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JAEA-Review-2010-065.pdf:15.99MB - 日本原子力研究開発機構

JAEA-Review-2010-065.pdf:15.99MB - 日本原子力研究開発機構

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4-13<br />

Behavior of N Atoms in Nitriding Processes of<br />

Evaporated-Ti Thin Films due to Ion Implantation<br />

Y. Kasukabe a), b) , Y. Watanabe b) , Y. Chen b) , S. Yamamoto c) and M. Yoshikawa c)<br />

a) Center for International Exchange, Tohoku University, b) Department of Metallurgy,<br />

Tohoku University, c) Environment and Industrial Materials Research Division, QuBS, <strong>JAEA</strong><br />

It has recently been reported that properties of<br />

non-stoichiometric titanium nitrides (TiNy) such as electrical<br />

conduction, diffusion barrier, wear resistance, catalysis, etc.<br />

depend not only on chemical composition, but also on<br />

orientation relationships between TiNy films and substrates.<br />

Therefore, much interest has been focused on studying<br />

atomistic-growth processes of TiNy films 1) . The purpose<br />

of the present paper is to clarify atomistic-growth processes<br />

of TiNy films due to ion implantation by using in-situ<br />

transmission electron microscopy and electron energy-loss<br />

spectroscopy, along with composition analysis and with the<br />

characterization of the electronic structure by molecular<br />

+<br />

orbital calculation. The ions of N2 with 62 keV are<br />

implanted into deposited Ti films in the 400-kV analytic<br />

high-resolution TEM combined with ion accelerators<br />

installed at <strong>JAEA</strong>-Takasaki 2) .<br />

+<br />

Nitrogen ions (N2 ) with 62 keV were implanted into the<br />

as-deposited Ti film composed of mainly (110)-oriented<br />

TiHx and ( 03<br />

5)<br />

-oriented hcp-Ti at room temperature,<br />

which results in the epitaxial formation of (110)-oriented<br />

and (001)-oriented TiNy, respectively. In order to elucidate<br />

the atomistic nitriding processes of the epitaxial<br />

transformation of Ti thin films due to N implantation in<br />

detail, DV-Xα MO calculations have been performed for<br />

the Ti19 cluster and Ti19N cluster models shown in Fig. 1(a).<br />

The Ti19 cluster of Fig. 1(a), which does not include a<br />

nitrogen atom indicated by an open circle G, corresponds to<br />

a part of the hcp-Ti structure. The central position G<br />

(O-site) of the octahedron with larger space as formed by<br />

A-F atoms in Fig. 1(a), has lower electron density (~1/5,000<br />

of electron density of A-site). Thus, the O-sites have<br />

smaller repulsion for electrons of N atoms, and admit the<br />

invasion of N atoms, which leads to the formation of a Ti19N cluster in Fig. 1(a). The contour map of the wavefunction<br />

of the mainly Ti3d-N2p bonding orbital, which has the energy<br />

eigenvalue of -5.9715 eV below the Fermi level, is shown in<br />

Fig. 1(b). It can be seen from Fig. 1(b) that strong Ti-N<br />

bonds (A-G and F-G bonds) include the π-like bonds of<br />

Ti3dyz and N2pz orbitals, and that the N2pz orbital interacts<br />

with orbitals of Ti atom denoted by J, but hardly with those<br />

of Ti atom denoted by K. It can be considered that the<br />

interaction of the N2pz orbital with Ti atom, J, leads to the<br />

movement of the nitrogen atom, G, to other neighboring<br />

O-site of the octahedron formed by A, C, D, H, I and J<br />

atoms, midway between the A and J atoms. Since in the<br />

transformed fcc-Ti sublattice after the hcp-fcc<br />

transformation, the site, G, in Fig. 1(a) is not O-sites, the N<br />

atom denoted by G has to move into other O-sites in order to<br />

<strong>JAEA</strong>-<strong>Review</strong> <strong>2010</strong>-065<br />

- 137 -<br />

form the TiN y. In other words, the movement (diffusion)<br />

of the N atom in the O-site of hcp to other neighboring<br />

O-site of the octahedron which is maintained during the<br />

hcp-fcc transformation of Ti-sublattice plays an important<br />

role in epitaxial growth of TiN y. Thus, the shift of the F<br />

atom to the center of gravity of the triangle BEF promoted<br />

by the forming of the strong A-G and F-G bonds and the<br />

weakening of the C-B and D-E bonds for Ti 19N, the<br />

inheritance of square atomic arrangement formed by C, D, H<br />

and I atoms, and the movement of the N atom in the O-site<br />

of hcp-Ti to other neighboring O-site of the octahedron<br />

(from G, to other neighboring O-site of the octahedron<br />

formed by A, C, D, H, I and J atoms) can be considered to<br />

be the origin for the hcp-fcc transformation of Ti sublattices<br />

and epitaxial growth of TiN y.<br />

References<br />

1) S. Hao et al., Phys. Rev. B 74 (2006) 035424-1.<br />

2) H. Abe et al., JAERI-Research 96-047 (1996)18p.<br />

(a)<br />

(b)<br />

K<br />

FL =<br />

●:Ti ○:N<br />

L<br />

K<br />

A<br />

G<br />

01 <br />

0<br />

Fig. 1 (a) Schematic illustration of the Ti19 cluster and<br />

Ti19N cluster with a nitrogen atom, G. (b) The<br />

contour map of the wavefunction of the mainly<br />

Ti3d-N2p bonding orbital, which are drawn for<br />

the { 21<br />

0}<br />

plane including A, L, F and J atoms in (a).<br />

F<br />

J

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