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Cleanable API Processing Equipment and Systems 287<br />

TABLE 3 Inside Diameter, Area, and Flow Rate for 5Feet/Sec in Condenser<br />

Nominal diameter<br />

(in.)<br />

Internal diameter<br />

(in.) Area (ft 2 ) gpm at Q (5 ft/sec)<br />

1 13 = 16 0.0036 8<br />

11= 2 15 = 16 0.0094 21<br />

2 113= 16 0.0179 40<br />

3 213= 16 0.0431 97<br />

The designer has to make some important decisions on how differing use<br />

points are combined to form aCIP circuit. Consider the system shown in Figure 2.<br />

That system has a2-in. Teflon lined (TL) CIP header at the discharge of the process<br />

transfer pump. Assume that this pump has anominal capacity of 50 gpm at 150 ft<br />

head. It is the designer’s task to apportion adequate flow to various circuits and<br />

ensure that the system hydraulics can be met to ensure the proper flow to each<br />

branch of the circuit.<br />

To do this, it is important to realize that there are three types of backpressure<br />

patterns which may be present in acircuit.<br />

& Aspray device:Generally,nonrotating sprays are designed for apressuredrop of<br />

20 to 30 psi (46–69 ft of water).<br />

& An open line: Pressure drop per 100 ft at 5ft/sec is generally in the range of 1to<br />

3psig per 100 ft.<br />

& Arestricted flow: Generally, ahigher pressure drop than an open line, but less<br />

than aspray device.<br />

It is important that aspray device is not included in acircuit in parallel with a<br />

circuit with an open line. The flow through an unrestricted (open) line would<br />

deprive the spray device of the appropriate flow of CIP fluid. Sometimes a<br />

restriction flow orifice can be used to backpressure an open or restricted line so<br />

that satisfactory hydraulic performance could be obtained with spray devices<br />

included in the same circuit.<br />

The glass-lined reactor portrayed in Figure 2utilizes the circuits summarized<br />

in Table 4.<br />

The process transfer pump needs to be evaluated to ensure that it is able to<br />

provide adequate flows for both aqueous and organic fluids. It should be noted that<br />

the pressure drop through pipe and fitting is affected by the fluid specific gravity.<br />

In asimilar way, the discharge pressure ofacentrifugal pump varies with specific<br />

gravity. Typical solvent specific gravities vary between 0.6 and 1.3 SG.<br />

TABLE 4 Example of Flow Rate Through Sub-Circuits in Reactor CIP<br />

Circuit Flow rate (gpm)<br />

Reflux, distillate, or vent O 40 gpm<br />

Overhead piping 5bubble sprays at 10Z 50 gpm<br />

Condenser 2 spraysZ 60 total gpm<br />

Dip tube O 40 gpm<br />

Charge chute 2bubble sprays at 10Z 20 gpm<br />

Instrument and baffle nozzles 20 gpm<br />

Reactor vessel 2sprays at 30 gpmZ 60 gpm

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