WAVES AND VIBRATIONS IN INHOMOGENEOUS STRUCTURES ...

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1. Introduction
Within recent years the development of planar silicon-on-insulator (SOI) based nanophotonic
structures such as photonic wires and 2D photonic crystal waveguides (PhCWs) [1-6] has
progressed to a level of performance and functionality where technological applications
within optical communication [7-10] and sensing [11,12] have become feasible. In the context
of transferring SOI-based nanophotonics from research to applications it is of relevance to
assess methods of volume manufacture of such components and systems.
The optical performance of SOI-based nanophotonic components is highly sensitive to
the nanometer feature size definition of the components. Even small deviations from the
design may be devastating for the functionality and/or the target operating frequency. This
calls for state-of-the-art nanofabrication technologies, where electron beam lithography (EBL)
and deep-ultraviolet lithography (DUVL) have been successfully applied for device
demonstration. EBL, in particular, provides nanophotonic structures with extremely high
resolution, and this fabrication method is appropriate for many research investigations.
However, being a serial fabrication process it is not optimal for mass fabrication of photonic
devices. DUVL, on the other hand, is developed for mass fabrication. In this case, however,
the production volume must be large enough to support the substantial costs affiliated with the
#76773 - $15.00 USD Received 6 November 2006; revised 18 January 2007; accepted 19 January 2007
(C) 2007 OSA 5 February 2007 / Vol. 15, No. 3 / OPTICS EXPRESS 1262