WAVES AND VIBRATIONS IN INHOMOGENEOUS STRUCTURES ...

Imprinted silicon-based nanophotonics
Peter I. Borel 1 , Brian Bilenberg 2 , Lars H. Frandsen 1 , Theodor Nielsen 2 ,
Jacob Fage-Pedersen 1 , Andrei V. Lavrinenko 1 , Jakob S. Jensen 3 ,
Ole Sigmund 3 , and Anders Kristensen 2
1 COM•DTU, Department of Communications, Optics & Materials
2 MIC - Department of Micro and Nanotechnology
3 MEK, Department of Mechanical Engineering
1,2,3 Nano DTU, Technical University of Denmark, DK-2800 Kgs Lyngby, Denmark
pib@com.dtu.dk, ak@mic.dtu.dk
http://www.nano.dtu.dk http://www.com.dtu.dk http://www.mic.dtu.dk/nil
Abstract: We demonstrate and optically characterize silicon-on-insulator
based nanophotonic devices fabricated by nanoimprint lithography. In our
demonstration, we have realized ordinary and topology-optimized photonic
crystal waveguide structures. The topology-optimized structures require
lateral pattern definition on a sub 30-nm scale in combination with a deep
vertical silicon etch of the order of ~300 nm. The nanoimprint method
offers a cost-efficient parallel fabrication process with state-of-the-art
replication fidelity, comparable to direct electron beam writing.
©2007 Optical Society of America
OCIS codes: (000.3860) Mathematical methods in physics; (000.4430) Numerical
approximation and analysis; (130.2790) Guided waves; (130.3120) Integrated optics devices;
(220.4000) Microstructure fabrication; (220.4830) Optical systems design; (230.3120)
Integrated optics devices; 230.4000 Microstructure fabrication; (230.5440) Polarizationsensitive
devices; (230.7390) Waveguides, planar; (999.9999) Photonic crystals.
References and links
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#76773 - $15.00 USD Received 6 November 2006; revised 18 January 2007; accepted 19 January 2007
(C) 2007 OSA 5 February 2007 / Vol. 15, No. 3 / OPTICS EXPRESS 1261