tagungsband - Deutsche Bunsengesellschaft für Physikalische ...

Fr 18. 5. 2007, 17.50–18.30 A
Hauptvortrag - Hauptthema 10
Controlling the growth of carbon nanotubes
John Robertson
Engineering Dept, Cambridge University,
Cambridge CB2 1PZ, UK
Chemical vapour deposition (CVD) is the main, scalable
method for bulk growth of nanotubes. But it
is also the most interesting route to provide controlled
growth of nanotubes on surfaces for electronics,
etc. Plasma enhanced CVD can help. The
nanotube grows from a catalyst droplet, which has
been transformed from a thin layer. Control of both
processes allows growth of SWNTs to below 400C,
or for 3 mm long nanotubes to grow from 0.5 nm of
catalyst, corresponding to very high yields. Recently,
even Au or Cu has been found to act as a catalyst.
However, we still cannot control a specific chirality.