Lecture 9 - Åbo Akademi
Lecture 9 - Åbo Akademi
Lecture 9 - Åbo Akademi
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Motivation<br />
• Increasingly harder for copper-based EI to satisfy design<br />
requirements<br />
• delay, power, bandwidth, delay uncertainty<br />
• Steep rise in parasitic resistance and capacitance of copper<br />
interconnects poses serious challenges for<br />
• interconnect delay (especially at the global level)<br />
• power dissipation<br />
• interconnect reliability