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Untitled - IAP/TU Wien - Technische Universität Wien

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71st IUVSTA Workshop<br />

Modeling Scanning Electron Microscope Measurements with Charging<br />

J. S. Villarrubia *<br />

National Institute of Standards and Technology, Gaithersburg, MD 20899, USA<br />

* John.Villarrubia@nist.gov<br />

Nanostructured samples that are relevant in semiconductor electronics manufacturing or in nanotechnology<br />

are often comprised of mixed materials, some of which are insulators. Accumulated charges in insulating<br />

regions exposed to the electron beam or to scattered electrons generate electric fields that alter the contrast<br />

and positions of features in acquired images. To interpret the images it is necessary to account for these effects.<br />

For this purpose, the existing<br />

JMONSEL [1,2] simulator has been<br />

augmented with charging-related modeling<br />

capabilities. JMONSEL already<br />

performed Monte Carlo scattering simulations<br />

that included elastic scattering<br />

via the Mott cross sections, inelastic<br />

scattering via the dielectric function<br />

theory approach (when the requisite<br />

material data are available), phonon<br />

scattering, and electron refraction at<br />

material boundary crossings. For simulations<br />

in which charging is important, the sample is represented as a tetrahedral mesh with variable mesh size:<br />

fine in the region of interest and increasingly coarse with distance (Fig. 1). The net charge due to trapped electrons<br />

or holes in each mesh element is tracked. Simulation proceeds iteratively in a cycle that includes finite<br />

element solution of the electric fields followed by a scattering phase with electron transport modified by the<br />

electric field.<br />

The new capabilities have been used to simulate imaging of unfilled contact holes with radius 35 nm to<br />

70 nm through SiO 2 (Fig. 1) with a view to determining the dependence of visibility of the hole bottom upon<br />

hole size and imaging conditions. Results indicate that under appropriate conditions, the SiO 2 develops a beneficial<br />

positive surface potential that saturates at a scan-size dependent amount. This potential helps to extract<br />

electrons from the hole bottom.<br />

Fig. 1. Cutaway of meshed contact hole and surrounding volume. Tetrahedra<br />

that intersect a plane through the axis of the hole are rendered as solids.<br />

Oxide is blue, the vacuum above the hole is green, and (inset) the vacuum in<br />

the hole itself is purple.<br />

References<br />

[1]J. S. Villarrubia, N. W. M. Ritchie, and J. R. Lowney, Proc. SPIE 6518 (2007) 65180K.<br />

[2]J. S. Villarrubia and Z. J. Ding, J. Micro/Nanolith. MEMS MOEMS 8 (2009) 033003.<br />

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