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Wüest M. 51 Wykes M. 82 Yamaguchi M. 17 Ybarra G. 129 Yubero F ...

Wüest M. 51 Wykes M. 82 Yamaguchi M. 17 Ybarra G. 129 Yubero F ...

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JUNE 26 MONDAY AFTERNOON<br />

RIVA-TF-MoA-OR.13 BREAKDOWN VOLTAGE IN MAGNETRON DC GLOW DIS-<br />

CHARGES. THE INFLUENCE OF THE MAGNETIC FIELD. Y. Nunes, A. Wemans, P. R.<br />

Gordo and M. J. P. Maneira. Cefitec - Department of Physics, Faculty of Sciences and Technology,<br />

New University of Lisbon, P-2<strong>82</strong>9-<strong>51</strong>6, Caparica, PORTUGAL.<br />

In abnormal glow discharges with magnetic field, the electrons are confined in a trap near the cathode<br />

allowing work at lower pressures and voltages. For thin film applications this can influence positively<br />

the quality of the sputtered film and decreases the processing time.<br />

d<br />

Fig1. Cathode mounted in the system<br />

and the copper discharge on argon.<br />

Fig2. Magnetic circuit position inside<br />

the cathode body<br />

In this work breakdown voltages of the abnormal glow discharges of argon on copper with magnetron<br />

assistance, are measured for different magnetic configurations.<br />

To achieve this, a cathode, shown in Fig.1, was constructed with a magnetic circuit, based on permanent<br />

NdFeB, which can be systematically moved allowing fine control of magnetic field distribution,<br />

see Fig.2. This way the influence of the magnetic field in the plasma parameters and in particular the<br />

influences in the breakdown voltage are studied.<br />

The breakdown voltages are measured and presented as a function of pressure for different distances<br />

of the magnetic circuit to the target. The study takes in account a range of pressures from 0.2 to 32<br />

Pa and a range of the parallel component of the magnetic induction, from 0.3 T to 1.7 T at the target<br />

surface.<br />

The expression,<br />

V ( P)<br />

= C ⋅e<br />

B<br />

1<br />

P<br />

−<br />

C2<br />

+ C + C ⋅ P<br />

3<br />

4<br />

fits the data of breakdown voltage dependence on the working pressure, with high correlation coefficient<br />

and the constants depend on magnetic distribution<br />

At each magnetic configuration the first exponential term accounts for low pressure range and the<br />

linear term accounts for the higher pressure range. Minima similar to what happens in Paschen’s<br />

Law, are observed which shifts to lower pressure with increase of the magnetic field. This behavior<br />

is systematic and regular.<br />

45

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