Integrated Copper CMP Barrier Slurry Development to Achieve ...
Integrated Copper CMP Barrier Slurry Development to Achieve ...
Integrated Copper CMP Barrier Slurry Development to Achieve ...
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Tunable <strong>Slurry</strong> <strong>Development</strong> Model<br />
Models have been developed <strong>to</strong> predict blanket removal rates and<br />
final pattern <strong>to</strong>pography<br />
‣ All slurry components and their interaction/impact on removal rates have been modeled<br />
‣ This model is used <strong>to</strong> predict which barrier slurries may be most effective in meeting<br />
process requirements<br />
1<br />
400 600 Cu RR 800<br />
200<br />
1&3<br />
Component B<br />
4<br />
5<br />
2<br />
6<br />
0<br />
400<br />
600 TEOS RR<br />
800<br />
0 Component A 1<br />
CONFIDENTIAL – RODEL, INC. – 8/02
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