JAEA-Review-2010-065.pdf:15.99MB - 日本原子力研究開発機構
JAEA-Review-2010-065.pdf:15.99MB - 日本原子力研究開発機構
JAEA-Review-2010-065.pdf:15.99MB - 日本原子力研究開発機構
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4-13<br />
Behavior of N Atoms in Nitriding Processes of<br />
Evaporated-Ti Thin Films due to Ion Implantation<br />
Y. Kasukabe a), b) , Y. Watanabe b) , Y. Chen b) , S. Yamamoto c) and M. Yoshikawa c)<br />
a) Center for International Exchange, Tohoku University, b) Department of Metallurgy,<br />
Tohoku University, c) Environment and Industrial Materials Research Division, QuBS, <strong>JAEA</strong><br />
It has recently been reported that properties of<br />
non-stoichiometric titanium nitrides (TiNy) such as electrical<br />
conduction, diffusion barrier, wear resistance, catalysis, etc.<br />
depend not only on chemical composition, but also on<br />
orientation relationships between TiNy films and substrates.<br />
Therefore, much interest has been focused on studying<br />
atomistic-growth processes of TiNy films 1) . The purpose<br />
of the present paper is to clarify atomistic-growth processes<br />
of TiNy films due to ion implantation by using in-situ<br />
transmission electron microscopy and electron energy-loss<br />
spectroscopy, along with composition analysis and with the<br />
characterization of the electronic structure by molecular<br />
+<br />
orbital calculation. The ions of N2 with 62 keV are<br />
implanted into deposited Ti films in the 400-kV analytic<br />
high-resolution TEM combined with ion accelerators<br />
installed at <strong>JAEA</strong>-Takasaki 2) .<br />
+<br />
Nitrogen ions (N2 ) with 62 keV were implanted into the<br />
as-deposited Ti film composed of mainly (110)-oriented<br />
TiHx and ( 03<br />
5)<br />
-oriented hcp-Ti at room temperature,<br />
which results in the epitaxial formation of (110)-oriented<br />
and (001)-oriented TiNy, respectively. In order to elucidate<br />
the atomistic nitriding processes of the epitaxial<br />
transformation of Ti thin films due to N implantation in<br />
detail, DV-Xα MO calculations have been performed for<br />
the Ti19 cluster and Ti19N cluster models shown in Fig. 1(a).<br />
The Ti19 cluster of Fig. 1(a), which does not include a<br />
nitrogen atom indicated by an open circle G, corresponds to<br />
a part of the hcp-Ti structure. The central position G<br />
(O-site) of the octahedron with larger space as formed by<br />
A-F atoms in Fig. 1(a), has lower electron density (~1/5,000<br />
of electron density of A-site). Thus, the O-sites have<br />
smaller repulsion for electrons of N atoms, and admit the<br />
invasion of N atoms, which leads to the formation of a Ti19N cluster in Fig. 1(a). The contour map of the wavefunction<br />
of the mainly Ti3d-N2p bonding orbital, which has the energy<br />
eigenvalue of -5.9715 eV below the Fermi level, is shown in<br />
Fig. 1(b). It can be seen from Fig. 1(b) that strong Ti-N<br />
bonds (A-G and F-G bonds) include the π-like bonds of<br />
Ti3dyz and N2pz orbitals, and that the N2pz orbital interacts<br />
with orbitals of Ti atom denoted by J, but hardly with those<br />
of Ti atom denoted by K. It can be considered that the<br />
interaction of the N2pz orbital with Ti atom, J, leads to the<br />
movement of the nitrogen atom, G, to other neighboring<br />
O-site of the octahedron formed by A, C, D, H, I and J<br />
atoms, midway between the A and J atoms. Since in the<br />
transformed fcc-Ti sublattice after the hcp-fcc<br />
transformation, the site, G, in Fig. 1(a) is not O-sites, the N<br />
atom denoted by G has to move into other O-sites in order to<br />
<strong>JAEA</strong>-<strong>Review</strong> <strong>2010</strong>-065<br />
- 137 -<br />
form the TiN y. In other words, the movement (diffusion)<br />
of the N atom in the O-site of hcp to other neighboring<br />
O-site of the octahedron which is maintained during the<br />
hcp-fcc transformation of Ti-sublattice plays an important<br />
role in epitaxial growth of TiN y. Thus, the shift of the F<br />
atom to the center of gravity of the triangle BEF promoted<br />
by the forming of the strong A-G and F-G bonds and the<br />
weakening of the C-B and D-E bonds for Ti 19N, the<br />
inheritance of square atomic arrangement formed by C, D, H<br />
and I atoms, and the movement of the N atom in the O-site<br />
of hcp-Ti to other neighboring O-site of the octahedron<br />
(from G, to other neighboring O-site of the octahedron<br />
formed by A, C, D, H, I and J atoms) can be considered to<br />
be the origin for the hcp-fcc transformation of Ti sublattices<br />
and epitaxial growth of TiN y.<br />
References<br />
1) S. Hao et al., Phys. Rev. B 74 (2006) 035424-1.<br />
2) H. Abe et al., JAERI-Research 96-047 (1996)18p.<br />
(a)<br />
(b)<br />
K<br />
FL =<br />
●:Ti ○:N<br />
L<br />
K<br />
A<br />
G<br />
01 <br />
0<br />
Fig. 1 (a) Schematic illustration of the Ti19 cluster and<br />
Ti19N cluster with a nitrogen atom, G. (b) The<br />
contour map of the wavefunction of the mainly<br />
Ti3d-N2p bonding orbital, which are drawn for<br />
the { 21<br />
0}<br />
plane including A, L, F and J atoms in (a).<br />
F<br />
J