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PS-PLLA - Www2.che.nthu.edu.tw

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Advantages and Disadvantages<br />

Electronlithography<br />

PMMA<br />

van Blaaderen, A. et al. Nature 1997, 385, 323.<br />

Require precise manufacturing<br />

(expensive!)<br />

Topographic pattern only<br />

Limitation in pattern area<br />

Creative features<br />

Block copolymer<br />

<strong>PS</strong>-<strong>PLLA</strong><br />

Ho, R.-M. et al. US24265548A1<br />

Large-scale orientation<br />

Easy to prepare (cheap!)<br />

Quick!<br />

Available for topographic and<br />

chemical nanopatterns<br />

Flexibility

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