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71st IUVSTA Workshop " Combined nano-A ES and E DS characterization of materials ! "#$%&'!()#**&+,- .-/ !0121!34546- .-7 !81!"4$*%9&:- 7 !;1!&94#'*- 7! ?1"1!@4$*+499- 7 ! !!!!!!
Nanostructure Characterisation by Electron Beam Techniques Monte Carlo simulations of low energy electron in nanostructures Zine El Abidine Chaoui, 1,* 1 Laboratory of Optoelectronics and Compounds. University of Setif1. Algeria *z_chaoui@yahoo.fr A comprehensive Monte Carlo code (MC) has been developed to explore electron-nanostructure interactions. We have adopted event by event MC simulations. The code uses accurate elastic and inelastic cross sections and includes the secondary electron generation and cascade. A nanotextured surface and a spherical nanoparticle, representing a low and a high Z number, are considered as basic geometries. KeV electron range, chosen as a probe in surface science techniques, is used in the present study to model the production of the secondary yield of electrons (SE) and the backscatterd fraction (BSE) of the primary electrons. As a central result, we show that the SE and BSE signals vary considerably with the size of the nanostructure geometry. These variations will be discussed, for the first time in the present study, in terms of collision number and energy deposited. References [1] Y. T. Yue, H. M. Li and Z- J. Ding, J. Phys. D: Appl. Phys. 38 (2005) 1966–1977 64
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Untitled - IAP/TU Wien - Technische Universität Wien

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