20.12.2013 Views

Microvision establishes first global R&D center in ... - I-Micronews

Microvision establishes first global R&D center in ... - I-Micronews

Microvision establishes first global R&D center in ... - I-Micronews

SHOW MORE
SHOW LESS

You also want an ePaper? Increase the reach of your titles

YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.

19<br />

MAY 2011 issue n°112<br />

THE DISRUPTIVE SEMICONDUCTOR TECHNOLOGIES MAGAZINE<br />

ADVANCED PACKAGING<br />

Major semiconductor companies jo<strong>in</strong> SEMATECH’s 3D enablement <strong>center</strong> to<br />

accelerate adoption of 3D TSV technologies<br />

Advanced Semiconductor Eng<strong>in</strong>eer<strong>in</strong>g (ASE), Altera Corporation, Analog Devices, LSI Corporation, ON Semiconductor,<br />

and Qualcomm collaborate to develop standards and technical specifications for 3D ICs.<br />

SEMATECH announced that these companies<br />

have jo<strong>in</strong>ed SEMATECH’s 3D Enablement<br />

program based at the College of Nanoscale<br />

Science and Eng<strong>in</strong>eer<strong>in</strong>g (CNSE) of the University<br />

at Albany. These lead<strong>in</strong>g semiconductor companies<br />

will jo<strong>in</strong> CNSE, GlobalFoundries, Hewlett Packard,<br />

Hynix, IBM, Intel, Samsung, and UMC to extend the<br />

program’s position as a broad, cohesive <strong>in</strong>itiative<br />

and to enable <strong>in</strong>dustry-wide ecosystem read<strong>in</strong>ess<br />

for cost effective TSV-based 3D stacked IC<br />

solutions.<br />

As members, these program participants will work<br />

with SEMATECH researchers to contribute to the<br />

overall vision of the Enablement Center, which<br />

<strong>in</strong>cludes identification of critical needs for 3D<br />

technologies, and the development of path fi nd<strong>in</strong>g<br />

capabilities, EDA tools, and appropriate test vehicles.<br />

In December 2010, SEMATECH, along with the<br />

Semiconductor Industry Association (SIA) and the<br />

Semiconductor Research Corporation (SRC),<br />

launched a new 3D Enablement program to drive<br />

<strong>in</strong>dustry standardization efforts and technical<br />

specifi cations for heterogeneous 3D <strong>in</strong>tegration. As<br />

a fi rst-of-its-k<strong>in</strong>d effort, the 3D Enablement program<br />

aims to establish the <strong>in</strong>frastructure necessary for the<br />

entire <strong>in</strong>dustry to leverage 3D packag<strong>in</strong>g technology<br />

for <strong>in</strong>novative new applications. The primary focus is<br />

on develop<strong>in</strong>g technologies and specifications<br />

necessary for establish<strong>in</strong>g standards <strong>in</strong> critical areas<br />

such as <strong>in</strong>spection, metrology, microbump<strong>in</strong>g,<br />

bond<strong>in</strong>g and th<strong>in</strong> wafer, and die handl<strong>in</strong>g.<br />

www.sematech.org<br />

ASE steps up <strong>in</strong>vestment <strong>in</strong> Ch<strong>in</strong>a<br />

Advanced Semiconductor Eng<strong>in</strong>eer<strong>in</strong>g (ASE) has revealed plans to <strong>in</strong>vest a total of US$1.2 billion on manufactur<strong>in</strong>g<br />

facilities <strong>in</strong> Shanghai, Ch<strong>in</strong>a.<br />

ASE will build a 180,000-square-meter plant as<br />

part of an effort to expand its operations <strong>in</strong><br />

Ch<strong>in</strong>a, the company said. Located <strong>in</strong> J<strong>in</strong>qiao,<br />

Pudong New Area, the new facility will target higherend<br />

wirebond<strong>in</strong>g and packag<strong>in</strong>g services with volume<br />

production slated for the second half of 2011.<br />

ASE also unveiled plans to set up its regional<br />

headquarters and R&D <strong>center</strong> <strong>in</strong> Zhangjiang,<br />

Shanghai. Construction of the 116,000-square-meter<br />

factory build<strong>in</strong>g will be divided <strong>in</strong>to three phases, ASE<br />

said, add<strong>in</strong>g that operations are scheduled to<br />

commence <strong>in</strong> 2012. In November 2010, ASE<br />

announced <strong>in</strong>vestment worth US$60 million to<br />

expand capacity at its subsidiary ASE (Weihai) <strong>in</strong><br />

Shandong Prov<strong>in</strong>ce, Ch<strong>in</strong>a. Earlier <strong>in</strong> the year, the<br />

company said it would spend a total of US$124 million<br />

on operation expansion <strong>in</strong> Ch<strong>in</strong>a, <strong>in</strong>clud<strong>in</strong>g<br />

construction of a new plant <strong>in</strong> the Pudong <strong>in</strong>dustrial<br />

district of Shanghai and additional production l<strong>in</strong>es<br />

at its Kunshan, Jiangsu Prov<strong>in</strong>ce facility.<br />

www.digitimes.com<br />

FABRICATION EQUIPMENT FOR THE INTEGRATED CIRCUIT INDUSTRY<br />

SINGLE WAFER WET PROCESSORS & CLEANERS<br />

Configure your wet fabrication process to <strong>in</strong>crease yields and lower cost with SSEC’s 3300 Series of S<strong>in</strong>gle Wafer Wet Processors.<br />

SSEC provides complete process development services to enable system configuration accord<strong>in</strong>g to your process and manufactur<strong>in</strong>g requirements.<br />

CLEAN<br />

99% Particle Removal Efficiency at the 88mm, 65mm, and 45mm Nodes<br />

High hVelocity ySpray<br />

WET ETCH<br />

Uniform, Selective Etch<strong>in</strong>g on Multiple Process Levels<br />

Wafer Th<strong>in</strong>n<strong>in</strong>g<br />

i<br />

Solid State Equipment Corporation<br />

SINGLE WAFER WET PROCESSING AND CLEANING<br />

STRIP & LIFT-OFF<br />

Immersion and S<strong>in</strong>gle Wafer Process<strong>in</strong>g<br />

Rotary PVABrush Heated Solvent Immersion Heated High Pressure Scrub<br />

Stream<br />

Etch<br />

for Films<br />

& Metals<br />

COAT / DEVELOP<br />

Photolithography Clusters<br />

Sp<strong>in</strong> nC<br />

Coat<strong>in</strong>g<br />

ssecusa.com<br />

Low<br />

ImpactDevelop<strong>in</strong>g<br />

©2010 Solid State Corporation<br />

Copyrights © Yole Développement SA. All rights reserved - Recycled paper

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!