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Carl Zeiss SMT – Semiconductor Metrology Systems Division
Pellicle-Removal-Tool
for Photomasks
Why pellicle removal?
■ Haze impact (mask quality degradation
during use in wafer fab)
■ Contaminations under the pellicle
■ Preparation for mask repair
The novel Pellicle-Removal-Tool removes
pellicles automatically from photomasks.
It enables users to overcome:
■ Contamination risk through manual handling
■ Scratches by manual removal process
■ Uncontrolled process parameters
Customers benefit from:
■ Fully automated pellicle removal
■ ISO class 3 certified inside reticle handling
➔ Contamination control
■ Mask touching only on 45° bevel
➔ No contact with surface
■ POD-ID detection (RSP2200)
➔ Increased process control
■ ESD protected environment
➔ Prevent damage of mask
■ Residual free mask after pellicle removal
➔ Less mask cleaning effort
■ Reduced cleaning time for mask
■ Extended lifetime of mask
■ Controlled process parameters (e.g. force,
temperature, time, mask type)
➔ Repeatable process results for gentle
pellicle removal
■ Customized recipe setup
Enabling the Nano-Age World ®
We make it visible.

Carl Zeiss SMT – Semiconductor Metrology Systems Division
Key specifications
Parameter
Pellicle size
Removal process
Process length
Tool dimensions (mm)
Tool weight (kg)
Power supply
Features
Target Specification
Pellicle heigth: 3 - 7 mm
Pellicle width: 105 - 124 mm
Pellicle hole distance: 104 mm
Pellicle rotation of up to 1.5° acceptable
Thermal process up to 180° C
Tractive force up to 2 x 100 N
Depends on mask type,
Average process 45 min
1900 x 1200 x 2300
550
400 V AC (3/N/PE), max. power 3.5 kV A
- SMIF interface (RSP2200)
- Automatic pellicle detection
(upside, downside, 0°, 90°)
- Customized recipes
- SEMI S2, S8 certified
Global Solution Provider
The Semiconductor Metrology Systems division (SMS) of Carl
Zeiss SMT is a leading global supplier of metrology and
manufacturing equipment for the semiconductor industry.
Core expertise in light and electron optics, complemented
by a revolutionary femtosecondlaser technology are the
foundation for a product portfolio spanning from photomask
qualification, mask metrology, mask repair/tuning and
mask monitoring. Our global applications and service
network guarantees fast, reliable and high quality support
sharply focused on customer requirements. Carl Zeiss mask
solutions enable the mask making industry to develop and
manufacture zero-defect photomasks realizing highest yield.
Adhesive residuals after manual removal of Clean adhesive area after automatic pellicle
a MLI pellicle*
removal*
* Image taken with 50x Magnification, reflected light imaging
Flow chart
Carl Zeiss SMS GmbH
A Carl Zeiss SMT AG Company
Carl-Zeiss-Promenade 10
07745 Jena
Germany
Tel. +49 36 41 / 64 25 63
Fax +493641/642938
info-sms@smt.zeiss.com
Carl Zeiss SMT Inc.
One Corporation Way
Peabody, MA 01960
USA
Tel. +1 978 / 826 1500
Fax +1 978 / 532 5696
info-usa@smt.zeiss.com
Carl Zeiss Co., Ltd.
22, Honshio-cho, Shinjuku-ku
Tokyo 160-0003
Japan
Tel. +81 (0) 3 3355 0256
Fax +81 (0) 3 3358 7554
info@zeiss.co.jp
Carl Zeiss SMT Ltd.
511 Coldhams Lane
Cambridge CB1 3JS
UK
Tel. +441223414166
Fax +441223412776
info-uk@smt.zeiss.com
Carl Zeiss Co. Ltd.
2nd Floor, BR Elitel Bldg.
141-1, Sangsu-dong,
Mapo-gu,
SEOUL 121-828
South Korea
Tel. +82 23 140 2600
Fax +82 23 140 2699
info@zeiss.co.kr
Taiwan Instrument Co., Ltd.
9F, No. 272, Sec. 3, Nanking
East Road, Taipei,
Taiwan 105
Tel. +88 62 2772 3333
Fax +88 62 2731 1700
info@ticgroup.com.tw
www.smt.zeiss.com/sms
Due to a policy of continuous development, we reserve the right to change specifications without notice. Version 03-09 Z-PELIC © by Carl Zeiss SMT, Oberkochen