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ANALYSETTE 22 NanoTec

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100<br />

80<br />

60<br />

40<br />

% Undersize<br />

X - Electroformed Sieve Analysis<br />

L - Electroformed Sieve Analysi<br />

s<br />

X - Electroformed Sieve Analysis<br />

C - Coulter Counte<br />

r<br />

M -<br />

Coul ter Co<br />

ounte<br />

r<br />

J - Coulter Counte<br />

r<br />

D - Coulter Counte<br />

r<br />

X - Coulter Counte<br />

r<br />

U - Coulter Counte<br />

r<br />

W - Coulter Counte<br />

r<br />

F - Microscopy<br />

Q - Micr<br />

oscop<br />

py<br />

X1- Microscopy<br />

X1 - Microscopy<br />

20<br />

0<br />

20 25 30 35 40 45<br />

50<br />

55<br />

5 60 65 70<br />

Size (μm)<br />

REFERENCE MATERIALS<br />

The particle size measurement using laser diffraction is based<br />

on fundamental physical relationships, meaning that calibration<br />

of the instrument is not necessary, strictly speaking.<br />

Nevertheless, the measuring instrument should be inspected<br />

regularly to ensure proper function. This is done with reference<br />

materials with a spherical shape that permit precise determination<br />

of the particle size with the help of laser diffraction.<br />

Reference materials for inspecting<br />

the measuring system<br />

The reference materials offered by FRITSCH are delivered<br />

along with precise dispersion and measurement instructions<br />

and are accompanied by a certifi cate that states the upper<br />

and lower limits of the expected particle sizes. These limit<br />

values were determined using an internationally recognised<br />

process (NIST-traceable).<br />

Measured cumulative distribution curve for a certifi ed reference material<br />

21

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