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ight half is uncoated.<br />

Measurements<br />

So far, only a limited number of measurements have<br />

been made. We will present the preliminary results and<br />

some preliminary conclusions. More extensive<br />

measurements are needed to make definite suggestions and<br />

conclusions.<br />

A measurement sequence determining responsivitiy change<br />

with applied oxide bias at selected wavelengths is<br />

presented in fig. 2. The responsivity change saturates with<br />

oxide bias approaching 30 V. The saturation level is a<br />

measure of the IQD caused by recombination losses<br />

between the oxide and the pn junction of the diode.<br />

to the reflectance from the surface of the detector caused<br />

most likely by differences in the oxide thickness. In the<br />

next generation of these detectors a different process for<br />

the growth of the oxide layer is needed.<br />

The detectors and the thin layer of gold have a relatively<br />

large surface. A criterion to succeed with the proposed<br />

method is that the gold bias saturates the IQE uniformly.<br />

We measured the difference in uniformity with 30 V gold<br />

bias and without bias. The results are presented in fig. 4<br />

and shows that the change is relatively uniform taken into<br />

account that a semiconductor laser was used in the<br />

characterization.<br />

Change in responsivity [%]<br />

5<br />

4<br />

3<br />

2<br />

1<br />

400<br />

420<br />

440<br />

460<br />

0<br />

0 10 20 30 40<br />

Applied bias of gold [V]<br />

Figure 2. The responsivity change with applied oxide bias<br />

at selected wavelengths between 400 and 460 nm is<br />

presented.<br />

The uniformity of the detector responsivity is critical in<br />

order to achieve the highest possible accuracy. The<br />

uniformity of the detector measured with a semiconductor<br />

laser at 405 nm. Simultaneously, the spatial reflectance<br />

was measured allowing decomposition of the loss<br />

mechanisms and determination of the source of the<br />

nonuniformity. In fig. 3 the measured uniformity (a) and<br />

spatial reflectance (b) is presented.<br />

Figure 4. The uniformity change with an applied oxide<br />

bias of 30 V.<br />

Preliminary conclusions<br />

So far, promising results of the principles have been<br />

obtained. The responsivity changes with oxide bias have<br />

been as predicted. The uniformity of the detectors was<br />

poorer than expected, making the ones tested so far<br />

unsuited as single detector standards. However, since the<br />

reason for the nonuniformity is variations in the<br />

reflectance, mounting two detectors in a wedge trap<br />

configuration is likely to make the detectors suitable for<br />

calibration purposes as well. It is highly likely that the<br />

uniformity can be improved in the next generation of<br />

detectors. More extensive measurements and comparison<br />

to the CR will be presented at the conference. In addition,<br />

necessary corrections and caution with the method will be<br />

presented.<br />

Acknowledgments This project is partly financed by<br />

the Nordic Innovations Center (NICe).<br />

(a)<br />

Figure 3. The detector uniformity (a) and spatial<br />

reflectance (b) is presented.<br />

We note that the nonuniformity as shown in fig. 3 (a) is in<br />

the order of 4 %. This high nonuniformity does not make<br />

the detector suited as a standard. The uniformity<br />

measurement shows that in areas where the responsivity is<br />

high we have a dip in the reflectance and vice versa.<br />

Therefore, the reason for the nonuniformity is mainly due<br />

(b)<br />

References<br />

Zalewski, E. F., Geist, J., Silicon photodiode absolute spectral<br />

response self-calibration, Appl. Optics, 19, 1214 – 1216, 1980.<br />

Verdebout, J., Booker R. L., Degradation of native oxide<br />

passivated silicon photodiodes by repeated oxide bias, J. Appl.<br />

Phys., 55, 406-412, 1984.<br />

Gentile T. R., Houston J. M., Cromer C. L., Realization of a scale<br />

of absolute spectral response using the National Institute of<br />

Standards and Technology high-accuracy cryogenic<br />

radiometer, Appl. Optics, 35, 4392-4403, 1996.<br />

Haapalinna A., Kärhä P., Ikonen E., Spectral reflectance of<br />

silicon photodiodes, Appl. Optics, 37, 729-732, 1998.<br />

64

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