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Enhanced Polymer Passivation Layer for Wafer Level Chip Scale ...

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are “low temperature” wafer level steps except the solder reflow. Figure 2.13 describes a process<br />

flow of a laser ablated coating-type wafer level solder brace, including spin coating, curing, laser<br />

ablation of solder vias, and bumping. This film method demonstrates a good method of <strong>for</strong>ming<br />

a solder brace [53].<br />

Figure 2.13 Process flow of a laser ablated coating-type wafer level solder brace<br />

Figure 2.14 outlines another method to introduce a solder brace type material to the<br />

WLCSP without laser ablated via opening processing. Based upon a bumped wafer, the coating<br />

is printed over the balls, back groud and cleaned to expose the solder, and re-bumped. This<br />

process can improve the reliability of the package by increasing the standoff height [53,57].<br />

The application of photo-defined material has simplified the coating-type bracing process<br />

flow without the need <strong>for</strong> laser ablation or re-bumping [24]. This process requires a UV sensitive<br />

material that can cure in the thick films. Figure 2.15 describes a process flow by the photo-<br />

definition method.<br />

31

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