Films minces à base de Si nanostructuré pour des cellules ...

Films minces à base de Si nanostructuré pour des cellules ... Films minces à base de Si nanostructuré pour des cellules ...

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the values from literatures for band to band recombinations in Si-np. Therefore, the carrier lifetime (τ 34 ) is xed as 50 µs in all the simulations. The time taken for fast radiative transitions to reach a maximum density of excited carriers (τ 23 ) and the time to deexcite to ground state (τ 41 ) are xed arbitrarily as 100 and 500 ps respectively. 5.4.3 Absorption and emission wavelengths tel-00916300, version 1 - 10 Dec 2013 Figure 5.15: Extinction coecient curves as a function of wavelength obtained from ellipsometry and UV-Visible spectrophotometry. The absorption wavelength of Si-np was estimated by tting the absorption k (λ) curves (obtained from ellipsometry and UV-Vis spectrophotometry 3 ) using Forouhi-Bloomer model [Forouhi 86]. Figure 5.15 shows the typical example of k (λ) curves, obtained with SRSO/SRSN ML. The maximum absorption of the material is centered around 260 nm (4.76 eV). Similar curves were obtained also with SRSO/SiO 2 MLs. Hence, it is valid to link this absorption wavelength at 260 nm to Si-np absorption as the SRSO sublayer containing Si-np is the common sublayer in both MLs. The emission of Si-np mostly ranges between 720-830 nm (1.5 eV-1.7 eV) as demonstrated experimentally in our layers in the previous chapters. Hence in the modeling, the emission wavelength is xed in this range when assuming the existence of a single peak in the PL spectra. As mentioned in the previous sections, the other parameters such as the electric eld amplitude of the pump (Ar laser) and the initial population of emitters are xed at 8x10 3 V/m and 10 26 Si-np/m 3 respectively. 5.5 Modeling SRSO/SiO 2 MLs Figure 5.16 is shown to remind the PL spectra obtained experimentally from 50(3/3) SRSO/SiO 2 1h-1100°C annealed (CA) ML in chapter 3. As mentioned earlier, curve 3 UV-Visible measurements were performed at Matériaux et Instrumentation Laser team of the CIMAP laboratory 154

tting operations show the presence of two peaks centered around 1.4 eV and 1.5 eV in all the CA annealed PL spectra of this material. The second peak around 1.5 eV was explained to be a contribution from Si-np in SRSO sublayers as conrmed by XRD and APT measurements in chapters 3 and 4, while the origin of peak 1 was interpreted as a contribution from few overgrown Si-np at the interface. It was also suspected that there may be some optical phenomena such as interference that aects the shape of the emission spectra. Hence it needs to be conrmed if the two peaks are a contribution of two kinds of emitters in the material. tel-00916300, version 1 - 10 Dec 2013 Figure 5.16: Experimentally obtained PL spectra of 50(3/3) SRSO/SiO 2 ML. Moreover, it was seen in chapter 3 that the emission peak intensity follows a non-monotonous trend with increasing t SiO2 . Therefore theoretical simulations are performed on SRSO/SiO 2 MLs to address the two major issues that arise from experimental observations: (i) What is the origin of two emission peaks - Geometrical/optical eect or presence of two types of emitters? (ii) What is the inuence of t SiO2 on PL intensity ? 5.5.1 Origin of two emission peaks In order to understand the origin of peaks, PL curve of 50(3/3) ML was simulated with an initial assumption that only the emission peak at 1.5 eV (peak 1) is from the Si-np (i.e. only one kind of Si-np distribution). The factors that inuence emission when there is only a single kind of emitter is investigated which is later extended to double kind of emitters. Simulations were made by varying thickness, refractive index, and cross-sections within the range of uncertainity, to compare the shape of the simulated curves with single and double kind of emitters with experimental PL curve. 155

tting operations show the presence of two peaks centered around 1.4 eV and 1.5<br />

eV in all the CA annealed PL spectra of this material. The second peak around 1.5<br />

eV was explained to be a contribution from <strong>Si</strong>-np in SRSO sublayers as conrmed<br />

by XRD and APT measurements in chapters 3 and 4, while the origin of peak 1<br />

was interpreted as a contribution from few overgrown <strong>Si</strong>-np at the interface. It was<br />

also suspected that there may be some optical phenomena such as interference that<br />

aects the shape of the emission spectra. Hence it needs to be conrmed if the two<br />

peaks are a contribution of two kinds of emitters in the material.<br />

tel-00916300, version 1 - 10 Dec 2013<br />

Figure 5.16: Experimentally obtained PL spectra of 50(3/3) SRSO/<strong>Si</strong>O 2 ML.<br />

Moreover, it was seen in chapter 3 that the emission peak intensity follows a<br />

non-monotonous trend with increasing t <strong>Si</strong>O2 . Therefore theoretical simulations are<br />

performed on SRSO/<strong>Si</strong>O 2 MLs to address the two major issues that arise from<br />

experimental observations:<br />

(i) What is the origin of two emission peaks - Geometrical/optical eect or<br />

presence of two types of emitters?<br />

(ii) What is the inuence of t <strong>Si</strong>O2 on PL intensity ?<br />

5.5.1 Origin of two emission peaks<br />

In or<strong>de</strong>r to un<strong>de</strong>rstand the origin of peaks, PL curve of 50(3/3) ML was simulated<br />

with an initial assumption that only the emission peak at 1.5 eV (peak 1) is from the<br />

<strong>Si</strong>-np (i.e. only one kind of <strong>Si</strong>-np distribution). The factors that inuence emission<br />

when there is only a single kind of emitter is investigated which is later exten<strong>de</strong>d<br />

to double kind of emitters. <strong>Si</strong>mulations were ma<strong>de</strong> by varying thickness, refractive<br />

in<strong>de</strong>x, and cross-sections within the range of uncertainity, to compare the shape of<br />

the simulated curves with single and double kind of emitters with experimental PL<br />

curve.<br />

155

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