WAVES AND VIBRATIONS IN INHOMOGENEOUS STRUCTURES ...
WAVES AND VIBRATIONS IN INHOMOGENEOUS STRUCTURES ...
WAVES AND VIBRATIONS IN INHOMOGENEOUS STRUCTURES ...
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emoved and the spectra changed drastically when nearly all the details were removed. In<br />
general the transmission level in the upper arm of the Y-splitter was more affected than in the<br />
lower arm. Furthermore, we observed that absence of the small details in the splitter region<br />
did not lead to improvement of the transmission in the pass bands. Hence, the small details in<br />
the design do not contribute significantly in scattered losses of the Y-splitter. From the above<br />
observations and comments, we infer that these small details play an important role in the<br />
optimized structure and that they cannot be removed without hampering the performance of<br />
the splitter in spite of their negligible size.<br />
The good agreement between the calculated spectra of the designed structure and the<br />
optical measurements on the fabricated structure confirms that the NIL fabrication of the<br />
challenging nanophotonic TO design has been successful. It should be noted though that the<br />
crosstalk is less suppressed in the fabricated structure, illustrating that there still is room for<br />
improvement in the fabrication process.<br />
Finally, it is remarked that the TO compact wavelength splitter functions as designed,<br />
namely as a fairly efficient and coarse high-pass/low-pass wavelength filter.<br />
NORMALISED TRANSMISSION (dB)<br />
0<br />
-5<br />
-10<br />
-15<br />
-20<br />
Upper arm :<br />
Measured<br />
3D FDTD<br />
-25<br />
Lower arm :<br />
Measured<br />
-30<br />
1340 1380 1420<br />
3D FDTD<br />
1460 1500 1540 1580 1620<br />
WAVELENGTH (nm)<br />
Fig. 3. (Left) The original TO design. Light enters the component from the left side and is split<br />
into the two arms dependent on the wavelength. (Middle) SEM image of the fabricated splitter<br />
using NIL. (Right) Normalized measured transmission below the cut-off wavelength for quasi-<br />
TE polarized light from the two output arms. Also shown are 3D FDTD calculations for the<br />
transmission through the output arms of the originally designed structure. The 3D FDTD<br />
calculations have been blue-shifted by 0.5% in wavelength to match the experimental<br />
wavelength scale.<br />
5. Conclusions<br />
We have used NIL to fabricate SOI-based nanophotonic structures with feature sizes down<br />
below 30 nm. The NIL fabricated devices perform comparably to the direct EBL defined<br />
devices and the obtained results are in good agreement with 3D FDTD calculations. Thus, we<br />
have demonstrated the feasibility of NIL as a cost-efficient fabrication technique for siliconbased<br />
nanophotonics.<br />
Acknowledgments<br />
This project was supported in parts by the European network of excellence Epixnet, the<br />
Danish Research Council for Technology and Production Sciences via the PIPE project, and<br />
by the New Energy and Industrial Technology Development Organization (NEDO) via the<br />
Japanese Industrial Technology Research Area. The partial support of the EC-funded project<br />
NaPa (Contract no. NMP4-CT-2003-500120) is gratefully acknowledged. OS and JSJ<br />
received support from the Eurohorcs/ESF European Young Investigator Award (EURYI)<br />
through the grant “Synthesis and topology optimization of optomechanical systems”. Finally,<br />
the authors would like to thank Peixiong Shi, Danchip, DTU, for his technical assistance.<br />
#76773 - $15.00 USD Received 6 November 2006; revised 18 January 2007; accepted 19 January 2007<br />
(C) 2007 OSA 5 February 2007 / Vol. 15, No. 3 / OPTICS EXPRESS 1266