Here - PMOD/WRC
Here - PMOD/WRC
Here - PMOD/WRC
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ight half is uncoated.<br />
Measurements<br />
So far, only a limited number of measurements have<br />
been made. We will present the preliminary results and<br />
some preliminary conclusions. More extensive<br />
measurements are needed to make definite suggestions and<br />
conclusions.<br />
A measurement sequence determining responsivitiy change<br />
with applied oxide bias at selected wavelengths is<br />
presented in fig. 2. The responsivity change saturates with<br />
oxide bias approaching 30 V. The saturation level is a<br />
measure of the IQD caused by recombination losses<br />
between the oxide and the pn junction of the diode.<br />
to the reflectance from the surface of the detector caused<br />
most likely by differences in the oxide thickness. In the<br />
next generation of these detectors a different process for<br />
the growth of the oxide layer is needed.<br />
The detectors and the thin layer of gold have a relatively<br />
large surface. A criterion to succeed with the proposed<br />
method is that the gold bias saturates the IQE uniformly.<br />
We measured the difference in uniformity with 30 V gold<br />
bias and without bias. The results are presented in fig. 4<br />
and shows that the change is relatively uniform taken into<br />
account that a semiconductor laser was used in the<br />
characterization.<br />
Change in responsivity [%]<br />
5<br />
4<br />
3<br />
2<br />
1<br />
400<br />
420<br />
440<br />
460<br />
0<br />
0 10 20 30 40<br />
Applied bias of gold [V]<br />
Figure 2. The responsivity change with applied oxide bias<br />
at selected wavelengths between 400 and 460 nm is<br />
presented.<br />
The uniformity of the detector responsivity is critical in<br />
order to achieve the highest possible accuracy. The<br />
uniformity of the detector measured with a semiconductor<br />
laser at 405 nm. Simultaneously, the spatial reflectance<br />
was measured allowing decomposition of the loss<br />
mechanisms and determination of the source of the<br />
nonuniformity. In fig. 3 the measured uniformity (a) and<br />
spatial reflectance (b) is presented.<br />
Figure 4. The uniformity change with an applied oxide<br />
bias of 30 V.<br />
Preliminary conclusions<br />
So far, promising results of the principles have been<br />
obtained. The responsivity changes with oxide bias have<br />
been as predicted. The uniformity of the detectors was<br />
poorer than expected, making the ones tested so far<br />
unsuited as single detector standards. However, since the<br />
reason for the nonuniformity is variations in the<br />
reflectance, mounting two detectors in a wedge trap<br />
configuration is likely to make the detectors suitable for<br />
calibration purposes as well. It is highly likely that the<br />
uniformity can be improved in the next generation of<br />
detectors. More extensive measurements and comparison<br />
to the CR will be presented at the conference. In addition,<br />
necessary corrections and caution with the method will be<br />
presented.<br />
Acknowledgments This project is partly financed by<br />
the Nordic Innovations Center (NICe).<br />
(a)<br />
Figure 3. The detector uniformity (a) and spatial<br />
reflectance (b) is presented.<br />
We note that the nonuniformity as shown in fig. 3 (a) is in<br />
the order of 4 %. This high nonuniformity does not make<br />
the detector suited as a standard. The uniformity<br />
measurement shows that in areas where the responsivity is<br />
high we have a dip in the reflectance and vice versa.<br />
Therefore, the reason for the nonuniformity is mainly due<br />
(b)<br />
References<br />
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response self-calibration, Appl. Optics, 19, 1214 – 1216, 1980.<br />
Verdebout, J., Booker R. L., Degradation of native oxide<br />
passivated silicon photodiodes by repeated oxide bias, J. Appl.<br />
Phys., 55, 406-412, 1984.<br />
Gentile T. R., Houston J. M., Cromer C. L., Realization of a scale<br />
of absolute spectral response using the National Institute of<br />
Standards and Technology high-accuracy cryogenic<br />
radiometer, Appl. Optics, 35, 4392-4403, 1996.<br />
Haapalinna A., Kärhä P., Ikonen E., Spectral reflectance of<br />
silicon photodiodes, Appl. Optics, 37, 729-732, 1998.<br />
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