量子電腦 - 中研院物理研究所
量子電腦 - 中研院物理研究所
量子電腦 - 中研院物理研究所
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Quantum Interferometric Optical Lithography: Exploiting<br />
Entanglement to Beat the Diffraction Limit<br />
Agedi N. Boto,1 Pieter Kok,2 Daniel S. Abrams,1 Samuel L. Braunstein,2<br />
Colin P. Williams,1 and Jonathan P. Dowling1,* PRL 85, 2733 (2000)<br />
Two-Photon Diffraction and Quantum Lithography<br />
Milena D’Angelo, Maria V. Chekhova,* and Yanhua Shih PRL 87, 13602 (2001)<br />
量 子 光 學 平 版 印 刷 術<br />
Two-photon pattern has a faster<br />
spatial interference modulation and<br />
a narrower diffraction pattern width<br />
by a factor of 2 than the classical<br />
l<br />
case.
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