SRC Users' Meeting - Synchrotron Radiation Center - University of ...

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CANADIAN SYNCHROTRON RADIATION FACILITY Y.F. Hu, A. Jürgensen and K.H. Tan Canadian Synchrotron Radiation Facility, Synchrotorn Radiation Center, 3731 Schneider Drive, Stoughton, WI 53589 USA T.K. Sham Dept. of Chemistry, the University of Western Ontario, London, Ont. N6A 5B7 Canada The Canadian Synchrotron Radiation Facility (CSRF) is a national research facility that is owned and managed by NRC-CNRC (National Research Council Canada) and NSERCC (Natural Sciences and Engineering Research Council of Canada). It is located at the Synchrotron Radiation Center (SRC), University of Wisconsin-Madison, and is operated by the University of Western Ontario since 1982. CSRF provides three beamlines to the Canadian user community: a Grasshopper (20 to 250 eV), an SGM (240 to 700 eV) and a DCM (1500 to ~5000 eV). The SGM is moving to the Canadian Light Source (CLS) in October of 2003. These beamlines are regularly used for XANES and EXAFS analysis of solids with simultaneous collection of the Total Electron Yield (TEY) and Fluorescence Yield (FY) signals. This allows the determination of surface structure (TEY) and bulk structure (FY) of the sample. Other experiments performed at CSRF beamlines include X-ray Excitation Optical Luminescence (XEOL), Magnetic Circular Dichroism (MCD) and Photoemission Electron Energy Microscopy (PEEM) of solids, and PhotoElectron-PhotoIon-CoIncidence (PEPICO) spectroscopy of gases. The research done at CSRF spans over a broad range of disciplines including: materials science (semiconductors and nanoparticles), biology (plants and bacteria), environmental studies (soils and solid particles from lakewater), tribology (anti-wear oil films), agriculture (manure) and geology (rocks and minerals). Most users of the CSRF beamlines are from Canada. A few are from New Zealand and the United States. On average, over 25 papers containing work done at CSRF are published annually.
FUTURE PLANS AND RECENT ACCOMPLISHMENTS AT CNTECH James W. Taylor, Franco Cerrina, Paul Nealey, Don Thielman, and Dan Malueg Center for NanoTechnology (CNTech), 3731 Schneider Drive, Stoughton, WI 53589-3097 There have been a number of new instruments added to the facilities at CNTech over this past year and a number of accomplishments in the research and development area that will be highlighted in this presentation. First, the high energy beamline providing 2,750 keV (0.45 nm) exposure radiation to the Mitsubishi Electric Company (MELCO) written diamond membrane X- ray masks has proven the concept that removing the carbon from the mask membrane and operating at higher energy will reduce the effects of diffraction and permit the printing of smaller linewidth mask features. This beamline feeds the JSAL Mod 4 stepper, and it has been upgraded to perform well at small gaps. The metrology capabilities have been upgraded with a LEO scanning microscope with 2 nm resolution and an atomic force microscope equipped with nanotube tips. New etching equipment for CNTech has arrived and has been installed on campus in the new cleanrooms of WCAM in the Engineering Centers building. These etchers will provide the capability for etching polysilicon, a material of choice for the clear phase X-ray mask involving the Bright Peak Enhanced X-ray Phase Mask (BPEXPM). The progress of the BPEXPM effort will be described, and we note that the work has progressed to the point that modeling and experiment are in agreement. The BPEXPM has been shown to produce wafer images factors of 3-5 smaller than the mask image and considerably larger gaps than utilized with proximity X-ray lithography. CNTech is working with BAE Systems of Nashua, NH to make devices with this technology. Negotiations are in progress with SEMATECH to install a short section undulator on the ring to power a new EUV exposure station operating at 13.4 nm. SEMATECH needs access to such a station to foster the development of EUV lithography involving multi-layer masks. Currently, CNTech operates an EUV exposure station on the U2 undulator, and recent results on that beamline will be described. CNTech has continued its work with new chemically-amplified resists and their optimization for high resolution, high contrast, and high sensitivity operation. The Design of Experiments optimization has proven to be especially useful for this effort. We are expecting delivery of a stepper in June of 2004 from JSAL of Burlington, VT that will push the state-of-the-art in overlay alignment. This stepper will utilize an approach that was developed at MIT called the Interferometric Broad Band Imaging (IBBI) system. This work is supported by DARPA Grant MDA972-01-1-0039, a DARPA/NAVAIR grant N00421-03-1-0001, and a sub-contract with BAE Systems under NAVAIR N00421-02-C- 3029. The Synchrotron Radiation Center is supported by the National Science Foundation under Grant DMR-0084402.
Page 2 and 3: Welcome to the 36 th SRC Users’ M
Page 4 and 5: 12:20 - 1:10 Lunch 1:10 -1:45 Poste
Page 6 and 7: Administration Executive Director D
Page 8 and 9: STATUS OF THE SRC BEAMLINES AND INS
Page 10 and 11: ACCELERATOR DEVELOPMENTS Ken Jacobs
Page 12 and 13: HIGH ENERGY RESEARCH POSSIBILITIES
Page 14 and 15: ATOMICALLY UNIFORM THIN FILMS ON SI
Page 16 and 17: calculated binding energies of the
Page 18 and 19: MANY-ELECTRON EFFECTS ON THE XE 5S
Page 20 and 21: PHOTOELECTRON SPECTROMETRY OF ATOMI
Page 22 and 23: PHOTOEMISSION STUDY OF USb AND UTe
Page 26 and 27: SELF-ASSEMBLY OF BLOCK COPOLYMERS O
Page 28 and 29: A B S T R A C T S
Page 30 and 31: Photoemission spectra, a.u. -0.3 -0
Page 32 and 33: THE INITIAL AND FINAL STATE BANDS I
Page 34 and 35: TRANSITION LAYERS AT BURIED FERROMA
Page 36 and 37: LOW-DIMENSIONAL ELECTRONS AT SILICO
Page 38 and 39: SUBCELLULAR DISTRIBUTION OF MOTEXAF
Page 40 and 41: LINEAR POLARIZATION MEASUREMENTS OF
Page 42 and 43: Fig.1: Photoemission spectra of opt
Page 44 and 45: The sample manipulator has a cool d
Page 46 and 47: Cr and Fe but for these U systems t
Page 48 and 49: [4] G. -H. Gweon, J. W. Allen, and
Page 50 and 51: References [1] S. Cho, Y. Kim, A. D
Page 52 and 53: [3] D. L. Mills, Physical Review B
Page 54 and 55: CHARACTERIZATION OF SULPHATE INTERA
Page 56 and 57: in the data acquisition chamber. Th
Page 58 and 59: spatially resolved chemistry of the
Page 60 and 61: THE RELATIONSHIP BETWEEN PHOSPHATE
Page 62 and 63: PHOTOEMISSION STUDIES OF QUANTUM WE
Page 64 and 65: Ag surface state such that it moves
Page 66 and 67: HIGH-RESOLUTION STUDY OF THE LITHIU
Page 68 and 69: RELATIVE PARTIAL CROSS SECTIONS AND
Page 70 and 71: Christian Ast Max-Planck Institute
Page 72 and 73: David L. Huber Physical Sciences La
Page 74 and 75:
Tom Miller University of Illinois a
Page 76 and 77:
Eric Wiedemann University of Wiscon
Page 78 and 79:
Pete Hagen Phone: (608) 877-2154 Em
Page 80:
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