plasma sources
P pressure range > 1·10-4 mbar
P plasma densities up to 1013 /cm3 P ion current density up to 3 mA/cm2 P independent control of the ion energy
from 20 to 600 eV
RF ion source
P RF power: 75 to 300 W at 13.56 MHz
P beam current: up to 50 mA
P ion energy: from 100 to 2000 eV
Deposition
Penning cathode
IMM 100
Mark I Mark II
Copra
RF/I 40
Copra

The LAB Family
> Thickness measurement and rate control
Quartz monitoring
thin film deposition controller IC/5
P control of up to 6 coating sources
P co-deposition with two sources is possible
P 50 coating programs with 250 different layers
P 24 material programs
P simultaneous measurement with up to 8 sensors
P thickness resolution: ca. 1 Å
P rate resolution: down to 0.1 Å /s
thin film deposition controller XTC/2
P two channels, but not simultaneously used
P 9 coating programs with up to 3 different layers
P 9 material programs
P thickness resolution: ca. 1 Å
P rate resolution: down to 0.1 Å /s
sensors:
double head shutter assembly standard
Optical monitoring
Optical monitor OMS 3000
P measuring range: 400 ... 2400 nm
P test glass changer (motor controlled) with 100 test glasses
IC/5
XTC/2
OMS 3000
test glas changer
Thickness measurement and control
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The LAB Family
> Substrate Handling
Table Palette
Substrate holder
Plane plate (with holder rings)
Calotte (1 or 4 segments)
Substrate drive systems
ferrofluidic rotary feedthrough
P Massiv shaft with servo motor
P hollow shaft with servo motor or asynchronous motor
substrate driver systems
Calotte
Substrate Handling

The LAB Family
> Substrate Heating
ceramic heater
inconel backside heater
Substrate heating
IR-resistor heater
P power: 2,2 kW
Quartz lamp heater
P power: 3 x 500 W
P UHV compatible
Ceramic radiative heater
P contamination free
P low desorption
P power: 5,2 kW
Inconel backside heater
P max. substrate temperature: 300 °C
P power: depends on chamber size
IR resistor
lamp heater
Substrate Handling
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The LAB Family
> References
P D65 B + WSU 251
P COOLVAC 1500 semiline
P 2x 600W RF generator
P high current generator AS053
P deposition controller IC/5
P PLC with touch screen terminal
P 3x 3” cathode
P thermal evaporator
P ion source Mark I
P rotation shutter plate
P positionable substrate palette
LAB500
LAB 500 SP
SPUTTER UP

P T1600/TRIVAC D65 B + WSU 501
P gate valve DN 250
P PLC with touch screen terminal
P 3x 4” cathode with reactive gas shower
P RF-plasma ion source
P rotary substrate heater table up to 600°C
P multilayer deposition
P co-sputtering
P ion beam etching
LAB 600 SP
SPUTTER COATER
LAB600 See
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The LAB Family
> References
P Ecodry 50 LR + WSU 501 / COOLVAC 2500
P gate valve DN 250
P 2x e-gun ESV14
P 2x e-gun controller EGC 38
P deposition controller IC/5
P 4x crystal with shutter
P LAB plus control system
P End hall ion source with
hollow cathode neutralizer
LAB600
LAB 600 H
EVAPORATION SYSTEM

P COOLVAC 3.011 with ECODRY / WSU 251
P 2x e-gun ESV 14/4
P 2x e-gun controller EGC 38
P ECWR plasma source Cobra
P 2x thermal evaporator
P UHV rotary substrate drive
P 3x 19”cabinet with all integrated devices
P deposition controller IC5
P LAB plus control system
LAB 700
EVAPORATION SYSTEM
LAB700 See
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The LAB Family
> References
P DIP12000 with TRIVAC D65B / RUVAC WSU501
P 2x e-gun ESV14/4
P 2x e-gun controller EGC 38
P 3x thermal evaporator
P deposition controller IC/5
P OMS3000 with test glass changer
P 2x quartz lamp heater
P UHV rotary feedthrough with hollow shaft
and substrate palette
P LAB plus control system
LAB900
LAB 900 EB
EVAPORATION SYSTEM

P DIP1200
P SOGEVAC SV 300 / WSU 1001
P 2x e-gun ESV 14/4
P 2x e-gun controller EGC 38
P 2x thermal evaporator
P 1x End hall ion source with filament neutralizer
P 1x deposition controller IC/5
P 2x ceramic heater 5,2 kW
P LAB plus control system
LAB 1100
EVAPORATION SYSTEM
LAB1100 See
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The LAB Family
> References
P COOLVAC 10000 CL
P ECODRY LR 50 + Roots WSU 501
P Chamber heating system
P 6x single pocket e-beam evaporator
P 4x deposition controller XTC/2
P 1x ECWR plasma source
P 1x 16 cm Kaufman ion source
P LAB plus control system
LAB1100 UHV
LAB 1100 UHV
EVAPORATION SYSTEM

P DIP 20000
P screwline SP 630 + Roots WAU 2001
P 4x high volume thermal evaporator
P 4x deposition controller XTM/2
P 4x rotary substrate drive
LAB 1820
EVAPORATION SYSTEM
LAB1820 See
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Clusters
> References
P 2x cassette load lock chamber with elevator
P 1x central handler chamber with vacuum robot
P 1x evaporation chamber
• COOLVAC 3000 semiline, ECODRY + WSU 501
• 1x e-gun ESV 14
• 1x e-gun controller EGC 38
• 1x deposition controller XTC/2
P 1x sputter chamber
• COOLVAC 1500 semiline, ECODRY + WSU 251
• 3x magnetron IMM 200
P etch chamber
• TW 250 S
• inverse sputter etcher for substrate cleaning
CLAB500EBSP
CLAB 500 EBSP

P 1x load lock and transfer chamber
• 2x linear substrate manipulator
• TURBOVAC 151
P 1x DC sputter chamber
• 2x 6“ DC magnetron
• TURBOVAC 361 C, TRIVAC D 65 B
P 1x HF sputter chamber
• 1x 6“ HF magnetron
• TURBOVAC 361 C
• substrate heater up to 400 °C
CLUSTEX 100 M
CLUSTEX 100 M See
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Clusters
> References
P 1x cassette load lock chamber for 8“ wafers
• TW 70 + scroll pump SC 30
P 1x central handler chamber with vacuum robot
• T 600 + scroll pump SC 30
P 1x etch chamber
• T 600 + TRIVAC D 65 B + WSU 501
• inverse RF-sputter etcher for substrate cleaning
P 1x sputter chamber
• T 600
• 1x DC magnetron IMM 250
CLUSTEX 250
CLUSTEX 250 M

CHINA
Leybold Optics China
Beijing Liaison Office
Kangsheng Industrial Park No. 25
No.11 Kangding Street
Beijing 100176, PR China
Phone: +86 (0) 10 - 67 80 33 66 109
Fax: +86 (0) 10 - 67 80 33 66 100
FRANCE
Leybold Optics France
7 Avenue du Quebec
F-91140 Villebon sur Yvette
Z.A. de Courtaboeuf
Phone: +33 (0) 1 - 69 82 48 12
Fax: +33 (0) 1 - 69 82 48 40
GREAT BRITAIN / IRELAND /
THE NETHERLANDS
Leybold Optics UK
St. Modwen Road, Stretford
Manchester M32 OZE
Phone: +44 (0) 161 - 866 28 00
Fax: +44 (0) 161 - 866 28 01
LABfamily and CLUSTERS
JAPAN
Leybold Optics Japan
Tobu A.K.Bldg., 4F
3-23-3, Shin-Yokohama 3-chome
Yokohama, 222
Phone: +81 (0) 45 - 471 33 31
Fax: +81 (0) 45 - 471 33 32
KOREA
Leybold Optics Korea
# 1406, HyunDae 41 Tower, 917-9
Mok-1Dong, Yangcheon-Gu
Seoul 158-051
Phone: +82 (0) 2 - 21 68 21 36
Fax: +82 (0) 2 - 21 68 20 78
ITALY / AUSTRIA /
SLOWENIA
Leybold Optics Italia
Via Trasimeno 8
20128 Milano
Phone: +39 (0) 2 - 26 30 50 84
Fax: +39 (0) 2 - 27 20 96 95
SPAIN / PORTUGAL
Leybold Optics Ibérica
C/Carles Buigas 57-59
08980 Sant Feliu de Llobregat
Barcelona - Spain
Phone: +34 (0) 93 - 666 07 78
Fax: +34 (0) 93 - 666 46 12
TAIWAN
Leybold Optics Taiwan
82, Shien-Cheng 11th
Chu-Bei City
302, Hsinchu County
Taiwan R.O.C.
Phone: +886 (0) 35 - 583 138
Fax: +886 (0) 35 - 583 139
USA / CANADA / SOUTH AMERICA
Leybold Optics USA
539 James Jackson Ave.
Cary, NC 27513
Phone: +1 (919) 657 - 71 00
Fax: +1 (919) 657 - 71 00
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HEADQUARTERS: LEYBOLD OPTICS GmbH Siemensstrasse 88 D-63755 Alzenau Tel.: +49 (0) 60 23 - 50 0-0
Fax +49 (0) 60 23 - 50 0-150 E-Mail: info@leyboldoptics.com www.leyboldoptics.com
LEYBOLD OPTICS DRESDEN GmbH Zur Wetterwarte 50/Haus 303 01109 Dresden (Germany) Tel.: +49 (0) 351 - 86 69 5-10
Fax: +49 (0) 351 - 86 69 5-42 E-Mail: info.dresden@leyboldoptics.com www.leyboldoptics.com
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