Films minces à base de Si nanostructuré pour des cellules ...
Films minces à base de Si nanostructuré pour des cellules ... Films minces à base de Si nanostructuré pour des cellules ...
tel-00916300, version 1 - 10 Dec 2013 (a) Brewster incidence. (b) Normal Incidence. Figure 3.10: FTIR Spectra- Eect of P Si on the SRSO lm structure. and it decreases further with increasing P Si . This indicates that the samples are more Si-rich as compared with the other two methods. The high refractive index achieved by this method proves that the host matrix is SiO x rather than SiO 2 . This explains the decrease of the LO 3 peak intensity. A curve tting performed on each of these curves lead to three peaks around 1190 cm −1 , 1107 cm −1 and 1070 cm −1 respectively. The 1107 cm −1 peak intensity decreases which could be attributed to a lower interstitial oxygen formation with increasing Si excess that might favour pure Si agglomerates. The normal incidence spectra in gure 3.10b shows the constant position of TO 3 peak. This indicates that most of the Si excess forms agglomerates even in the lowest P Si case. The hydrogen-related peak is visible in all the cases as seen from Brewster incidence spectra, though in method 1 this peak almost disappeared for T d = 500°C. (c) Si excess estimation The Si excess (unbonded Si) estimated by FTIR is around 5 at.%±0.2% in all the samples, due to the constant TO 3 peak positions. Table 3.6 consolidates the results estimated from refractive index using Bruggemann method within an uncertainity of ±3%. 74
P Si (W/cm 2 ) x = 0/Si Bruggemann Si excess (at.%) vol. fraction from refractive index (agglomerated) 1.62 1.33 15.28 1.77 1.2 18.89 2.07 1.08 23.08 2.22 1.04 24.34 2.37 1.04 24.34 2.66 1.029 24.9 2.96 0.943 28.18 Table 3.6: Si excess estimation (agglomerated Si) from Bruggemann method. tel-00916300, version 1 - 10 Dec 2013 It can be seen that the Si excess values are high as estimated from Bruggeman method, than the other two methods. Besides, it can be seen that there is minimal variation in Si excess for cases of intermediate values of P Si : 2.07 to 2.66 W/cm 2 . 3.4.2 Eect of annealing From the above investigations, it is clear that SRSO grown by method 3 incorporates the highest Si excess compared to the other two methods. The eect of annealing on the material properties has to be analyzed before nalizing the method 3 SRSO for multilayers. A high Si excess may result in formation of big Si-np leading to loss of the desired quantum connement eects whereas a low Si excess would mean lower absorption coecient which is not suitable for the objective of this work. Therefore SRSO sample with intermediate parameters of r H = 26% and P Si = 2.22 W/cm 2 were chosen in order to balance between deposition rate and Si excess. T d = 500°C was chosen since it was demonstrated in this work that this temperature favours Si excess, and also forms some Si-np in the as-grown state as reported in [Hijazi 09a]. The SRSO sample with these optimized parameters are analyzed for structural and optical properties with regard to annealing. This sample will be referred as SRSO-P15 in the forthcoming discussions. The thickness and refractive index at 1.95 eV of this sample as estimated from ellipsometry are 565 nm and 2.02 respectively. According to RBS results 2 , this sample is SiO x=0.72 with 37 at.% Si excess. Five pieces of this sample were annealed at 1000°C during 1 minute, and at 700°C, 900°C, 1000°C and 1100°C during 1 hour in N 2 atmosphere. Unless stated otherwise, all the studies in this section are carried out on SRSO-P15. 2 RBS analyses were made by J. Perriére at UNIV PARIS 06, INSP NANOSCIENCE PARIS, CNRS, UMR 7588, F-75015, Paris, France. 75
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P <strong>Si</strong> (W/cm 2 )<br />
x = 0/<strong>Si</strong><br />
Bruggemann<br />
<strong>Si</strong> excess (at.%)<br />
vol. fraction<br />
from refractive<br />
in<strong>de</strong>x<br />
(agglomerated)<br />
1.62 1.33 15.28<br />
1.77 1.2 18.89<br />
2.07 1.08 23.08<br />
2.22 1.04 24.34<br />
2.37 1.04 24.34<br />
2.66 1.029 24.9<br />
2.96 0.943 28.18<br />
Table 3.6: <strong>Si</strong> excess estimation (agglomerated <strong>Si</strong>) from Bruggemann method.<br />
tel-00916300, version 1 - 10 Dec 2013<br />
It can be seen that the <strong>Si</strong> excess values are high as estimated from Bruggeman<br />
method, than the other two methods. Besi<strong>de</strong>s, it can be seen that there is minimal<br />
variation in <strong>Si</strong> excess for cases of intermediate values of P <strong>Si</strong> : 2.07 to 2.66 W/cm 2 .<br />
3.4.2 Eect of annealing<br />
From the above investigations, it is clear that SRSO grown by method 3 incorporates<br />
the highest <strong>Si</strong> excess compared to the other two methods. The eect of annealing<br />
on the material properties has to be analyzed before nalizing the method 3 SRSO<br />
for multilayers. A high <strong>Si</strong> excess may result in formation of big <strong>Si</strong>-np leading to<br />
loss of the <strong>de</strong>sired quantum connement eects whereas a low <strong>Si</strong> excess would mean<br />
lower absorption coecient which is not suitable for the objective of this work.<br />
Therefore SRSO sample with intermediate parameters of r H = 26% and P <strong>Si</strong> = 2.22<br />
W/cm 2 were chosen in or<strong>de</strong>r to balance between <strong>de</strong>position rate and <strong>Si</strong> excess. T d<br />
= 500°C was chosen since it was <strong>de</strong>monstrated in this work that this temperature<br />
favours <strong>Si</strong> excess, and also forms some <strong>Si</strong>-np in the as-grown state as reported in<br />
[Hijazi 09a]. The SRSO sample with these optimized parameters are analyzed for<br />
structural and optical properties with regard to annealing. This sample will be<br />
referred as SRSO-P15 in the forthcoming discussions. The thickness and refractive<br />
in<strong>de</strong>x at 1.95 eV of this sample as estimated from ellipsometry are 565 nm and 2.02<br />
respectively. According to RBS results 2 , this sample is <strong>Si</strong>O x=0.72 with 37 at.% <strong>Si</strong><br />
excess. Five pieces of this sample were annealed at 1000°C during 1 minute, and at<br />
700°C, 900°C, 1000°C and 1100°C during 1 hour in N 2 atmosphere. Unless stated<br />
otherwise, all the studies in this section are carried out on SRSO-P15.<br />
2 RBS analyses were ma<strong>de</strong> by J. Perriére at UNIV PARIS 06, INSP NANOSCIENCE PARIS,<br />
CNRS, UMR 7588, F-75015, Paris, France.<br />
75