MODELING CHAR OXIDATION AS A FUNCTION OF PRESSURE ...
MODELING CHAR OXIDATION AS A FUNCTION OF PRESSURE ...
MODELING CHAR OXIDATION AS A FUNCTION OF PRESSURE ...
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Single-Film Char Oxidation Submodel<br />
The single-film char oxidation model, developed by other investigators (Mitchell et<br />
al., 1992; Hurt et al. 1998) and summarized here to set a foundation for the HP-CBK<br />
model, consists of four aspects:<br />
1) global n-th order kinetics;<br />
2) film diffusion in the particle boundary layer;<br />
3) heat generation and transfer;<br />
4) mode of burning expressions.<br />
The kinetics of this submodel are simplistic. This submodel assumes that the<br />
particle is isothermal. Oxygen is assumed to be the sole oxidizer and the global n-th order<br />
rate equation is used to represent char oxidation rates:<br />
n<br />
qrxn = k sPs 70<br />
(6.1)<br />
where k s is a temperature-dependent rate coefficient, n is the apparent reaction order, and<br />
P s is the partial pressure of oxygen at the particle surface. The global rate coefficient, k s,<br />
implicitly includes the combined effects of pore diffusion, internal surface area, and<br />
intrinsic surface reactivity. This rate coefficient is described by an Arrhenius equation:<br />
k s = A exp(-E/RT p) (6.2)<br />
Both CO and CO 2 are considered primary products of the heterogeneous char oxidation<br />
reactions. The CO/CO 2 product ratio (MR) is assumed to depend on particle temperature<br />
and is expressed as:<br />
moles of CO<br />
MR = = Ac exp(-Ec /RTp) (6.3)<br />
moles of CO2