Films minces à base de Si nanostructuré pour des cellules ...
Films minces à base de Si nanostructuré pour des cellules ... Films minces à base de Si nanostructuré pour des cellules ...
4.6.1 T A =400°C: Figure 4.28 shows the PL spectra of SRSO/SRSN MLs annealed at 400 °C and their peak positions with respect to various time steps of annealing. sample peak 1 (eV) peak 2 (eV) peak 3 (eV) as grown 1.41 1.62 1.88 1min 1.46 1.62 1.95 16min 1.41 1.62 1.91 31min 1.40 1.62 1.86 61min 1.38 1.62 1.87 tel-00916300, version 1 - 10 Dec 2013 Figure 4.28: PL spectra of 100(3.5/5) ML annealed at 400°C. The peak positions obtained after gaussian tting are indicated in the table. The three peaks obtained after gaussian tting are indicated as peak (1), (2) and (3) in the gure and the table. It can be seen from the spectra that the emission intensity of all the three peaks increase with t A . About twofold increase in the emission intensity is observed from the sample annealed at highest t A as compared to the as-grown sample while the position of peak (2) is always centered at 1.6 eV. The shifts in the peak positions of (1) and (3) are not signicant since their maxima are not well dened. The increase in all the three peak intensities with annealing time may indicate a beginning of reorganization of the matrix and a decrease of the non-radiative defects. The xed position of peak (2) indicates that there is no modication of Si-np size with increasing t A due to the low annealing temperature applied here. 4.6.2 T A =700°C: Figure 4.29 shows the PL spectra and the peak positions of 100(3.5/5) ML annealed at 700°C. The presence of three peaks is witnessed at all t A at this temperature also. Contrary to the previous case, the PL intensity increases only till 16min and then starts to decrease with longer t A . The previous comment on the shifted peak is still valid for peaks (1) and (3). Concerning the peak (2), its maximum being well dened, the shift is signicant as a function of the annealing time. It can be seen that peak (2) is redshifted after 16min of annealing as compared to the as-grown 116
sample peak 1 (eV) peak 2 (eV) peak 3 (eV) as grown 1.41 1.62 1.88 1min 1.39 1.61 1.85 16min 1.41 1.57 1.80 31min 1.43 1.56 1.80 61min 1.33 1.55 1.80 Figure 4.29: PL spectra of 100(3.5/5) ML annealed at 700°C. The peak positions obtained after gaussian tting are indicated in the table. tel-00916300, version 1 - 10 Dec 2013 and 1min annealed spectra. This redshift may be attributed to the formation of bigger Si-np. Following the Delerue law [Delerue 93], this shift is linked to a size variation of 0.3 nm. Considering the maximum value of Si diusion coecient, D Si = 10 −18 cm 2 s −1 at this temperature [Nesbit 85], the maximum diusion length (l = D Si x t A ) after an annealing time of 16min is estimated to 0.3 nm. Consequently, this PL shift can be attributed to the Si diusion favouring the growth of Si-np. The quench of the PL intensity with further annealing time can be ascribed to this growth of the Si-np as well as the detrimental contribution of the SRSN sublayer. 4.6.3 T A =900°C: Figure 4.30 shows the PL spectra and the peak positions of 100(3.5/5) ML annealed at 900°C. sample peak 1 (eV) peak 2 (eV) peak 3 (eV) as grown 1.41 1.62 1.88 1min 1.41 1.59 1.80 Figure 4.30: PL spectra of 100(3.5/5) ML annealed at 900°C. The peak positions obtained after gaussian tting are indicated in the table. The highest emission intensity is obtained after 1min when annealed at 900 °C 117
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4.6.1 T A =400°C:<br />
Figure 4.28 shows the PL spectra of SRSO/SRSN MLs annealed at 400 °C and their<br />
peak positions with respect to various time steps of annealing.<br />
sample peak 1<br />
(eV)<br />
peak 2<br />
(eV)<br />
peak 3<br />
(eV)<br />
as grown 1.41 1.62 1.88<br />
1min 1.46 1.62 1.95<br />
16min 1.41 1.62 1.91<br />
31min 1.40 1.62 1.86<br />
61min 1.38 1.62 1.87<br />
tel-00916300, version 1 - 10 Dec 2013<br />
Figure 4.28: PL spectra of 100(3.5/5) ML annealed at 400°C. The peak positions obtained<br />
after gaussian tting are indicated in the table.<br />
The three peaks obtained after gaussian tting are indicated as peak (1), (2) and<br />
(3) in the gure and the table. It can be seen from the spectra that the emission<br />
intensity of all the three peaks increase with t A . About twofold increase in the<br />
emission intensity is observed from the sample annealed at highest t A as compared<br />
to the as-grown sample while the position of peak (2) is always centered at 1.6 eV.<br />
The shifts in the peak positions of (1) and (3) are not signicant since their maxima<br />
are not well <strong>de</strong>ned.<br />
The increase in all the three peak intensities with annealing time may indicate a<br />
beginning of reorganization of the matrix and a <strong>de</strong>crease of the non-radiative <strong>de</strong>fects.<br />
The xed position of peak (2) indicates that there is no modication of <strong>Si</strong>-np size<br />
with increasing t A due to the low annealing temperature applied here.<br />
4.6.2 T A =700°C:<br />
Figure 4.29 shows the PL spectra and the peak positions of 100(3.5/5) ML annealed<br />
at 700°C.<br />
The presence of three peaks is witnessed at all t A at this temperature also.<br />
Contrary to the previous case, the PL intensity increases only till 16min and then<br />
starts to <strong>de</strong>crease with longer t A . The previous comment on the shifted peak is<br />
still valid for peaks (1) and (3). Concerning the peak (2), its maximum being well<br />
<strong>de</strong>ned, the shift is signicant as a function of the annealing time. It can be seen<br />
that peak (2) is redshifted after 16min of annealing as compared to the as-grown<br />
116