III. Gm-C Filtering - Epublications - Université de Limoges
III. Gm-C Filtering - Epublications - Université de Limoges
III. Gm-C Filtering - Epublications - Université de Limoges
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II.6 Technological Opportunities and Limitations<br />
A fully active structure relies on the technological choice of the transistors, but it also<br />
relies on the available passive components in the chosen technology.<br />
II.6.a Integrated Passive Components<br />
II.6.a.i Inductors<br />
On-chip inductors are mainly realized as spirals to enhance the inductive effect.<br />
However, the planar spiral geometry is far from being solenoidal and the inductance does not<br />
scale linearly with the number of turns. Hence, on-chip inductors often require large silicon<br />
space.<br />
The quality factor of such an inductor is limited by series loss due to the resistivity of<br />
the metal layer used for the spiral. Thick copper layers can be used to reduce the resistivity<br />
and to increase the inductor quality factor. Nevertheless this may require additional masks, so<br />
the cost of the final chip is increased. Furthermore, <strong>de</strong>spite copper metal line, on-chip<br />
inductors quality factors stay relatively low. This parameter is also strongly <strong>de</strong>pen<strong>de</strong>nt on the<br />
silicon area. In<strong>de</strong>ed, the larger the inductor area, the higher the quality factor, but the larger<br />
the capacitive parasitics which lower the self resonant frequency.<br />
II.6.a.ii Capacitors<br />
Having a look to the capacitance formula, given by<br />
ε 0ε<br />
r S<br />
C = , (<strong>III</strong>.70)<br />
t<br />
ox<br />
it is worth noticing that it strongly <strong>de</strong>pends on the insulator thickness tox and on the surface S.<br />
To <strong>de</strong>crease the capacitance area, the insulator thickness has to be <strong>de</strong>creased. According to the<br />
various materials constituting the capacitances, different types can be used. A MOS<br />
capacitance (Metal-Oxi<strong>de</strong>-Semiconductor) allows the use of high <strong>de</strong>nsity capacitances due to<br />
a high permittivity coefficient oxi<strong>de</strong> layer, ma<strong>de</strong> of TaO5 for instance. However, they are<br />
strongly non-linear and they require a bias. Using additional lithography masks, MIM (Metal-<br />
Insulator-Metal) capacitors may be used. Because they use a very thin insulator, MIM<br />
capacitances are able to achieve high capacitance values and also show a high <strong>de</strong>nsity<br />
(between 2 and 6fF/µm 2 ).<br />
II.6.a.iii Resistors<br />
Resistors can be ma<strong>de</strong> with various materials according to the wanted resistance value.<br />
Very reliable mo<strong>de</strong>ls are required, especially in terms of parasitic and also of process and<br />
temperature variations, in or<strong>de</strong>r to achieve very stable and robust <strong>de</strong>signs.<br />
II.6.b Transistors<br />
One major opportunity of fully active, therefore transistor based, filtering is the ability<br />
to take advantage of technology scaling. Higher <strong>de</strong>nsity of integration and smaller<br />
consumption thanks to a lower supply voltage are well known advantages. A more advanced<br />
technology no<strong>de</strong> allows using more digital gates in a same area in or<strong>de</strong>r to improve the analog<br />
RF performances by means of calibration.<br />
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