Hf - Gelest Inc.
Hf - Gelest Inc.
Hf - Gelest Inc.
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<strong>Gelest</strong>, <strong>Inc</strong>.<br />
Melting<br />
points of<br />
refractory<br />
materials<br />
HAFNIUM<br />
<strong>Hf</strong><br />
Atomic number<br />
72<br />
Atomic weight<br />
178.49<br />
CAS number<br />
7440-58-6<br />
Boiling point<br />
4602°C<br />
Melting point<br />
2227°C<br />
Specific gravity (20°C)<br />
13.31<br />
H 3 C<br />
H 3 C<br />
Cl <strong>Hf</strong><br />
H 3 C<br />
H 3 C<br />
(CH 3 ) 3 Si Cl<br />
N <strong>Hf</strong><br />
(CH 3 ) 3 Si Cl<br />
CH 3<br />
CH 3<br />
CH 3<br />
Cl<br />
CH 3<br />
CH 3<br />
CH 3<br />
Si(CH 3 ) 3<br />
N<br />
Si(CH 3 ) 3<br />
nC 4 H 9 O OnC 4 H 9<br />
<strong>Hf</strong><br />
nC 4 H 9 O OnC 4 H 9<br />
nC 4 H 9 O OnC 4 H 9<br />
<strong>Hf</strong><br />
nC 4 H 9 O OnC 4 H 9<br />
tC 4 H 9 O OtC 4 H 9<br />
<strong>Hf</strong><br />
tC 4 H 9 O OtC 4 H 9<br />
N(CH 2 CH 3 ) 2<br />
(CH 3 CH 2 ) 2 N <strong>Hf</strong> N(CH 2 CH 3 ) 2<br />
N(CH 2 CH 3 ) 2<br />
name MW bp/mm (mp) D 4<br />
20<br />
n D<br />
20<br />
COMPOUNDS<br />
Electrical resistivity (0°C)<br />
29.6µΩ • cm<br />
Enthalpy of melting<br />
25.9kJ/mol<br />
Enthalpy of vaporization<br />
571kJ/mol<br />
Ionization potential<br />
(spectral)<br />
7.0eV (I)<br />
14.9eV (II)<br />
(aqueous) 1.70V (+4)<br />
Oxidation states<br />
0, 4<br />
Electronegativity, Pauling<br />
1.3<br />
Specific heat (25°C)<br />
0.035 cal/g K<br />
Thermal conductivity (25°C)<br />
23.0w/m K<br />
OMHF016<br />
BIS(PENTAMETHYLCYCLOPENTADIENYL)- 519.86 (>300°)mp<br />
HAFNIUM DICHLORIDE<br />
C 20 H 30 Cl 2 <strong>Hf</strong><br />
HYDROLYTIC SENSITIVITY: 4 no reaction with water under neutral conditions<br />
[85959-83-7] HMIS: 3-1-1-X 2.5g/$82.00 10g/$266.00<br />
OMHF066<br />
HAFNIUM BIS(HEXAMETHYLDISILAZIDE)- 570.17<br />
DICHLORIDE<br />
C 12 H 36 Cl 2 N 2 Si 4 <strong>Hf</strong><br />
employed in ALD of hafnium silicate 1 .<br />
1. W. Nam et al, Electrochem. and Solid-State Lett., 7, C55, 2004<br />
HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />
[70969-29-8] HMIS: 3-2-1-X 10g/$120.00<br />
AKH325<br />
HAFNIUM n-BUTOXIDE, 95% 470.95 280-5°/0.01 1.32<br />
C 16 H 36 O 4 <strong>Hf</strong><br />
contains
<strong>Gelest</strong>, <strong>Inc</strong>.<br />
name MW bp/mm (mp) D 4<br />
20<br />
n D<br />
20<br />
CH 3<br />
HC<br />
CH 3<br />
C<br />
C<br />
O<br />
O<br />
2<br />
<strong>Hf</strong><br />
OnC 4 H 9<br />
OnC 4 H 9<br />
AKH328<br />
HAFNIUM DI-n-BUTOXIDE (BIS-2,4- 522.58 1.07 1.4850 25<br />
PENTANEDIONATE), 50% in toluene/n-butanol miscible: isopropanol<br />
C 18 H 32 O 6 <strong>Hf</strong><br />
contains 2.5-3.0% hafnium tri n-butoxidepentanedionate analog<br />
HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/water<br />
HMIS: 2-3-1-X<br />
100g/$52.00<br />
(CH 3 ) 2 N N(CH 3 ) 2<br />
<strong>Hf</strong><br />
(CH 3 ) 2 N N(CH 3 ) 2<br />
CH 3 CH 2 O OCH 2 CH 3<br />
<strong>Hf</strong><br />
CH 3 CH 2 O OCH 2 CH 3<br />
OMHF080<br />
HAFNIUM DIMETHYLAMIDE 354.80 60-2°/0.1 1.40<br />
C 8 H 24 N 4 <strong>Hf</strong><br />
(20°)mp<br />
pale yellow solid<br />
HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />
[19962-11-9] HMIS: 3-3-1-X 5.0g/$146.00<br />
AKH330<br />
HAFNIUM ETHOXIDE 358.73 180-200°/13<br />
C 8 H 20 O 4 <strong>Hf</strong><br />
(178-80°)mp<br />
employed in preparation of refractory hafnia coatings 1 .<br />
1. S. Sim et al in “Ultrastructure Processing of Advanced Ceramics, McKenzie, Wiley,<br />
1988, p995.<br />
HYDROLYTIC SENSITIVITY: 7 reacts slowly with water/moisture<br />
[13428-80-3] HMIS: 2-2-1-X 5.0g/$44.00 25g/$176.00<br />
C 2 H 5 C 2 H 5<br />
C 4 H 9 CHCH 2 O OCH 2 CHC 4 H 9<br />
<strong>Hf</strong><br />
C 4 H 9 CHCH 2 O OCH 2 CHC 4 H 9<br />
H 3 C O H 2 C<br />
C 2 H 5<br />
H 3 C<br />
H 3 C<br />
C<br />
CH 3<br />
O<br />
CH 2<br />
H 3 C CH 3<br />
C<br />
O<br />
O<br />
<strong>Hf</strong><br />
O<br />
C<br />
H 3 C CH 3<br />
CH 2<br />
O<br />
CH 3<br />
C 2 H 5<br />
CH 3<br />
O C CH 2 O CH 3<br />
CH 3<br />
AKH332<br />
HAFNIUM 2-ETHYLHEXOXIDE 678.40<br />
TETRAOCTYLHAFNATE<br />
C 32 H 68 O 4 <strong>Hf</strong><br />
HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/water<br />
HMIS: 2-2-1-X<br />
25g/$50.00<br />
AKH333<br />
HAFNIUM 2-METHOXYMETHYL-2-PROPOXIDE 591.05 120°/1 1.303 1.4570<br />
HAFNIUM MMP (MMP=METHOXY-t-BUTOXIDE)<br />
(-5°)mp<br />
C 20 H 44 O 8 <strong>Hf</strong><br />
flashpoint: 67°C (153°F)<br />
employed in CVD of <strong>Hf</strong>O 21<br />
.<br />
1. P. Williams et al, J. Mater. Chem., 12, 165, 2002<br />
HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/water<br />
[309915-48-8] HMIS: 2-3-1-X 5.0g/$104.00<br />
CH 3<br />
C<br />
HC<br />
C<br />
CH 3<br />
I<br />
I <strong>Hf</strong><br />
I<br />
O<br />
O<br />
I<br />
4<br />
<strong>Hf</strong><br />
AKH335<br />
HAFNIUM 2,4-PENTANEDIONATE 574.91 (82°/.001)sub<br />
C 20 H 28 O 8 <strong>Hf</strong><br />
(193°)mp<br />
HYDROLYTIC SENSITIVITY: 4 no reaction with water under neutral conditions<br />
[17475-67-1] HMIS: 2-1-0-X 10g/$46.00 50g/$184.00<br />
INHF070<br />
HAFNIUM TETRAIODIDE 686.11 (400°)-sub<br />
I 4 <strong>Hf</strong><br />
[13777-23-6] HMIS: 3-2-1-X 10g/$145.00<br />
H 3 C C 2 H 5<br />
N<br />
C CH 2 H 5<br />
3<br />
N <strong>Hf</strong> N<br />
H 3 C<br />
N<br />
C 2 H 5<br />
C 2 H 5 CH 3<br />
OMHF083<br />
HAFNIUM TETRAKIS(ETHYLMETHYLAMIDE) 410.90 78°/0.01 1.324<br />
C 12 H 32 N 4 <strong>Hf</strong><br />
flashpoint: 10°C(50°F)<br />
HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />
[352535-01-4] HMIS: 3-2-1-X 5.0g/$92.00 25g/$368.00<br />
PLEASE INQUIRE ABOUT BULK QUANTITIES<br />
© 2005 <strong>Gelest</strong>, <strong>Inc</strong>.
<strong>Gelest</strong>, <strong>Inc</strong>.<br />
name MW bp/mm (mp) D 4<br />
20<br />
n D<br />
20<br />
AKH345<br />
(CH 3 ) 3 C<br />
C<br />
HC<br />
C<br />
(CH 3 ) 3 C<br />
O<br />
O<br />
<strong>Hf</strong><br />
4<br />
HAFNIUM TETRAMETHYLHEPTANE- 911.57 180°/0.1-sub<br />
DIONATE<br />
(315°)mp<br />
C 44 H 76 O 8 <strong>Hf</strong><br />
soluble: toluene, hexane<br />
HYDROLYTIC SENSITIVITY: 4 no reaction with water under neutral conditions<br />
HMIS: 2-1-0-X<br />
5.0g/$110.00<br />
CF 3<br />
HC<br />
CH 3<br />
C<br />
C<br />
O<br />
O<br />
<strong>Hf</strong><br />
4<br />
AKH350<br />
HAFNIUM TRIFLUOROPENTANEDIONATE 790.82 (115°/0.05)sub<br />
C 20 H 16 O 8 F 12 <strong>Hf</strong><br />
(128-9°)mp<br />
soluble: acetone, cyclohexane<br />
HYDROLYTIC SENSITIVITY: 4 no reaction with water under neutral conditions<br />
[17475-68-2] HMIS: 3-1-0-X 2.5g/$38.00<br />
Cl<br />
<strong>Hf</strong><br />
Cl<br />
OMHF085<br />
HAFNOCENE DICHLORIDE 379.59 (230-3°)mp<br />
C 10 H 10 Cl 2 <strong>Hf</strong><br />
HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/water<br />
[12116-66-4] TSCA HMIS: 2-2-1-X 5.0g/$90.00<br />
H 3 C<br />
H 3 C<br />
Cl<br />
CH 3<br />
CH 3<br />
CH<br />
<strong>Hf</strong> 3<br />
Cl<br />
Cl<br />
OMHF050<br />
PENTAMETHYLCYCLOPENTADIENYL- 420.08<br />
HAFNIUM TRICHLORIDE<br />
C 10 H 15 Cl 3 <strong>Hf</strong><br />
HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />
[75181-08-7] HMIS: 3-2-1-X 1.0g/$80.00 5.0g/$320.00<br />
CH 2<br />
CH 2 <strong>Hf</strong> CH 2<br />
CH 2<br />
OMHF077<br />
TETRABENZYLHAFNIUM 543.02<br />
C 28 H 28 <strong>Hf</strong><br />
color: yellow<br />
HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />
[31406-67-4] HMIS: 3-1-1-X store