CORROSION RESISTANCE OF HASTEllOY®AllOYS - Haynes ...

Type
316
Concen- Temperature HASTELlOY~ alloy Staintration,
less
Corrosive Media percent deg. F deg. C 8/8-2 C/C-276 G/G-3 Steel Conditions
Hydrofluoric Acid - 140-165 60-74 - G - U 11·13% fluosilicic acid plus undescribed impurities from wet process
phosphoric acid. Liq uid phase, extensive aeration
Hydrofluoric Acid 0-100 ·10 to 300 ·23 to 149 8 8 - S H2S0 4, 100·0%
(Anhydrous)
Hydrofluoric Acid - - 68 20 - 8 - - HF·8F] (as catalyst) plus liquid aromatic hydrocarbons
8arium Fluoride - 248 120 - 8 - -
Hydrofluoric Acid (80ron - ·6 ·21 - G - - plus liquid aromatic hydrocarbons (ortho·, para·, and meta xylene plus
Trifluoride Catalyst) 68 20 - 8 - - ethyl benzene}
176 80 - 8 - -
248 120 - 8 - -
Hydrofluoric Acid, 60 80iling 80iling - S - - 4 days, vapor phase purged with 1%oxygen, rest nitrogen.
Chemical pure
Hydrofluoric Acid 10 Ambient Ambient - G - - 30 days
Conditions 20 Ambient Ambient - G - -
48 Ambient Ambient - G - -
Hydrofluoric Acid - 176 80 - E - G (except HNO]·HF) polymerization of a proprietary organic in an aromatic
Mixtures
solvent with a 8F] catalyst. HF & possibly f1uoborates present. Open to
moisture and air. HF attacked glass in vapor area and glass has spalled
from surface during 350 hrs. of actual exposure, extensive aeration
Hydrofluoric Acid 40 65 18 - G - S 40% H2S0 4 , 20% H20. moderate aeration
Mixtures
Hydrofluoric Acid - ·10 to 300 ·23 to 149 - 8 - G (except HNOrHF) anhydrous hydrofluoric acid 0 to 100%; sulfuric acid,
Mixtures concentration 100 to 0%
Hydrofluosilicic Acid 9 120 49 8 G - 8 spool failed
Hydrofluosilicic Acid 10·11 160 71 - - E - impurities from wet process phosphoric acid.
Hydrofluosilicic Acid 12·13 160 71 - - G - impurities from wet process phosphoric acid.
Hydrofluosilicic Acid 30 100 38 S - - - plus 22 percent hydrofluoric acid and 0.06 percent H2S0 4 in hydrofluoric
acid production
Hydrofluosilicic Acid 35 80 27 - G - - plus 4.7 percent NaCI solution becomes saturated with Na2' SiF 6 • Alloy C=
3.2 mpy
Hydrofluosilicic Acid - 165 74 8 G G 8 12·13%, with impurities from wet process phosphoric acid, some
suspended
Hydrofluosilicic Acid - - - U G E U 10·11 %, with impurities from wet process phosphoric acid, some
suspended, aeration
Hydrofluosilicic Acid - 55 13 - G - G salt water (from estuary), silicon tetrafluoride, phosphoric acid, air; pH 1
Fumes to 2
Hydrogen 100 to 700 to 371 - E - -
Hydrogen Chloride - 200-800 93-426 - G - - HCI resulting from the decomposition of all types of wire insulation, in·
eluding polyvinylchloride·cooling water spray.
Hydrogen Chloride 95 oto 50 ·18 to 10 G G - - plus 3 percent acetyl chloride and 2 percent acetic acid vapors. Alloy C=
7.6 mpy
Hydrogen Chloride 100 to 800 to 427 S - - -
Hydrogen Chloride - 289 143 S* E - - plus anhydrous organo·chlorosilanes and amines, *Alloy 8 = 1.6 mpy in
liquid and 15 mpy in vapor.
Hydrogen Chloride, Dry - 572 300 E E - - plus caustic soda in plastic synthesis. Alloy C = 0.01 mpy
Hydrogen Chloride - 75 24 - E - - moisture in gases evolved, concentration low but not specified. Industrial
atmosphere, considerable aeration
Hydrogen Chloride - 110 43 E - - G vapor (almost all HCI) feed to fractionator is normally 0.4% HCI. 70%
phosgene (COCI2) and 23.6% monochlorobenzene.
Hydrogen Chloride and - 600 316 - G - -
other gases and vapors,
unidentified
Hydrogen Chloride and - 800 427 - G - 8
other gases and vapors,
unidentified
E- Less than 2 mpy (0.05 mm/y)
G - 2 mpy (0.05 mm/y) to 10 mpy (0.25 mm/y)
S - Over 10 mpy (0.25 mm/y) to 20 mpy (0.51 mm/y)
8 - Over 20 mpy (0.51 mm/y) to 50 mpy (1.27 mm/y)
U - More than 50 mpy (1.27 mm/y)
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