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MODELING CHAR OXIDATION AS A FUNCTION OF PRESSURE ...

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Single-Film Char Oxidation Submodel<br />

The single-film char oxidation model, developed by other investigators (Mitchell et<br />

al., 1992; Hurt et al. 1998) and summarized here to set a foundation for the HP-CBK<br />

model, consists of four aspects:<br />

1) global n-th order kinetics;<br />

2) film diffusion in the particle boundary layer;<br />

3) heat generation and transfer;<br />

4) mode of burning expressions.<br />

The kinetics of this submodel are simplistic. This submodel assumes that the<br />

particle is isothermal. Oxygen is assumed to be the sole oxidizer and the global n-th order<br />

rate equation is used to represent char oxidation rates:<br />

n<br />

qrxn = k sPs 70<br />

(6.1)<br />

where k s is a temperature-dependent rate coefficient, n is the apparent reaction order, and<br />

P s is the partial pressure of oxygen at the particle surface. The global rate coefficient, k s,<br />

implicitly includes the combined effects of pore diffusion, internal surface area, and<br />

intrinsic surface reactivity. This rate coefficient is described by an Arrhenius equation:<br />

k s = A exp(-E/RT p) (6.2)<br />

Both CO and CO 2 are considered primary products of the heterogeneous char oxidation<br />

reactions. The CO/CO 2 product ratio (MR) is assumed to depend on particle temperature<br />

and is expressed as:<br />

moles of CO<br />

MR = = Ac exp(-Ec /RTp) (6.3)<br />

moles of CO2

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