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<strong>Gelest</strong>, <strong>Inc</strong>.<br />

Melting<br />

points of<br />

refractory<br />

materials<br />

HAFNIUM<br />

<strong>Hf</strong><br />

Atomic number<br />

72<br />

Atomic weight<br />

178.49<br />

CAS number<br />

7440-58-6<br />

Boiling point<br />

4602°C<br />

Melting point<br />

2227°C<br />

Specific gravity (20°C)<br />

13.31<br />

H 3 C<br />

H 3 C<br />

Cl <strong>Hf</strong><br />

H 3 C<br />

H 3 C<br />

(CH 3 ) 3 Si Cl<br />

N <strong>Hf</strong><br />

(CH 3 ) 3 Si Cl<br />

CH 3<br />

CH 3<br />

CH 3<br />

Cl<br />

CH 3<br />

CH 3<br />

CH 3<br />

Si(CH 3 ) 3<br />

N<br />

Si(CH 3 ) 3<br />

nC 4 H 9 O OnC 4 H 9<br />

<strong>Hf</strong><br />

nC 4 H 9 O OnC 4 H 9<br />

nC 4 H 9 O OnC 4 H 9<br />

<strong>Hf</strong><br />

nC 4 H 9 O OnC 4 H 9<br />

tC 4 H 9 O OtC 4 H 9<br />

<strong>Hf</strong><br />

tC 4 H 9 O OtC 4 H 9<br />

N(CH 2 CH 3 ) 2<br />

(CH 3 CH 2 ) 2 N <strong>Hf</strong> N(CH 2 CH 3 ) 2<br />

N(CH 2 CH 3 ) 2<br />

name MW bp/mm (mp) D 4<br />

20<br />

n D<br />

20<br />

COMPOUNDS<br />

Electrical resistivity (0°C)<br />

29.6µΩ • cm<br />

Enthalpy of melting<br />

25.9kJ/mol<br />

Enthalpy of vaporization<br />

571kJ/mol<br />

Ionization potential<br />

(spectral)<br />

7.0eV (I)<br />

14.9eV (II)<br />

(aqueous) 1.70V (+4)<br />

Oxidation states<br />

0, 4<br />

Electronegativity, Pauling<br />

1.3<br />

Specific heat (25°C)<br />

0.035 cal/g K<br />

Thermal conductivity (25°C)<br />

23.0w/m K<br />

OMHF016<br />

BIS(PENTAMETHYLCYCLOPENTADIENYL)- 519.86 (>300°)mp<br />

HAFNIUM DICHLORIDE<br />

C 20 H 30 Cl 2 <strong>Hf</strong><br />

HYDROLYTIC SENSITIVITY: 4 no reaction with water under neutral conditions<br />

[85959-83-7] HMIS: 3-1-1-X 2.5g/$82.00 10g/$266.00<br />

OMHF066<br />

HAFNIUM BIS(HEXAMETHYLDISILAZIDE)- 570.17<br />

DICHLORIDE<br />

C 12 H 36 Cl 2 N 2 Si 4 <strong>Hf</strong><br />

employed in ALD of hafnium silicate 1 .<br />

1. W. Nam et al, Electrochem. and Solid-State Lett., 7, C55, 2004<br />

HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />

[70969-29-8] HMIS: 3-2-1-X 10g/$120.00<br />

AKH325<br />

HAFNIUM n-BUTOXIDE, 95% 470.95 280-5°/0.01 1.32<br />

C 16 H 36 O 4 <strong>Hf</strong><br />

contains


<strong>Gelest</strong>, <strong>Inc</strong>.<br />

name MW bp/mm (mp) D 4<br />

20<br />

n D<br />

20<br />

CH 3<br />

HC<br />

CH 3<br />

C<br />

C<br />

O<br />

O<br />

2<br />

<strong>Hf</strong><br />

OnC 4 H 9<br />

OnC 4 H 9<br />

AKH328<br />

HAFNIUM DI-n-BUTOXIDE (BIS-2,4- 522.58 1.07 1.4850 25<br />

PENTANEDIONATE), 50% in toluene/n-butanol miscible: isopropanol<br />

C 18 H 32 O 6 <strong>Hf</strong><br />

contains 2.5-3.0% hafnium tri n-butoxidepentanedionate analog<br />

HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/water<br />

HMIS: 2-3-1-X<br />

100g/$52.00<br />

(CH 3 ) 2 N N(CH 3 ) 2<br />

<strong>Hf</strong><br />

(CH 3 ) 2 N N(CH 3 ) 2<br />

CH 3 CH 2 O OCH 2 CH 3<br />

<strong>Hf</strong><br />

CH 3 CH 2 O OCH 2 CH 3<br />

OMHF080<br />

HAFNIUM DIMETHYLAMIDE 354.80 60-2°/0.1 1.40<br />

C 8 H 24 N 4 <strong>Hf</strong><br />

(20°)mp<br />

pale yellow solid<br />

HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />

[19962-11-9] HMIS: 3-3-1-X 5.0g/$146.00<br />

AKH330<br />

HAFNIUM ETHOXIDE 358.73 180-200°/13<br />

C 8 H 20 O 4 <strong>Hf</strong><br />

(178-80°)mp<br />

employed in preparation of refractory hafnia coatings 1 .<br />

1. S. Sim et al in “Ultrastructure Processing of Advanced Ceramics, McKenzie, Wiley,<br />

1988, p995.<br />

HYDROLYTIC SENSITIVITY: 7 reacts slowly with water/moisture<br />

[13428-80-3] HMIS: 2-2-1-X 5.0g/$44.00 25g/$176.00<br />

C 2 H 5 C 2 H 5<br />

C 4 H 9 CHCH 2 O OCH 2 CHC 4 H 9<br />

<strong>Hf</strong><br />

C 4 H 9 CHCH 2 O OCH 2 CHC 4 H 9<br />

H 3 C O H 2 C<br />

C 2 H 5<br />

H 3 C<br />

H 3 C<br />

C<br />

CH 3<br />

O<br />

CH 2<br />

H 3 C CH 3<br />

C<br />

O<br />

O<br />

<strong>Hf</strong><br />

O<br />

C<br />

H 3 C CH 3<br />

CH 2<br />

O<br />

CH 3<br />

C 2 H 5<br />

CH 3<br />

O C CH 2 O CH 3<br />

CH 3<br />

AKH332<br />

HAFNIUM 2-ETHYLHEXOXIDE 678.40<br />

TETRAOCTYLHAFNATE<br />

C 32 H 68 O 4 <strong>Hf</strong><br />

HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/water<br />

HMIS: 2-2-1-X<br />

25g/$50.00<br />

AKH333<br />

HAFNIUM 2-METHOXYMETHYL-2-PROPOXIDE 591.05 120°/1 1.303 1.4570<br />

HAFNIUM MMP (MMP=METHOXY-t-BUTOXIDE)<br />

(-5°)mp<br />

C 20 H 44 O 8 <strong>Hf</strong><br />

flashpoint: 67°C (153°F)<br />

employed in CVD of <strong>Hf</strong>O 21<br />

.<br />

1. P. Williams et al, J. Mater. Chem., 12, 165, 2002<br />

HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/water<br />

[309915-48-8] HMIS: 2-3-1-X 5.0g/$104.00<br />

CH 3<br />

C<br />

HC<br />

C<br />

CH 3<br />

I<br />

I <strong>Hf</strong><br />

I<br />

O<br />

O<br />

I<br />

4<br />

<strong>Hf</strong><br />

AKH335<br />

HAFNIUM 2,4-PENTANEDIONATE 574.91 (82°/.001)sub<br />

C 20 H 28 O 8 <strong>Hf</strong><br />

(193°)mp<br />

HYDROLYTIC SENSITIVITY: 4 no reaction with water under neutral conditions<br />

[17475-67-1] HMIS: 2-1-0-X 10g/$46.00 50g/$184.00<br />

INHF070<br />

HAFNIUM TETRAIODIDE 686.11 (400°)-sub<br />

I 4 <strong>Hf</strong><br />

[13777-23-6] HMIS: 3-2-1-X 10g/$145.00<br />

H 3 C C 2 H 5<br />

N<br />

C CH 2 H 5<br />

3<br />

N <strong>Hf</strong> N<br />

H 3 C<br />

N<br />

C 2 H 5<br />

C 2 H 5 CH 3<br />

OMHF083<br />

HAFNIUM TETRAKIS(ETHYLMETHYLAMIDE) 410.90 78°/0.01 1.324<br />

C 12 H 32 N 4 <strong>Hf</strong><br />

flashpoint: 10°C(50°F)<br />

HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />

[352535-01-4] HMIS: 3-2-1-X 5.0g/$92.00 25g/$368.00<br />

PLEASE INQUIRE ABOUT BULK QUANTITIES<br />

© 2005 <strong>Gelest</strong>, <strong>Inc</strong>.


<strong>Gelest</strong>, <strong>Inc</strong>.<br />

name MW bp/mm (mp) D 4<br />

20<br />

n D<br />

20<br />

AKH345<br />

(CH 3 ) 3 C<br />

C<br />

HC<br />

C<br />

(CH 3 ) 3 C<br />

O<br />

O<br />

<strong>Hf</strong><br />

4<br />

HAFNIUM TETRAMETHYLHEPTANE- 911.57 180°/0.1-sub<br />

DIONATE<br />

(315°)mp<br />

C 44 H 76 O 8 <strong>Hf</strong><br />

soluble: toluene, hexane<br />

HYDROLYTIC SENSITIVITY: 4 no reaction with water under neutral conditions<br />

HMIS: 2-1-0-X<br />

5.0g/$110.00<br />

CF 3<br />

HC<br />

CH 3<br />

C<br />

C<br />

O<br />

O<br />

<strong>Hf</strong><br />

4<br />

AKH350<br />

HAFNIUM TRIFLUOROPENTANEDIONATE 790.82 (115°/0.05)sub<br />

C 20 H 16 O 8 F 12 <strong>Hf</strong><br />

(128-9°)mp<br />

soluble: acetone, cyclohexane<br />

HYDROLYTIC SENSITIVITY: 4 no reaction with water under neutral conditions<br />

[17475-68-2] HMIS: 3-1-0-X 2.5g/$38.00<br />

Cl<br />

<strong>Hf</strong><br />

Cl<br />

OMHF085<br />

HAFNOCENE DICHLORIDE 379.59 (230-3°)mp<br />

C 10 H 10 Cl 2 <strong>Hf</strong><br />

HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/water<br />

[12116-66-4] TSCA HMIS: 2-2-1-X 5.0g/$90.00<br />

H 3 C<br />

H 3 C<br />

Cl<br />

CH 3<br />

CH 3<br />

CH<br />

<strong>Hf</strong> 3<br />

Cl<br />

Cl<br />

OMHF050<br />

PENTAMETHYLCYCLOPENTADIENYL- 420.08<br />

HAFNIUM TRICHLORIDE<br />

C 10 H 15 Cl 3 <strong>Hf</strong><br />

HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />

[75181-08-7] HMIS: 3-2-1-X 1.0g/$80.00 5.0g/$320.00<br />

CH 2<br />

CH 2 <strong>Hf</strong> CH 2<br />

CH 2<br />

OMHF077<br />

TETRABENZYLHAFNIUM 543.02<br />

C 28 H 28 <strong>Hf</strong><br />

color: yellow<br />

HYDROLYTIC SENSITIVITY: 8 reacts rapidly with moisture, water, protic solvents<br />

[31406-67-4] HMIS: 3-1-1-X store

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