Enhanced Polymer Passivation Layer for Wafer Level Chip Scale ...

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was created at the same time when the volumes were created using the “VSWEEP” command in ANSYS. This command guarantees a coincident node and mesh at the interfaces of different volumes. Figure 5.7 is a close-up view of the meshed model, specially the fine mesh at the solder joint due to the interest of the solder joint fatigue study. Figure 5.7 Finished mesh <strong>for</strong> the solderbrace-coated WLCSP package 5.2.4 Boundary Conditions The use of a slice model involves a choice on the part of the analyst on the boundary constraints to be applied at the slice plane. The plane is neither a free surface nor a true symmetry plane. The reasonable compromise of coupling the y-displacements of the nodes on the slice plane was chosen. This has the effect that the slice plane is free to move in the y- 112
direction, but that the surface is required to remain planar. Boundary constraints applied in this study are shown in Figure 5.8. Figure 5.8 Boundary Conditions applied to a typical slice model 113
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Enhanced Polymer Passivation Layer
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SolderBrace coatings were low tempe
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Table of Contents Abstract ........
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4.4 Failure Analysis ..............
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List of Figures Figure 1.1 Trends i
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Figure 3.17 SAC305 Reflow profile .
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CHAPTER 1 INTRODUCTION In the era o
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This effect changes the package to
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1.4 Solder Joint Fatigue Figure 1.2
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leading to the solder joint failure
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umped wafers. The coating is stenci
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11 Bumped Wafer Print over ball Pre
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2.1 Chip Scale Package Technology C
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Mountable with conventional assembl
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Figure 2.3 Cross section of a typic
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Table 2.1 Comparison between tradit
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In-Situ Bumped Wafers Placed Prefor
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of solder joint failure, and they o
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(a) (b) Figure 2.8(a). Metalized ph
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"underfilled" structure distributes
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have generally been the modificatio
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are “low temperature” wafer lev
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2.3.4 Optimized SolderBrace Materia
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CHAPTER 3 WLCSP DIE FABRCIATION In
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Table 3.1 Test Die used for Reliabi
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Figure 3.4 Fabrication Process Flow
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spin coating. A layer of light sens
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layer, is investigated as a potenti
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10. Final cleaning: After the passi
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Cyclopentanone, a colorless liquid
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used to check the basic spin and ph
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Figure 3.7 SolderBrace film thickne
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6. Post-UV exposure bake: This step
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8. Pattern characterization: The su
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offers the optimum flux release cha
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fatigue resistance, lower cost SAC
Page 73 and 74: Figure 3.12 Solder Ball Placement M
Page 75 and 76: of solder balls to the holes on the
Page 77 and 78: of thermal shock. If the temperatur
Page 79 and 80: Figure 3.17 SAC305 Reflow profile -
Page 81 and 82: foaming and high performance cleane
Page 83 and 84: - Polish clean: used the optimized
Page 85 and 86: Figure 3.22 SolderBrace printed waf
Page 87 and 88: Voids Figure 3.25 SolderBrace Mater
Page 89 and 90: cutting speed was set at a low valu
Page 91 and 92: Figure 4.2 Process Flow of Board As
Page 93 and 94: pitch, and bump diameter), and subs
Page 95 and 96: 4.2.4 X-Ray Inspection Figure 4.5 R
Page 97 and 98: Figure 4.6 Air to air thermal cycli
Page 99 and 100: Figure 4.7 Thermal Cycling Setup 87
Page 101 and 102: 4.4 Failure Analysis The main purpo
Page 103 and 104: Figure 4.10 Pad cratering failure o
Page 105 and 106: CHAPTER 5 FINITE ELEMENT ANALYSIS I
Page 107 and 108: 5.1.1 Modeling Approaches Due to th
Page 109 and 110: are shown in Figure 5.2. However, t
Page 111 and 112: 5.1.2 Material Properties Many pack
Page 113 and 114: strain rate sensitivity. The evolut
Page 115 and 116: Morris et a1 [96] used a double pow
Page 117 and 118: focus on the time-dependent effects
Page 119 and 120: 5.2 Modeling Procedure In this proj
Page 121 and 122: Figure 5.6 The diagonal symmetry mo
Page 123: 5.2.3 Meshing Table 5.2 Anand const
Page 127 and 128: PREP7 tref,398 ! set zero strain te
Page 129 and 130: 5.2.7 Thermal Fatigue Life Predicti
Page 131 and 132: CHAPTER 6 CONCLUSIONS Wafer level c
Page 133 and 134: References 1. Future Trends in Elec
Page 135 and 136: 23. Electronic Packaging and Interc
Page 137 and 138: 48. Ultra Low Stress and Low Temper
Page 139 and 140: 70. Factors for Successful Wafer-Le
Page 141 and 142: 92. Microstructural Dependendence o
Page 143: 111. Nonlinear Analysis of Full Mat
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Enhanced Polymer Passivation Layer for Wafer Level Chip Scale ...

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