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如何寫好報告 - 中研院物理研究所

如何寫好報告 - 中研院物理研究所

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Sample Structures<br />

5×InGaN/GaN QWs<br />

Growth conditions<br />

MQW25 Wells and barriers grown at 715℃<br />

n-GaN 2.48μm<br />

MQW27 Wells and barriers grown at 700℃<br />

MQW28 Wells and barriers grown at 685℃<br />

Al 2 O 3 (0001)<br />

MQW29<br />

Wells grown at 685℃, barriers<br />

grown at 800℃, with H 2 flow added<br />

in growing barriers<br />

Nucleation layer: 20nm<br />

(amorphous)<br />

Carrier gas: N 2<br />

Precursors: (C 2 H 5 ) 3 Ga and (CH 3 ) 3 In<br />

Growth temperatures<br />

Nucleation layer:<br />

530℃<br />

n-GaN: 1070℃<br />

Thickness<br />

Barrier: 15 nm<br />

Well: 3.5 nm

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