Single Layer 5% 950K MW PMMA - Stanford Nanofabrication ...

Single Layer 5% 950K PMMA in Anisole E-Beam Resist Process
Revision 1.5 January 25, 2008
James W. Conway
Stanford Nanofabrication Facility - Stanford University
jwc@snf.stanford.edu
Single Layer 5% 950K PMMA in Anisole – 300 nm thin films for features to

Microchem 5% 950K MW PMMA Thickness (f) Spin Speed Chart:
Film Thickness (angstrom)
6000.00
5000.00
4000.00
3000.00
2000.00
1000.00
Microchem 5% 950K PMMA in Anisole
Spin Speed (f) Thickness
Non-Standard PMMA Blend
0.00
1500 2000 2500 3000 3500 4000 4500 5000 5500
Area Features Size versus Dose-to-Clear:
Dose to Clear (uC/cm**2)
250
200
150
100
50
Spin Speed (rpm)
PCM TEST 04172007_1
Area Feature Size vs. Dose to Clear
5% 950K PMMA by MICROCHEM
non-Standard PMMA blend.
0
0.00 1.00 2.00 3.00 4.00 5.00 6.00 7.00 8.00 9.00 10.00
Feature Size (um sq.)