Enhanced Polymer Passivation Layer for Wafer Level Chip Scale ...

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Figure 1.6 Application method of SolderBrace material by UV definition 10 Bare Si <strong>Wafer</strong> Bumped Pad made by photolithography Spin coat UV curable material Mask/UV exposure Fully Cured Material Development Flux Printing Solder Ball Placement Reflow
11 Bumped <strong>Wafer</strong> Print over ball Pre-Bake Mask/UV exposure, Polishing Clean, Spray Clean Final Cure Figure 1.7 Application of SolderBrace Material by printing over balled wafer
Page 1 and 2: Enhanced Polymer Passivation Layer
Page 3 and 4: SolderBrace coatings were low tempe
Page 5 and 6: Table of Contents Abstract ........
Page 7 and 8: 4.4 Failure Analysis ..............
Page 9 and 10: List of Figures Figure 1.1 Trends i
Page 11 and 12: Figure 3.17 SAC305 Reflow profile .
Page 13 and 14: CHAPTER 1 INTRODUCTION In the era o
Page 15 and 16: This effect changes the package to
Page 17 and 18: 1.4 Solder Joint Fatigue Figure 1.2
Page 19 and 20: leading to the solder joint failure
Page 21: umped wafers. The coating is stenci
Page 25 and 26: 2.1 Chip Scale Package Technology C
Page 27 and 28: Mountable with conventional assembl
Page 29 and 30: Figure 2.3 Cross section of a typic
Page 31 and 32: Table 2.1 Comparison between tradit
Page 33 and 34: In-Situ Bumped Wafers Placed Prefor
Page 35 and 36: of solder joint failure, and they o
Page 37 and 38: (a) (b) Figure 2.8(a). Metalized ph
Page 39 and 40: "underfilled" structure distributes
Page 41 and 42: have generally been the modificatio
Page 43 and 44: are “low temperature” wafer lev
Page 45 and 46: 2.3.4 Optimized SolderBrace Materia
Page 47 and 48: CHAPTER 3 WLCSP DIE FABRCIATION In
Page 49 and 50: Table 3.1 Test Die used for Reliabi
Page 51 and 52: Figure 3.4 Fabrication Process Flow
Page 53 and 54: spin coating. A layer of light sens
Page 55 and 56: layer, is investigated as a potenti
Page 57 and 58: 10. Final cleaning: After the passi
Page 59 and 60: Cyclopentanone, a colorless liquid
Page 61 and 62: used to check the basic spin and ph
Page 63 and 64: Figure 3.7 SolderBrace film thickne
Page 65 and 66: 6. Post-UV exposure bake: This step
Page 67 and 68: 8. Pattern characterization: The su
Page 69 and 70: offers the optimum flux release cha
Page 71 and 72: fatigue resistance, lower cost SAC
Page 73 and 74:
Figure 3.12 Solder Ball Placement M
Page 75 and 76:
of solder balls to the holes on the
Page 77 and 78:
of thermal shock. If the temperatur
Page 79 and 80:
Figure 3.17 SAC305 Reflow profile -
Page 81 and 82:
foaming and high performance cleane
Page 83 and 84:
- Polish clean: used the optimized
Page 85 and 86:
Figure 3.22 SolderBrace printed waf
Page 87 and 88:
Voids Figure 3.25 SolderBrace Mater
Page 89 and 90:
cutting speed was set at a low valu
Page 91 and 92:
Figure 4.2 Process Flow of Board As
Page 93 and 94:
pitch, and bump diameter), and subs
Page 95 and 96:
4.2.4 X-Ray Inspection Figure 4.5 R
Page 97 and 98:
Figure 4.6 Air to air thermal cycli
Page 99 and 100:
Figure 4.7 Thermal Cycling Setup 87
Page 101 and 102:
4.4 Failure Analysis The main purpo
Page 103 and 104:
Figure 4.10 Pad cratering failure o
Page 105 and 106:
CHAPTER 5 FINITE ELEMENT ANALYSIS I
Page 107 and 108:
5.1.1 Modeling Approaches Due to th
Page 109 and 110:
are shown in Figure 5.2. However, t
Page 111 and 112:
5.1.2 Material Properties Many pack
Page 113 and 114:
strain rate sensitivity. The evolut
Page 115 and 116:
Morris et a1 [96] used a double pow
Page 117 and 118:
focus on the time-dependent effects
Page 119 and 120:
5.2 Modeling Procedure In this proj
Page 121 and 122:
Figure 5.6 The diagonal symmetry mo
Page 123 and 124:
5.2.3 Meshing Table 5.2 Anand const
Page 125 and 126:
direction, but that the surface is
Page 127 and 128:
PREP7 tref,398 ! set zero strain te
Page 129 and 130:
5.2.7 Thermal Fatigue Life Predicti
Page 131 and 132:
CHAPTER 6 CONCLUSIONS Wafer level c
Page 133 and 134:
References 1. Future Trends in Elec
Page 135 and 136:
23. Electronic Packaging and Interc
Page 137 and 138:
48. Ultra Low Stress and Low Temper
Page 139 and 140:
70. Factors for Successful Wafer-Le
Page 141 and 142:
92. Microstructural Dependendence o
Page 143:
111. Nonlinear Analysis of Full Mat
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