Films minces à base de Si nanostructuré pour des cellules ...

of plasma in the chamber. Figure 2.1 illustrates the various processes that occur
during a magnetron sputtering using a schematic diagram of the process.
tel-00916300, version 1 - 10 Dec 2013
Figure 2.1: Photo of the AJA Sputter chamber with glowing plasma and the diagrammatic
representation of various processes during sputtering.
Two halogen lamps provide heat to the rear side of the sample holder and helps
to maintain the temperatures between ambient and 850°C. Therefore the samples
can be deposited at any of these temperatures.
2.1.2 Sample preparation
All the samples were deposited on a 2 inch boron doped Si wafer with 5-15 Ω.cm
resistivity provided by SILTRONIX [Siltronix 1]. Few samples were also grown on
a fused silica substrate to facilitate characterization through optical spectroscopy.
The three methods of deposition techniques used in this thesis (reactive sputtering,
co-sputtering and reactive co-sputtering) are illustrated in gure 2.2.
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