Untitled

CIP System Components and Configurations 103
Chemical
loop
CIP
supply pump
(VFD)
AWFI
FCV
SG
AB
FE
CIPS recycle
Steam
Solution
make-up
Chemical
loop block
Heat
tank
PS
COND
exchanger
RTD T
LS
Restrictor
COND
TOV Drain
Chemical
loop
CIP supply
CIP supply
steps might be employed, followed by an air blow of the CIPS to and through the
circuit, and then acircuit drain step.
Alkaline Solution Wash—Next, the tank would be filled with sufficient water
to provide abatch of adequate size to meet the time requirement at the desired
flow rate. For example, if awash time of five minutes was required at 50 gal/min
(190 L/m), the solution batch would be 250 gal (950 L) plus the amount required
to fill the CIPS piping to the beginning of the circuit. Recycle from the tank,
through the heat exchanger and back to the tank would be initiated as would
chemical feed, and the solution would be adjusted to the desired temperature and
conductivity. Then, it would be supplied to the circuit at the required flow rate for
the specified time. An air blow of the CIPS to and through the circuit
would follow.
Post and Final Rinse—The solution makeup tank would then be rinsed to drain
and then filled with water of the required quality for these operations, conducted as
described for the pre-rinse above.
Instrumentation for program documentation may be more costly and
complex than for CIP skids which use recirculation, as the result of single pass
discharge to multiple destinations.
Options include (1) multiple temperature, conductivity, and resistivity
sensors at the circuit destinations, (2) validation that controlled CIPS conditions
always produce the desired conditions at the end of the circuit, and (3) the
T
AWFI
Sol
make-up
tank
Rinse to destination Solution make-up
FIGURE 6 For processes which demand maximum protection against cross-contamination, the
standard components can be configured to provide single-tank single-pass operation.