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Tellurite And Fluorotellurite Glasses For Active And Passive

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7. Surface properties; MDO 251<br />

of 10 eV and 50 eV for the high-resolution peak scans and survey scans respectively. The<br />

vacuum in the analysis chamber was typically better than 4×10 -9 mbar (4×10 -7 Pa). The<br />

electron take-off angle used was 90 degrees and the area analysed approximately 1 × 1<br />

cm. The XPS was calibrated monthly with a silver standard.<br />

Glass samples were analysed using a Kratos AXIS ULTRA XPS (under the direction<br />

of Prof. D. Briggs), with a mono-chromated AlKα source (1486.6 eV) operating at 10 mA<br />

emission current, and 10 kV anode potential. This XPS was used in fixed analyser<br />

transmission (FAT) mode, with pass energy of 160 eV for wide scans, and 10 eV for high<br />

resolution scans. The magnetic immersion lens system used a slot aperture of 300 × 700<br />

µm for wide and high resolution scans. The take-off angle the photoelectron analyser was<br />

90°, and acceptance angle 30° (in magnetic lens mode). The analysis chamber pressure<br />

was typically better than 1.3×10 -9 mbar (1.3×10 -7 Pa). Bulk glass samples were analysed<br />

on polished and cleaved surfaces (see chapter 6.1.1.1 for description of polishing<br />

process). Surfaces were cleaved in the laboratory atmosphere with a SiC glass cleaver,<br />

immediately prior to analysis, as contamination on the sample surface such as hydrolysis,<br />

fingerprints, residue from organic solvents (e.g. acetone), silicone release agents from<br />

sample bags, and artefacts from polishing (mounting wax and polishing oil), can mask the<br />

signal from the sample. As XPS is a surface technique, cleaving the sample should result<br />

in spectra which give a better representation of bulk glass composition; however some<br />

degree of hydrolysis will be inevitable when cleaved in the laboratory atmosphere.<br />

Therefore, any quantitative analysis relating to hydroxide groups in the glass had to be<br />

treated carefully.

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