Films minces à base de Si nanostructuré pour des cellules ...

More documents

Recommendations

Info

(a) Inuence of various values for cross-sections and width on the PL spectra. (b) PL spectra from trial 3. tel-00916300, version 1 - 10 Dec 2013 Figure 5.22: Theoretically modeled spectra considering double kind of emitters. The inset of sub-gure (b) shows the lorentzian t performed on the PL spectra from trial 3. The details of all the trials are given in Appendix II. the PL band. Therefore, the tting results on gure 5.22b conrm that, it is the existence of two kinds of emitters that lead to emission in SRSO/SiO 2 ML in the range of investigation. 5.5.2 Inuence of t SiO2 on the PL intensity The role of SiO 2 as a barrier was explained in chapter 3, using which the PL spectra were also interpreted. Since it is shown in this chapter that the pump prole varies along the depth of penetration, it is clear that other factors also contribute to the emission intensity variation. Figures 5.23(a-e) show the pump prole and the distribution of emitters in the excited state N 3 (x), with varying t SiO2 . From N 3 (x), we can identify the SiO 2 sublayer positions where N 3 (x) = 0. The ve cases presented in this gure refer to SRSO/SiO 2 MLs with a constant density of emitters restricted within 3 nm SRSO sublayers. With increasing total thickness as a consequence of increasing t SiO2 , the pump prole also evolves from almost two maxima to ve maxima when t SiO2 changes from 1.5 nm to 10 nm. It can also be seen from these gures that the distribution of emitters varies between maxima to minima in accordance with the pump prole. 160
(a) 50(3/1.5) (b) 50(3/3) tel-00916300, version 1 - 10 Dec 2013 (c) 50(3/5) (d) 50(3/8) (e) 50(3/10) Figure 5.23: (a)-(e) Simulated pump prole and excited state distribution of 50(3/t SiO2 ) where t SiO2 varies between 1.5 nm to 10 nm. 161
Page 1 and 2:
UNIVERSITÉ de CAEN BASSE-NORMANDIE
Page 3 and 4:
tel-00916300, version 1 - 10 Dec 20
Page 5 and 6:
2.1.1 Radiofrequency Magnetron Reac
Page 7 and 8:
tel-00916300, version 1 - 10 Dec 20
Page 9 and 10:
tel-00916300, version 1 - 10 Dec 20
Page 11 and 12:
3.21 Inuence of sublayer thicknesse
Page 13 and 14:
tel-00916300, version 1 - 10 Dec 20
Page 15 and 16:
tel-00916300, version 1 - 10 Dec 20
Page 17 and 18:
tel-00916300, version 1 - 10 Dec 20
Page 19 and 20:
Introduction State of the art tel-0
Page 21 and 22:
as the thickness of the lm, the pat
Page 23 and 24:
Chapter 1 Role of Silicon in Photov
Page 25 and 26:
mono-, poly- and amorphous silicon,
Page 27 and 28:
Figure 1.3: A typical solar cell ar
Page 29 and 30:
occurance of this three body event
Page 31 and 32:
tel-00916300, version 1 - 10 Dec 20
Page 33 and 34:
Shockley-Queisser limit of 31% [Sho
Page 35 and 36:
tel-00916300, version 1 - 10 Dec 20
Page 37 and 38:
tel-00916300, version 1 - 10 Dec 20
Page 39 and 40:
tel-00916300, version 1 - 10 Dec 20
Page 41 and 42:
Figure 1.12: materials. Energy diag
Page 43 and 44:
tel-00916300, version 1 - 10 Dec 20
Page 45 and 46:
Background of this thesis: A new me
Page 47 and 48:
Chapter 2 Experimental techniques a
Page 49 and 50:
maximum power into the plasma. (a)
Page 51 and 52:
Figure 2.2: Illustration of sample
Page 53 and 54:
Ray Diraction, X-Ray Reectivity, El
Page 55 and 56:
(a) Normal Incidence. (b) Oblique (
Page 57 and 58:
to equation 2.4, when X-ray beam st
Page 59 and 60:
investigation. This value is obtain
Page 61 and 62:
e seen that large θ (here, θ is u
Page 63 and 64:
Figure 2.12: Raman spectrometer-Sch
Page 65 and 66:
Experimental set-up and working tel
Page 67 and 68:
ˆ The presence of Si from SiO 2 or
Page 69 and 70:
2.2.7 Spectroscopic Ellipsometry Pr
Page 71 and 72:
k(E) = f j(ω − ω g ) 2 (ω −
Page 73 and 74:
tel-00916300, version 1 - 10 Dec 20
Page 75 and 76:
Figure 2.20: Schematic diagram of t
Page 77 and 78:
Chapter 3 A study on RF sputtered S
Page 79 and 80:
(a) Deposition rate. (b) Refractive
Page 81 and 82:
Thus, by knowing the refractive ind
Page 83 and 84:
tel-00916300, version 1 - 10 Dec 20
Page 85 and 86:
P Ar (mTorr) P H2 (mTorr) r H (%) 1
Page 87 and 88:
such a peak was witnessed in [Quiro
Page 89 and 90:
the host SiO 2 matrix leading to an
Page 91 and 92:
initiated in this thesis, for the g
Page 93 and 94:
P Si (W/cm 2 ) x = 0/Si Bruggemann
Page 95 and 96:
tel-00916300, version 1 - 10 Dec 20
Page 97 and 98:
Figure 3.15: Absorption coecient cu
Page 99 and 100:
Aim of the study To see the inuence
Page 101 and 102:
tel-00916300, version 1 - 10 Dec 20
Page 103 and 104:
It can be seen that there is a sign
Page 105 and 106:
tel-00916300, version 1 - 10 Dec 20
Page 107 and 108:
3.8.4 Inuence of SiO 2 barrier thic
Page 109 and 110:
Chapter 4 A study on RF sputtered S
Page 111 and 112:
4.2.2 Structural analysis (a) Fouri
Page 113 and 114:
tel-00916300, version 1 - 10 Dec 20
Page 115 and 116:
tel-00916300, version 1 - 10 Dec 20
Page 117 and 118:
tel-00916300, version 1 - 10 Dec 20
Page 119 and 120:
(a) FTIR spectra of NRSN, Si 3 N 4
Page 121 and 122:
tel-00916300, version 1 - 10 Dec 20
Page 123 and 124:
Figure 4.15: Absorption coecient sp
Page 125 and 126:
A multilayer composed of 100 patter
Page 127 and 128: multilayered conguration. Therefore
Page 129 and 130: around 1250 cm −1 . The blueshift
Page 131 and 132: tel-00916300, version 1 - 10 Dec 20
Page 133 and 134: tion but within a dierence of one o
Page 135 and 136: sample peak 1 (eV) peak 2 (eV) peak
Page 137 and 138: (a) 1min annealing vs. T A . (b) 1h
Page 141 and 142: (a) Brewster incidence. (b) Normal
Page 145 and 146: increases for the 50 patterned samp
Page 147 and 148: - Peak (3) and (c): 1.8-1.95 eV Die
Page 149 and 150: 4.10.2 Eect of Si-np Size distribut
Page 155 and 156: Chapter 5 Photoluminescence emissio
Page 157 and 158: As seen from gure 5.1, a part of th
Page 159 and 160: function of wavelength consists of
Page 163 and 164: In the case of our multilayers, the
Page 165 and 166: ⎛ ⎜ ⎝ A ′ 2 B ′ 2 1 ⎞
Page 167 and 168: dN 3 dt = N 2 τ 23 − (σ em. φ
Page 169 and 170: Figure 5.12: The shapes of k(λ) an
Page 171 and 172: 5.4 Discussion on the choice of inp
Page 173 and 174: tting operations show the presence
Page 175 and 176: (a) 270nm. (b) 300nm. tel-00916300,
Page 177: (a) σ emis.max. = 8.78 x 10 −18
Page 181 and 182: (a) Integrated population of excite
Page 183 and 184: two kinds of emitters in SRSO subla
Page 185 and 186: Conclusion and future perspectives
Page 187 and 188: 4. Investigating the origin of phot
Page 189 and 190: Bibliography [Abeles 83] B. Abeles
Page 191 and 192: [Carlson 76] D. E. Carlson & C. R.
Page 193 and 194: [Di 10] D. Di, I. Perez-Wur, G. Con
Page 195 and 196: [Gritsenko 99] V. A. Gritsenko, K.
Page 197 and 198: [Kaiser 56] W. Kaiser, P. H. Kech &
Page 199 and 200: [Mandelkorn 62] J. Mandelkorn, C. M
Page 201 and 202: [Pavesi 00] L. Pavesi, L. D. Negro,
Page 203 and 204: [Sopori 96] B. L. Sopori, X. Deng,
Page 205 and 206: [Weng 93] Y. M. Weng, Zh. N. fan &
Page 207 and 208: and the tangential components of th
Page 209 and 210: Appendix II Trials σ em.max (x10
Page 211: Résumé tel-00916300, version 1 -
show all

Films minces à base de Si nanostructuré pour des cellules ...

Create successful ePaper yourself

Delete template?

Save as template?