KURENAI : Kyoto University Research Information Repository

E fg (h,jg ) =2. 213 N1.5D*1
jigH
.25
Ap
jg h
(2-2) For the intermediate gas flux regime bounded by
6.39 x 10-4 j*g/h* < 5.7 x 10-4N u9
the entrainment is given by Eq. (96) as
E fg (h,jg ) = 5. 417 x 106*j93 h *-3 fJ1.5D*1.25(fa
(2-3) For the high gas flux regime limited to
j9/h*> 5.7 x 10-4
N-0.5
P9
the entrainment amount increases very rapidly as
Ef9
the deposition
entrainment.
* *
(j g/h
(3) Deposition
Above the
7.-20
Controlled
height given
Region
*0 .42
h* > 1.97 x 103 N0.33 D
H Ap
becomes
In this
by
.5 D .42 fa
H H Ap
0.10
jig H P )_0.31
*-0.42 DH (!9.
)0.10
0.23
the mai n factor determining the
regime,
the entrainment consists
290
amount of
of droplets whose